The invention relates to compositions, methods of manufacture, and methods for reducing metal corrosion during alkaline cleaning. In particular, the method employs a hydroxyphosphono carboxylic acid in alkaline cleaning of hard surfaces.

A concentrate aqueous composition for removing Type I and Type III rouge from various stainless-steel items. The liquid composition comprises oxalic acid, a phosphonic acid, and various amines. The use of an amine has been found to provide synergistic results in removal of the noted types of corrosion from various stainless-steel items that include medical instruments, machines, equipment, pipes, tools, mixing and storage vessels, and the like.

A high foaming liquid alkaline cleaner comprises one or more alkalinity sources; one or more surfactants comprising a hydrotrope, one or more wetting and soil emulsifying surfactants, one or more foam volume generating surfactants, and one or more foam boosting surfactants and one or more sequestrants. Optionally, an organic solvent can be utilized. The high foaming liquid alkaline cleaning composition is generally prepared in a concentrated form and can be diluted as with water. The alkaline cleaner provides effective cleaning properties, with respect to fats, oils, and organic soils.

The present invention relates to a composition for cleaning surfaces and/or for detecting organic substances in a solution or on a surface, comprising a) at least one salt of the permanganic acid, ferric acid and/or chromic acid, b) at least one organic phosphonate and c) at least one persulphate,
wherein the at least one organic phosphonate has a general formula (I)

##STR00001##

wherein R.sup.1 is an organic moiety, X.sup.1 is OH or OM.sub.1 and X.sup.2 is OH or OM.sub.2, wherein M.sub.1 and M.sub.2 represent an alkali metal ion or ammonium ion, wherein the organic moiety R.sup.1 is a mono-substituted or multiple-substituted or unsubstituted C.sub.1-C.sub.12 alkyl moiety, C.sub.3-C.sub.10 cycloalkyl moiety or C.sub.6-C.sub.14 aryl moiety, wherein the organic moiety may be attached to 1 to 3 further phosphonate groups of the general formula (I).

To provide a composition for rinsing or cleaning a surface to which ceria particles are attached and a surface treatment method for removing ceria particles from the surface using the same.

The composition according to the present invention contains an anionic surfactant, an organic amine compound, and a protic organic acid molecule and has a pH of less than 6.

The invention provides a removal composition and process for cleaning post-chemical mechanical polishing (CMP) contaminants and ceria particles from a microelectronic device having said particles and contaminants thereon. The composition achieves highly efficacious removal of the ceria particles and CMP by-product contaminant material from the surface of the microelectronic device.

A formulation having at least one of a product stabilization solvent, a sequestrant or chelating agent, and an alkalinity agent capable of use in a cleaning operation at a reduced temperature. Optionally, the formulation may additionally comprise any one or more of a degreaser emulsifier solvent, a surfactant, a hydrotrope, a stabilizer, a biocide, and a buffer. An additive formulation of the invention, as defined herein, comprises these stated types of compounds and is combined with an alkalinity agent at the time of the formulations use in a reduced temperature dairy equipment cleaning operation. A full formulation of the invention, as defined herein, additionally comprises an alkalinity agent in addition to the other named compounds. In many cases, the full formulations are used in a reduced temperature dairy equipment cleaning operation without being combined with an additional alkalinity agent. The reduced temperature of the dairy equipment cleaning operation using the formulation of the invention may be less than about 50 C. or, alternatively, less than about 40 C.

Detergent compositions effective for controlling hard water scale accumulation are disclosed. Detergent compositions employing phosphinosuccinic acid and mono-, bis- and oligomeric phosphinosuccinic acid (PSO) derivatives with alkali metal carbonate and/or alkali metal hydroxide reduce hard water scale accumulation on treated surfaces at alkaline conditions between about pH of 9 and 12.5. Methods employing the detergent compositions and preventing hard water scale accumulation are also provided.

An ophthalmic composition includes effective amounts of a comfort enhancing agent, a surfactant, and a buffering agent. The comfort enhancing agent includes a first functional monomer that is 2-methacryloyloxyethyl phosphorylcholine (MPC). The comfort enhancing agent has a HLB value between 8 and 40. In addition, the comfort enhancing agent can further include a second functional monomer that is preferably n-butyl methacrylate (BMA).

The present disclosure relates to cleaning compositions that are used to clean semiconductor substrates. These cleaning compositions can remove the defects/contaminants arising from previous processing on the semiconductor substrates and thereby make the substrates appropriate for further processing. The cleaning compositions described herein primarily contain at least one pH adjusting agent and at least one biosurfactant.