A liquid hand dishwashing detergent composition containing a cationically modified inulin compound, methods of making the liquid hand dishwashing detergent compositions, and methods of using said liquid hand dishwashing detergent compositions, which provide improved rinsing, solution feel, and finished product viscosity control.

A cleaning solution composition and a cleaning method using the cleaning solution composition are provided. The cleaning solution composition includes a chelating agent including a first organic acid and a second organic acid, and an etching agent including a fluoride compound.

The present disclosure relates to a semiconductor wafer cleaning composition for used in a semiconductor device manufacturing process and to a method of cleaning a semiconductor wafer using the cleaning composition. The cleaning composition includes surfactants represented by Formula 1 and Formula 2, respectively, an organic or inorganic acid, and water occupying for the remaining proportion. The cleaning method is a method of immersing a semiconductor wafer in the cleaning composition for 100 to 500 seconds. The cleaning composition and the cleaning method according to the present disclosure provide an incredibility improved removal rate and an effective cleaning power for contaminants, especially organic wax, during a process of polishing the surface of a wafer used to manufacture semiconductor devices, thereby providing a super-cleaned wafer surface, resulting in production of reliable semiconductor devices.

Compositions including an alginate lyase enzyme and anionic surfactant. Methods of treating fabrics by contacting the fabric with an aqueous wash liquor having the detergent composition therein. The compositions and methods are particularly for improving whiteness of a fabric, improved soil removal from a fabric, for malodour removal from a fabric, for anti-wrinkle benefits, anti-redeposition benefits and/or for improved drying of a fabric.

A cleaning solution composition and a cleaning method using the cleaning solution composition are provided. The cleaning solution composition includes a chelating agent including a first organic acid and a second organic acid, and an etching agent including a fluoride compound.

Disclosed therein are the methods of cleaning an automated recirculation system or equipment and using the waste effluent produced therefrom for use without the need to reduce the conductivity of such waste effluent prior to use. The method comprises cleaning the automated recirculation system or equipment with a cleaning solution having a conductivity of up to 8 mS/cm at 25° C., and generating a waste effluent. The waste effluent may be used as irrigation water without reducing conductivity of the waste effluent prior to irrigation use. Suitable automated recirculation systems or equipment may be those used in the processing operation of a processed food, dairy, brewing, or beverage. The automated recirculation system may be a clean-in-place (CIP) system.

The application relates to a process for the synthesis of organic sulfonic acid salts of amino acid esters comprising the steps of (i) reacting at least one lactam with at least 3 carbon atoms in the lactam ring with at least one organic sulfonic acid in an aqueous solution, (ii) esterification of the organic sulfonic amino acid salt of step (i) with at least one alcohol with at least 8 carbon atoms comprising at least one hydroxyl group, (iii) optionally removal of water and/or removal of excess alcohol of step (ii). The application also relates to organic sulfonic acid salts of amino acid esters of the general formula (I). ##STR00001##

A composition including an alginate lyase enzyme and cleaning adjunct. Methods of treating surfaces by contacting the surface with an aqueous wash liquor having the detergent composition therein.

The invention includes a solid rinse aid that is particularly designed for extrusion solid formation and which is effective for creating spotless surfaces after rinsing. According to the invention, application has identified the critical combination of solid surfactants, coupling agents, hydrotrope, and hardening agents that is acceptable in the extrusion process to create a solid. The hydrotrope includes one or more short-chain alkylbenzene and/or alkyl naphthalene sulfonates. The composition hardens quickly but not so quick as to negatively impact the extrusion process. The compositions may also be used to form pressed or cast solids.

The invention relates to the use of a detergent composition for removing hydrophobic residues and pigments on manufacturing or packaging devices or any other hardware used for manufacturing or packaging cosmetic or pharmaceutical compositions, said detergent composition including: a non-ionic surfactant selected from among the alkoxylated fatty alcohols; a non-aromatic co-surfactant selected from among the amine oxides, alkyl sulfates and alkyl sulfonates; and an organic alkaline agent selected from among the amino alcohols, excluding monoethanolamine, the non-aromatic co-surfactant being contained in the detergent composition in an amount of from 1 to 15 wt % in relation to the total weight of the composition.