Patent classifications
C11D3/30
WASHING AND CLEANING AGENTS COMPRISING ENVIRONMENTALLY COMPATIBLE MICROCAPSULES
Washing and cleaning agents may include microcapsules comprising a core material where the core material may include at least one fragrance and a shell. The shell may consist of at least one first layer and one second layer with different chemical compositions. The shell may have a biodegradability, measured in accordance with OECD 301 F, of at least 40%. Such agents may be used for conditioning textiles or for cleaning textiles and/or hard surfaces.
TWO-IN-ONE DISHWASH DETERGENT
The present invention relates to a concentrate composition and its use solution for disinfecting and cleaning hard surfaces. The concentrate composition and the use solution comprise an alkylamidopropyl betaine, amphoteric surfactants and biocidal active substances at a moderately alkaline pH. The inventive composition is suitable for disinfecting and cleaning hard surfaces, in particular hard surfaces in contact with food products, such as surfaces found in food processing, manual warewashing, food services and health care industries. Methods of applying and making such concentrate composition and use solution are also provided.
TWO-IN-ONE DISHWASH DETERGENT
The present invention relates to a concentrate composition and its use solution for disinfecting and cleaning hard surfaces. The concentrate composition and the use solution comprise an alkylamidopropyl betaine, amphoteric surfactants and biocidal active substances at a moderately alkaline pH. The inventive composition is suitable for disinfecting and cleaning hard surfaces, in particular hard surfaces in contact with food products, such as surfaces found in food processing, manual warewashing, food services and health care industries. Methods of applying and making such concentrate composition and use solution are also provided.
POLYMERIZABLE SURFACTANT WITH REDUCIBILITY AND PREPARATION METHOD THEREFOR
The present disclosure relates to a polymerizable surfactant with reducibility and a preparation method thereof. The acid anhydride is reacted with a long-chain fatty alcohol to obtain an intermediate of an anhydride monoester, and then the obtained intermediate is reacted with the hydrochloride of dimethylaminohalogenated alkane, and a polymerizable surfactant with reducibility is obtained by post-processing. The polymerizable surfactant can not only play a role as a reactive emulsifier and copolymerize with monomers to obtain a soap-free emulsion, but also form a redox initiation system with peroxide, and conduct redox emulsion polymerization at room temperature. The soap-free emulsion synthesized by the polymerizable surfactant synthesized can greatly reduce the energy consumption in production, and can carry out one-step emulsion polymerization at normal temperature or low temperature to obtain an environment-friendly emulsion with a branched structure, thereby obtaining coatings with excellent water resistance, weather resistance, and impact resistance.
Rinsing Composition and Method for Treating Surface of Photoresist Material Using Same
The rinsing composition according to embodiments of the present invention includes a non-ionic fluorinated surfactant and a basic additive containing tetraalkylammonium hydroxide in a specific range of content, so as to reduce the number of defects possibly occurring in a pattern after development of photoresist in a fine patterning process, while preventing pattern collapse.
Rinsing Composition and Method for Treating Surface of Photoresist Material Using Same
The rinsing composition according to embodiments of the present invention includes a non-ionic fluorinated surfactant and a basic additive containing tetraalkylammonium hydroxide in a specific range of content, so as to reduce the number of defects possibly occurring in a pattern after development of photoresist in a fine patterning process, while preventing pattern collapse.
Wet sheet for cleaning
A wet sheet for cleaning includes multiple layers and is impregnated with a chemical solution. The wet sheet includes hydrophobic fiber layers arranged in a front surface layer and a back surface layer, and a hydrophilic fiber layer arranged in an intermediate layer. The hydrophobic fiber layers have an interlaced part with a high fiber density where the hydrophobic fiber layers are interlaced with the hydrophilic fiber layer. The interlaced part has at least one slightly interlaced part and at least one highly interlaced part which is formed in a dent shape and which is interlaced with a higher fiber density. The highly interlaced part is formed in an area ratio of 10 to 20% to an area of the front surface layer or the back surface layer. Static friction resistance of the wet sheet for cleaning is lower than kinetic friction resistance of the wet sheet for cleaning.
Spray container comprising a detergent composition
The need for a container and detergent composition which exhibit good cleaning, including on greasy soils, and good surface shine, while also maintaining spray visibility on the treated hard surface, is met by formulating an aqueous detergent composition using a low level of surfactant system, an aminoalcohol solvent, and a glycol ether solvent, at the specified ratios.
Spray container comprising a detergent composition
The need for a container and detergent composition which exhibit good cleaning, including on greasy soils, and good surface shine, while also maintaining spray visibility on the treated hard surface, is met by formulating an aqueous detergent composition using a low level of surfactant system, an aminoalcohol solvent, and a glycol ether solvent, at the specified ratios.
Post chemical mechanical planarization (CMP) cleaning
Provided are formulations that offer a high cleaning effect on inorganic particles, organic residues, chemical residues, reaction products on the surface due to interaction of the wafer surface with the Chemical Mechanical Planarization (CMP) slurry and elevated levels of undesirable metals on the surface left on the semiconductor devices after the CMP. The post-CMP cleaning formulations comprise one or more organic acid, one or more polymer and a fluoride compound with pH<7 and optionally a surfactant with two sulfonic acid groups.