A cleaning solution for a turbine engine includes water; a first organic acidic component that comprises citric acid; a second organic acidic component that comprises glycolic acid; isopropylamine sulphonate; alcohol ethoxylate; triethanol amine; and sodium lauriminodipropionate. The cleaning solution has a pH value between about 2.5 and about 7.0.

This disclosure relates to a cleaning composition that contains 1) at least one redox agent; 2) at least one chelating agent, the chelating agent being a polyaminopolycarboxylic acid; 3) at least one corrosion inhibitor, the corrosion inhibitor being a substituted or unsubstituted benzotriazole; 4) at least one sulfonic acid; and 5) water.

A composition is provided for use as a hard surface cleaner, sanitizer and/or disinfectant. In a preferred embodiment, the composition comprises an alkanesulfonic acid; a source of peroxide; an effective amount of a stabilizer; and water.

The present disclosure relates to high alkaline cleaners, cleaning systems and methods for removing polymerized zero trans fat soils. The high alkaline cleaner of the present invention generally includes one or more alkaline wetting and saponifying agent(s), a chelating/sequestering system and a surface modifying-threshold agent system. In various embodiments, the cleaners may include, at least one cleaning agent comprising a surfactant or surfactant system and/or a solvent or solvent system and/or a cleaning booster such as a peroxide or sulfite type additive. The cleaners may also include one or more components to modify the composition form and/or the application method in some embodiments. All components described above may also be optimized optionally, to provide emulsification of a composition (both as a usable product or a concentrate that can be diluted to form a usable product). The use of the high alkaline cleaner of the present invention has demonstrated enhanced cleaning characteristics especially at higher temperatures (100° F. to about 300° F.) but also shows enhanced cleaning at ambient temperatures.

A cleaning composition for post-etch or post ash residue removal from a substrate used in semiconductor industry and a corresponding use of said cleaning composition is described. Further described is a process for the manufacture of a semiconductor device from a semiconductor substrate, comprising the step of post-etch or post ash residue removal from a substrate by contacting the substrate with a cleaning composition according to the invention.

The invention includes a solid rinse aid that is particularly designed for extrusion solid formation and which is effective for creating spotless surfaces after rinsing. According to the invention, application has identified the critical combination of solid surfactants, coupling agents, hydrotrope, and hardening agents that is acceptable in the extrusion process to create a solid. The hydrotrope includes one or more short-chain alkylbenzene and/or alkyl naphthalene sulfonates. The composition hardens quickly but not so quick as to negatively impact the extrusion process. The compositions may also be used to form pressed or cast solids.

In one embodiment, a polyethoxylated alcohol sulfate composition is provided which includes a polyethoxylated alcohol sulfate, such as sodium laureth ether sulfate (SLES), water, an ionic liquid, and an alcohol. The ionic liquid and the alcohol form a synergistic blend, enabling a significant reduction of the viscosity of the polyethoxylated alcohol sulfate composition. Also provided is an embodiment of a method for modifying the rheology of polyethoxylated alcohol sulfate by use of an ionic liquid and alcohol blend. Finally provided is an embodiment of a detergent composition which is prepared by use of the polyethoxylated alcohol sulfate composition described herein, in addition to other commonly known ingredients.

A non-Newtonian concentrate composition includes a sensitizer or irritant, a surfactant, an anti-mist component and optionally a stability component. Example sensitizers and irritants include, but are not limited to, acids, quaternary compounds, and amines, and example anti-mist components include, but are not limited to, polyethylene oxide and polyacrylamide.

Stabilized peroxide-containing compositions stabilized with urea and urea/chelator stabilizer blends are provided. The compositions are particularly suitable for, but not limited to, cleaning applications on surfaces within food and beverage industries which may require the use of materials that are acceptable for incidental food/food products/feed contact. Further, the stabilized compositions are particularly suitable for applications requiring materials that are generally regarded as safe (GRAS) or for applications where non-GRAS materials must be minimized. Methods of stabilizing peroxide-containing compositions and methods of using the compositions are also provided.

Described herein is a water-soluble unit dose with a particle having a ratio of Linear Alkylbenzene Sulfonate to Alkylethoxylated Sulfate of greater than 1.