C11D3/349

Composition Comprising Hueing Agent
20210277335 · 2021-09-09 ·

This invention relates to a laundry care composition comprising a laundry care ingredient and a polymeric thiophene hueing agent.

2-in-1 Unit Dose Providing Softening And Detergency

Provided herein are 2-in-1 unit doses for treating fabrics. The 2-in-1 unit doses include a polyester receptacle coated with a softening agent, and a fabric cleaning agent disposed within the polyester receptacle. The polyester receptacle includes a plurality of pores permeable to liquid such that polyester receptacle allows liquid to diffuse into the cavity through the pores and dissolve the fabric cleaning agent. The 2-in-1 unit doses provide both softening and detergency to fabrics through a wash cycle in a washing machine and a heated dry cycle in a dryer.

Cleansing bars with taurine

Described herein, are cleansing bar compositions comprising at least one cleanser chosen from soap and surfactant; taurine, in free or salt form; and at least one polymer. Methods of making using the cleansing bar compositions are also described.

ESTERAMINE SALTS
20210154117 · 2021-05-27 ·

The present invention relates to an esteramine salt according to the general formula (I):

##STR00001##

The substituents R.sup.1, R.sup.2 and R.sup.3 are defined below.

The present invention further relates to a process for preparing such an esteramine salt according to general formula (I), wherein a corresponding monocarboxylic acid or an ester thereof are reacted with an aminoalcohol and an at least equimolar amount of a sulfonic acid.

Cleaning agent composition for substrate for semiconductor device
11028343 · 2021-06-08 · ·

In one aspect, provided is a cleaning agent composition for a substrate for a semiconductor device, the cleaning agent composition having excellent cleaning properties against ceria and being capable of reducing a temporal change in the solubility of ceria. In one aspect, the present disclosure relates to a cleaning agent composition for a substrate for a semiconductor device, the cleaning agent composition containing a component A, a component B, a component C, and a component D, the component A being sulfuric acid; the component B being ascorbic acid; the component C being at least one of thiourea and dithiothreitol and the component D being water.

CLEANING KIT

A cleaning kit comprising a cleaning agent comprising a supporting substrate and an oxidoreductase mediator. The oxidoreductase-mediator is immobilized on the supporting substrate.

CLEANING AGENT AND PREPARATION METHOD AND USE THEREOF
20210130750 · 2021-05-06 ·

Provided are a cleaning agent and a preparation method and the use thereof. The cleaning agent is prepared from the following raw materials comprising the following mass fraction of components: 0.5%-20% of an oxidant containing iodine, 0.5%-20% of an etchant containing boron, 1%-50% of a pyrrolidinone solvent, 1%-20% of a corrosion inhibitor, 0.01%-5% of a metal ion-free surfactant, and water, with the sum of the mass fraction of each component being 100%, the pH of the cleaning agent is 7.5-13.5, and the corrosion inhibitor is one or more of a benzotriazole corrosion inhibitor, a hydrazone corrosion inhibitor, a carbazone corrosion inhibitor and a thiocarbohydrazone corrosion inhibitor. The cleaning agent can efficiently remove nitrides from hard mask residues with little effects on metals and low-K dielectric materials, and has a good selectivity.

CLEANING AGENT COMPOSITION FOR SUBSTRATE FOR SEMICONDUCTOR DEVICE
20210130739 · 2021-05-06 · ·

In one aspect, provided is a cleaning agent composition for a substrate for a semiconductor device, the cleaning agent composition having excellent cleaning properties against ceria and being capable of reducing a temporal change in the solubility of ceria.

In one aspect, the present disclosure relates to a cleaning agent composition for a substrate for a semiconductor device, the cleaning agent composition containing a component A, a component B, a component C, and a component D, the component A being sulfuric acid; the component B being ascorbic acid; the component C being at least one of thiourea and dithiothreitol; and the component D being water.

Active agent-containing fibrous structure articles

Active agent-containing fibrous structure articles, for example dryer-added fibrous structure articles and/or washing machine-added fibrous structure articles and/or hair care fibrous structure articles, and more particularly to consumable, single use, water-insoluble fibrous structure articles containing one or more active agents and optionally, one or more auxiliary ingredients, methods for making same, and methods for using same are provided.

FABRIC CARE COMPOSITION

A fabric care composition comprising a quaternary ammonium ester compound and a bispyridinium alkane antimicrobial active.