The present invention is to a granular laundry detergent composition including a first optical brightener and a second optical brightener. Also contemplated is a water-soluble unit dose article including granular laundry detergent composition.

Disclosed are fluorescent tags comprising a cannabinoid fluorophore and compositions comprising the fluorescent tags.

The present disclosure relates to a textile washing agent having at least one protease and a washing agent ingredient for cleaning textiles by removing protease-sensitive stains. The protease may have proteolytic activity and include an amino acid sequence having at least 70% sequence identity with the amino acid sequence given in SEQ ID NO:1 over its entire length and, in each case based on the numbering according to SEQ ID NO:1. The protease may have amino acid substitutions at the positions corresponding to positions 9, 130, 133, 144, 217, 252 and 271; and at least one additional amino acid substitution at least one of the positions corresponding to positions 6, 89, 131, 166, 189, 211 or 224. The washing agent may have a pH ranging from approximately 9 to approximately 12, measured in a 1 wt. % solution in deionized water at 20 C.

Provided are compositions and methods useful in the post-CMP cleaning of microelectronic devices, in particular, devices which contain one or more surfaces comprising hydrophobic carbon or SiC. In general, the compositions comprise a chelating agent; a water-miscible solvent; a reducing agent; and a pH adjustor, wherein the composition has a pH of about 2 to about 13.

Described herein is a method of using a cleaning composition in combination with one or more oxidants for removing post-etch or post-ash residue from the surface of a semiconductor substrate and/or for oxidative etching or partially oxidative etching of a layer or mask. Also described herein is the cleaning composition and a method of using the cleaning composition for removing post-etch or post-ash residue from the surface of a semiconductor substrate. Also described herein is a wet-etch composition including the cleaning composition and one or more oxidants as well as a method of using the wet-etch composition. Also described herein are a process for the manufacture of a semiconductor device from a semiconductor substrate and a kit including the cleaning composition and one or more oxidants.

The disclosure relates to enzymatic caustic-free detergent compositions for cleaning dairy processing surfaces (such as dairy CIP and dairy COP systems and their components). Also disclosed are methods of making and using the detergent compositions to beneficially remove fouling and clean the surfaces utilized in dairy production. The enzymatic caustic-free detergent compositions preferably comprise an enzyme, a surfactant, a water conditioning agent, a C2-C10 polyol, a buffer system, a salt, and water.