The present invention relates to a liquid hand dishwashing cleaning composition including a surfactant system, wherein the surfactant system includes an anionic surfactant and a co-surfactant, wherein the anionic surfactant includes a mixture of a linear anionic surfactant and a branched anionic surfactant with a defined degree of branching and with the branching predominantly on an unalkoxylated alkyl sulfate surfactant. Such compositions exhibit surprising and unexpected improved sudsing profile, preferably stable suds, especially when the manual dishwashing is performed in a sink full of water with the cleaning composition diluted in it.

Consumer and industrial 2-in-1 cleaning compositions providing both detergency and rinseability in a single cleaning composition are disclosed. Alkaline-based cleaning compositions containing a surface modification polymer and an alcohol alkoxylate nonionic surfactant, and methods of using the same provide user-friendly, solid, detergent compositions without the need for using a separate rinse aid composition.

A detergent composition includes a detersive surfactant and a graft polymer.

A solid fabric conditioner composition suitable for diluting with water to produce a liquid fabric conditioner composition, the solid fabric conditioner comprising: fabric softening active and xanthan gum.

A capsule delivery system. The system has a first capsule containing a first capsule wall encapsulating a first active material and a second capsule containing a second capsule wall encapsulating a second active material. The first and second capsules differ in their wall materials, amounts of wall materials, ratios of wall materials, core modifiers, scavengers, active materials, curing temperatures, heating rates, curing times, or a combination thereof. Also provided is a consumer product containing this capsule delivery system.

The invention relates to compositions and methods of treatment employing compositions comprising polyelectrolyte complexes. The compositions include a water-soluble first polyelectrolyte bearing a net cationic charge or capable of developing a net cationic charge and a water-soluble second polyelectrolyte bearing a net anionic charge or capable of developing a net anionic charge. The total polyelectrolyte concentration of the first solution is at least 110 millimolar. The composition is free of coacervates, precipitates, latex particles, synthetic block copolymers, silicone copolymers, cross-linked poly(acrylic) and cross-linked water-soluble polyelectrolyte. The composition may be a concentrate, to be diluted prior to use to treat a surface.

The present disclosure relates to cleansing compositions that are free of sulfate-based surfactants and free of sodium chloride. The cleansing compositions include: (a) one or more non-sulfate anionic surfactants; one or more amphoteric surfactants; one or more nonionic surfactants; (d) one or more hydrophobically modified poly(meth)acrylates; one or more silicones; and water. The cleansing compositions are particularly useful for cleansing hair and providing conditioning benefits to the hair.

The present disclosure relates to cleansing compositions that are free of sulfate-based surfactants and free of sodium chloride. The cleansing compositions include: (a) one or more non-sulfate anionic surfactants; one or more amphoteric surfactants; one or more nonionic surfactants; (d) one or more hydrophobically modified poly(meth)acrylates; one or more silicones; and water. The cleansing compositions are particularly useful for cleansing hair and providing conditioning benefits to the hair.

A structured liquid detergent composition includes water, an anionic detergent surfactant, and a nonionic detergent surfactant. A ratio of the anionic detergent surfactant to the nonionic detergent surfactant is from about 0.5 to about 20. The structured liquid detergent composition further includes a zwitterionic or amphoteric surfactant and a bacterial-derived cellulose network. The structured liquid detergent composition exhibits improved rheological properties.

An object of the present invention is to provide a cleaning liquid for a semiconductor substrate, which has excellent corrosion prevention performance for a metal-containing layer. In addition, another object of the present invention is to provide a method for cleaning a semiconductor substrate.

The cleaning liquid of an embodiment of the present invention is a cleaning liquid for a semiconductor substrate that has been subjected to a chemical mechanical polishing treatment, in which the cleaning liquid includes a component A having two or more onium structures in a molecule, and water, and has a pH of 7.0 to 11.8 at 25° C.