The invention is directed to the field of pro-fragrances used in detergents and cleaning agents, cosmetic agents and air fresheners, for example. The invention relates to particular cyclic ketals used as pro-fragrances. The invention also relates to detergents and cleaning agents, cosmetic agents and air fresheners containing ketals of the type. The invention further relates to a method for creating a long-lasting fragrance on surfaces and for repelling insects.

Disclosed are metal cleaning formulations and methods of use. A formulation of the present teachings comprises one or more furoate esters such as ethyl 5-methyl-2-furoate and methyl 5-methyl-2-furoate. The formulations further comprise a base oil, which can be, for example, a naphthenic oil, a synthetic oil or a combination thereof. In some embodiments, a formulation can further comprise a metal protection additive and a lubrication additive. A variety of base oils, metal protection additives, and lubrication additives are suitable for use in the present teachings. Formulations of the present teachings are especially useful for the cleaning of metal products such as firearms. The cleaning power of a formulation of the instant teachings can exceed that required for US Military Specifications.

An absorbent substrate such as a wool dryer ball is imbued with a fragrance or treatment composition. The fragrance or treatment composition comprises an aqueous carrier, free fragrance, and encapsulated fragrance. The composition includes about 0.1 wt. % to about 5 wt. % free fragrance and about 0.1 wt. % to about 10 wt. % encapsulated fragrance. A kit includes absorbent balls, the fragrance or treatment composition, and an applicator for applying the fragrance or treatment composition onto or within the absorbent balls.

A cleaning composition, a cleaning apparatus, and a method of fabricating a semiconductor device, the cleaning composition including a surfactant; deionized water; and an organic compound, wherein the surfactant is included in the cleaning composition in a concentration of about 0.28M to about 0.39 M or a mole fraction of about 0.01 to about 0.017, and wherein the organic compound is included in the cleaning composition in a concentration of about 7.1 M to about 7.5 M or a mole fraction of about 0.27 to about 0.035.

A cleaning composition and process for cleaning post-chemical mechanical polishing (CMP) residue and contaminants from a microelectronic device having said residue and contaminants thereon. The cleaning compositions are substantially devoid of alkali hydroxides, alkaline earth metal hydroxides, and tetramethylammonium hydroxide. The composition achieves highly efficacious cleaning of the post-CMP residue and contaminant material from the surface of the microelectronic device without compromising the low-k dielectric material or the copper interconnect material.

A removal composition and process for cleaning post-chemical mechanical polishing (CMP) contaminants and particles from a microelectronic device having said particles and contaminants thereon. The removal compositions include at least one at least one organic additive; at least one metal chelating agent; and at least one polyelectrolyte. The composition achieves highly efficacious removal of the particles and CMP contaminant material from the surface of the microelectronic device without compromising the low-k dielectric, silicon nitride, and metal containing layers such as tungsten-containing layers.

Detergents and cleaning agents containing an anionic surfactant of general formula (I), in which n is a number from 5 to 21 and X.sup.+ is a charge-balancing cation. Also disclosed are an agent or a use, characterized in that, in the compound of general formula (I), X.sup.+ is selected from the group including the proton, alkali metal cations and the group N.sup.+R.sup.1R.sup.2R.sup.3, where R.sup.1, R.sup.2 and R.sup.3 are, independently of one another, hydrogen, an alkyl group with 1 to 6 C atoms or a hydroxyalkyl group with 2 to 6 C atoms.

A liquid laundry treatment composition comprising a surfactant comprising a C8-22 alkyl chain and a mole average of from 2s to 40 ethoxy late units, at least one ethoxy late unit or one alkyl chain comprising carbon obtained from carbon capture wherein the composition comprises octahydro tetramethyl acetophenone (OTNE).

A chemical composition and method of making and using are provided for paint removal and/or for adhesive removal. The chemical composition comprises THF and a solvent selected from the group consisting of methyl acetate, acetone, dimethyl carbonate, propylene carbonate, and 1-chloro-4 (trifluoromethyl) benzene, and a combination thereof.

The present invention relates to personal care compositions comprising malodor reduction compositions and methods of making and using such personal care compositions. Such personal care compositions comprising the malodor control technologies disclosed herein provide malodor control without leaving an undesireable scent and when perfume is used to scent such compositions, such scent is not unduely altered by the malodor control technology.