The present invention is related to sanitizing compositions, kits and to methods for using thereof such as for reducing pathogen load on a substrate.

A detergent comprising (A) an anionic surfactant, (B) a quaternary ammonium cation-modified silicone, and (C) an organic acid is described. A mass ratio [(A)/(B)] of the component (A) to the component (B) is 100 or more, and a mass ratio [(A)/(C)] of the component (A) to the component (C) is 1 or more and 900 or less.

The present invention provides: a cleaning liquid for semiconductor substrates having undergone CMP, the cleaning liquid being excellent in temporal stability and cleaning performance; and a method of cleaning such semiconductor substrates. A cleaning liquid of the invention contains: a first amine compound which is represented by Formula (1) and whose conjugated acid has a first acidity constant of not less than 8.5; and a second amine compound (provided that the first amine compound is excluded). The mass ratio of the first amine compound content to the second amine compound content is 1 to 100, and the cleaning liquid has pH of 6.0-12.0 at 25° C.

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Effervescent compositions for preparing home care products and methods for preparing the same are disclosed. The effervescent compositions may include an effervescent base, one or more surfactants, one or more solidifying agents, and one or more disintegrant agents. The effervescent base may include one or more alkali metal carbonates and one or more acids. The one or more alkali metal carbonates and the one or more acids may be present in a weight ratio of from about 1:1 to about 5:1. The effervescent composition may be substantially free of water. The effervescent composition may have a dissolution time of from about 6 min to about 12 min. The method for preparing the effervescent composition may include contacting the effervescent base, the surfactants, the solidifying agents, and the disintegrant agents with one another to prepare a mixture, which may be a homogenous mixture.

The present disclosure relates to cleaning compositions that can be used to clean semiconductor substrates. These cleaning compositions can be used to remove defects arising from previous processing steps on these semiconductor substrates. These cleaning compositions can remove the defects/contaminants from the semiconductor substrates and thereby make the substrates appropriate for further processing. The cleaning compositions described herein primarily contain at least one organic acid and at least one anionic polymer.

A cleaning composition for an oral appliance, including the following components (A) and (B): (A) an unsaturated fatty acid having 10 or more and 20 or less carbon atoms or a salt thereof in an amount of 0.5 mass % or more and 14 mass % or less in terms of the fatty acid, and (B) one or more surfactants selected from the group consisting of an anionic surfactant (b1), a nonionic surfactant (b2), and an amphoteric surfactant (b3), and the composition has a pH at 25° C. of 5.5 or higher and 14 or lower.

The present disclosure relates to a cleaning composition for removing an oxide including one selected from an organic acid, an inorganic acid, and any combination thereof; one selected from an organic salt, an inorganic salt, and any combination thereof; an oxidizing agent; a surfactant; and water, and a method of cleaning using the cleaning composition.

The cleaning agent composition for hard surface contains at least one kind of carboxylic acid compound selected from the group consisting of an aliphatic monocarboxylic acid, a polycarboxylic acid, and any neutralized salt of these, a specific first alkyleneoxy group-containing compound, a specific second alkyleneoxy group-containing compound, and a specific oxypropylene group-containing compound.

Concentrated surfactant compositions, and more specifically, concentrated low pH compositions comprising sulfated surfactants. Methods of making and using the same.

Solid rinse aid compositions and methods of making and using the same are disclosed. Solid rinse aid compositions include in a single concentrate composition a pyrithione preservative system to replace conventional preservatives in the isothiazolinone family, such as chloromethylisothiazolinone. Beneficially, the pyrithione preservative systems eliminate the need for any personal protective equipment to handle the solid rinse aid compositions. Methods of making and use using the rinse aids are also disclosed.