Patent classifications
C11D3/362
SATURATED QUATERNARY AMMONIUM COMPOUNDS, GLUTARALDEHYDE, AND TETRAKIS(HYDROXYMETHYL)PHOSPHONIUM SULFATE FOR CORROSION INHIBITION, CLEANING, AND BIOCIDAL EFFICACY IN HYDROGEN SYSTEMS
Methods for inhibiting corrosion, cleaning and/or providing biocidal efficacy in hydrogen rich environments that are in hydrogen systems or hydrogen mediums using saturated alkyl diquaternary compound containing compositions, saturated alkyl quaternary compound containing compositions, aldehyde containing compositions, and/or tetrakis(hydroxymethyl)phosphonium sulfate containing compositions are provided. The methods provide efficacious corrosion inhibition, cleaning and/or biocidal efficacy without loss of stability due to hydrogenation in hydrogen rich environments.
Compositions and Methods for Cleaning Membranes
A composition is disclosed for cleaning a membrane. The composition includes: (i) a non-ionic surfactant having the formula: RO(CH.sub.2CH.sub.2O).sub.nH, wherein R is a branched, substituted or unsubstituted, C.sub.11-15 alkyl group, wherein n is an average degree of ethoxylation, and wherein n is in the range of from 3 to 20; and (ii) at least one of an additional non-ionic surfactant, a water soluble solvent, or a hydrotrope. In one version of the composition, an upper limit of a range of molecular weights of the surfactant is 1300 grams or below. In another version of the composition, the composition has a gel point such that it will be in the liquid phase before and after dilution with any amount of water at all temperatures of 40 F. and above. A method of cleaning a membrane using the compositions is also disclosed.
Polishing compositions and methods of use thereof
This disclosure features a polishing composition that includes at least one abrasive; at least one first corrosion inhibitor that includes a phosphate or a phosphonate group; at least one complexing agent; at least one second corrosion inhibitor that is at least one azole compound; and optionally a pH adjuster.
FLUORO-SURFACTANT AND FLUORO-POLYMER FREE FLOOR CARE COMPOSITIONS AND USES THEREOF
Hard surface, namely floor coating compositions free of fluoro-surfactants and free of zinc cross-link agents are disclosed. More particularly, hard surface, namely floor coating compositions containing an organic polymer comprising (i) styrene or vinyl toluene and at least one monoethylenically unsaturated acid or anhydride, (ii) acrylic polymers or modified acrylic polymers, or (iii) combinations thereof as the floor coating material with a plasticizing agent, solvent and/or a coalescent and/or cosolvent, without the use of zinc cross-link agents and fluoro-surfactants are disclosed. The aqueous compositions and methods of use provide desired floor coating characteristics with enhanced sustainability profiles.
THE USE OF PHYTIC ACID CHELATOR FOR MICROBIAL RAPID KILL
Disclosed is the use of phytic acid and a zinc compound in an antimicrobial composition for microbial rapid kill. The antimicrobial composition finds particular application in liquid antimicrobial compositions for consumer products.
WAFER SURFACE CLEANING PROCESS
A method of removing particles from a surface of a wafer, the method including cleaning the wafer with an aqueous first solution. The aqueous first solution including a mixture of a first detergent, a second detergent, and a third detergent. The first detergent including an aqueous solution comprising a pH buffer, an inorganic alkali, a wetting and emulsifying agent, and a chelating agent. The second detergent including an aqueous solution comprising an emulsifier, a pH buffer, an inorganic alkali, a double electric agent, and a chelating agent. The third detergent including an aqueous solution comprising a pH buffer, a wetting and penetration agent, an antistatic and emulsifying agent, and a chelating agent.