A vehicle hard surface cleaning composition is provided that includes a surfactant present from 0.1 to 8.0 total weight percent, a hydrotrope present from 0.1 to 3.0 total weight percent, a wetting agent present from 0.1 to 5.0 total weight percent, a protectant present from 0.01 to 17 total weight percent, and a diluent making up a remainder of the composition. A method of cleaning a vehicle hard surface include applying the composition thereto and washing the composition therefrom to leave a residue of graphene or graphene oxide.

The present disclosure relates to a semiconductor wafer cleaning composition for used in a semiconductor device manufacturing process and to a method of cleaning a semiconductor wafer using the cleaning composition. The cleaning composition includes surfactants represented by Formula 1 and Formula 2, respectively, an organic or inorganic acid, and water occupying for the remaining proportion. The cleaning method is a method of immersing a semiconductor wafer in the cleaning composition for 100 to 500 seconds. The cleaning composition and the cleaning method according to the present disclosure provide an incredibility improved removal rate and an effective cleaning power for contaminants, especially organic wax, during a process of polishing the surface of a wafer used to manufacture semiconductor devices, thereby providing a super-cleaned wafer surface, resulting in production of reliable semiconductor devices.

Solid rinse aid compositions and methods of making and using the same are disclosed. Solid rinse aid compositions include in a single concentrate composition a pyrithione preservative system to replace conventional preservatives in the isothiazolinone family, such as chloromethylisothiazolinone. Beneficially, the pyrithione preservative systems eliminate the need for any personal protective equipment to handle the solid rinse aid compositions. Methods of making and use using the rinse aids are also disclosed.

A hard surface cleaning composition is provided, including: carbon dioxide; an ionic acrylic based rheology modifier comprising at least one of an alkali swellable emulsion polymer and a hydrophobically-modified alkali swellable emulsion polymer; a pH adjuster; a surfactant; at least one of an alkyl benzene sulfonic acid and an alkyl benzene sulfonate; water; a cosolvent; and, optionally, a pH color indicator; wherein the pH of the hard surface cleaning composition is 3.5 to 6.0. Also provided is a method of cleaning a hard surface.

Cleaning compositions that include a non-functionalized alkyl polyglycoside, a nonionic surfactant system, and water. In certain embodiments, the cleaning compositions are substantially free of alkyl phenol ethoxylates. Additionally, some embodiments of the invention are substantially free of butyl cellosolve. The cleaning composition is capable of removing both proteinaceous food soils and hydrocarbon-based oily soils. The cleaning compositions include a biorenewable, environmentally friendly alternative to nonyl phenol ethoxylates and exhibit superior cleaning of food soils.

A non-oxidizing, buffered disinfectant concentrate is provided to be included in a solution used to disinfect a membrane. The solution applied to the membrane is configured to have a pH that is compatible with the membrane. The disinfectant concentrate includes an aqueous solvent; a hydrotrope; a strong acid surface cleanser; a biocidal active, preferably, at least two biocidal actives; a buffer agent; and, optionally, an anionic surfactant. The biodical active may be selected to function both as a biocide and as a weak acid/buffer combination. A disinfectant solution applied to the membrane includes from about 0.1 wt % to about 3.5 wt % of this disinfectant concentrate.

A cleaning solution composition and a cleaning method using the cleaning solution composition are provided. The cleaning solution composition includes a chelating agent including a first organic acid and a second organic acid, and an etching agent including a fluoride compound.

The invention meets the needs above by providing a surfactant system, mixture or blend that can be used as a part of a soaking composition. The surfactant system is capable of forming emulsions with, and thus removing, oily and greasy stains. In a preferred embodiment the surfactant compositions of the invention can remove non-trans fat and fatty acid stains. The invention involves foaming soaking compositions that have some or part of the anionic surfactant present in the same replaced with an extended chain anionic surfactant.

The invention provides to a powdered composition of additives and a method of use thereof for increasing the visibility, potency and coverage of disinfectant solutions, such as bleach.

Hard surface rinse aid compositions incorporating surfactant systems compatible with plastics and plastics containing metals, such as aluminum, are disclosed. The hard surface rinse aid compositions are particularly well suited for use in high concentrations at low temperatures without causing foaming and/or debris or film on the treated surface. In particular, the plastic and aluminum-compatible hard surface rinse aid compositions containing a surfactant system combining nonionic alcohol alkoxylates and a polymer surfactant can be used in treating hard surfaces requiring good sheeting, wetting and drying properties. The methods are particularly well suited for rinsing automotive parts, including those needing painting.