A cleaning composition including a) from about 1% to about 60% by weight of the composition of a surfactant system comprising an anionic surfactant and a primary co-surfactant selected from the group consisting of amphoteric surfactant, zwitterionic surfactant and mixtures thereof; and b) from about 0.001% to about 5% by weight of the composition of a class II hydrophobin.

A cleaning composition including a) from about 1% to about 60% by weight of the composition of a surfactant system comprising an anionic surfactant and a primary co-surfactant selected from the group consisting of amphoteric surfactant, zwitterionic surfactant and mixtures thereof; and b) from about 0.001% to about 5% by weight of the composition of a class II hydrophobin.

A hand dishwashing cleaning composition including a) from 20% to 40% by weight of the composition of a surfactant system including an anionic surfactant and amphoteric surfactant in a weight ratio of from about 1:1 to about 3:1 and optionally a non-ionic surfactant wherein if the non-ionic surfactant is present the weight ratio of total surfactant to non-ionic surfactant is greater than 10:1; and b) from about 0.1% to about 3% by weight of the composition of an aminocarboxylic chelant selected from the group consisting of . glutamic-N,N-diacetic acid (GLDA) and its salts, methyl-glycine-diacetic acid (MGDA) and it salts, and mixtures thereof.

A hand dishwashing cleaning composition including a) from 20% to 40% by weight of the composition of a surfactant system including an anionic surfactant and amphoteric surfactant in a weight ratio of from about 1:1 to about 3:1 and optionally a non-ionic surfactant wherein if the non-ionic surfactant is present the weight ratio of total surfactant to non-ionic surfactant is greater than 10:1; and b) from about 0.1% to about 3% by weight of the composition of an aminocarboxylic chelant selected from the group consisting of . glutamic-N,N-diacetic acid (GLDA) and its salts, methyl-glycine-diacetic acid (MGDA) and it salts, and mixtures thereof.

A shaped detergent product comprising 10 to 100 wt. % of a first solid phase and 0 to 90 wt. % of one or more other phases, wherein the first solid phase comprises: a) non-crystalline chiral aminopolycarboxylate; b) non-crystalline organic acid other than component a); c) at most 30 wt. % water; d) at most 50 wt. % of non-crystalline water-soluble component other than component a) or component b); e) at most 20 wt. % of homogeneously dispersed crystalline material; wherein the combination of the components a), b) and c) is present in the first solid phase in a concentration of at least 35 wt. % of the total weight of the solid phase; and wherein components a), b) and c) are present in the solid phase in a ratio of from 25 to 88 parts by weight of free acid equivalent of component a): from 10 to 60 parts by weight of free acid equivalent of component b): from 2 to 30 parts by weight of component c); and wherein the shaped detergent product comprises at least 0.5 wt. % surfactant.

A shaped detergent product comprising 10 to 100 wt. % of a first solid phase and 0 to 90 wt. % of one or more other phases, wherein the first solid phase comprises: a) non-crystalline chiral aminopolycarboxylate; b) non-crystalline organic acid other than component a); c) at most 30 wt. % water; d) at most 50 wt. % of non-crystalline water-soluble component other than component a) or component b); e) at most 20 wt. % of homogeneously dispersed crystalline material; wherein the combination of the components a), b) and c) is present in the first solid phase in a concentration of at least 35 wt. % of the total weight of the solid phase; and wherein components a), b) and c) are present in the solid phase in a ratio of from 25 to 88 parts by weight of free acid equivalent of component a): from 10 to 60 parts by weight of free acid equivalent of component b): from 2 to 30 parts by weight of component c); and wherein the shaped detergent product comprises at least 0.5 wt. % surfactant.

Solid rinsing, cleaning and/or sanitizing compositions for various applications are provided. In particular, solid compositions include a complex of urea and an acid having desirable storage stability previously unavailable in solid urea/acid compositions. Stable solid compositions are disclosed and methods of making the same to overcome conventional limitations associated with with forming kinetically and thermodynamically stable solids that utilize urea/acid compositions.

Mixture of L- and D-enantiomers of methyl glycine diacetic acid (MGDA) or its respective mono-, di or trialkali metal or mono-, di- or triammonium salts, said mixture containing predominantly the respective L-isomer with an enantiomeric excess (ee) in the range of from 10 to 75%.

Mixture of L- and D-enantiomers of methyl glycine diacetic acid (MGDA) or its respective mono-, di or trialkali metal or mono-, di- or triammonium salts, said mixture containing predominantly the respective L-isomer with an enantiomeric excess (ee) in the range of from 10 to 75%.

The present disclosure relates to high alkaline cleaners, cleaning systems and methods for removing polymerized zero trans fat soils. The high alkaline cleaner of the present invention generally includes one or more alkaline wetting and saponifying agent(s), a chelating/sequestering system and a surface modifying-threshold agent system. In various embodiments, the cleaners may include, at least one cleaning agent comprising a surfactant or surfactant system and/or a solvent or solvent system and/or a cleaning booster such as a peroxide or sulfite type additive. The cleaners may also include one or more components to modify the composition form and/or the application method in some embodiments. All components described above may also be optimized optionally, to provide emulsification of a composition (both as a usable product or a concentrate that can be diluted to form a usable product). The use of the high alkaline cleaner of the present invention has demonstrated enhanced cleaning characteristics especially at higher temperatures (100° F. to about 300° F.) but also shows enhanced cleaning at ambient temperatures.