Patent classifications
C11D7/247
Compositions for Engine Carbon Removal and Methods and Apparatus for Removing Carbon - III
The testing of various chemicals has yielded new chemicals and chemical mixtures for the use of removing carbon deposits from the internal combustion engine. Some of these chemicals and chemical mixtures have proven to work better across many different carbon types than other chemicals that were tested. These chemical terpenes are typically produced from plants. One standard terpene mixture is known as turpentine. The chemical turpentine and chemicals found in turpentine have been determined, through our research and testing, to be extremely effective at removing the carbon that is produced within the internal combustion engine.
CLEANING COMPOSITIONS AND METHODS OF USE THEREFOR
The present disclosure is directed to non-corrosive cleaning compositions that are useful primarily for removing residues (e.g., plasma etch and/or plasma ashing residues) and/or metal oxides from a semiconductor substrate as an intermediate step in a multistep manufacturing process.
ALL-NATURAL CLEANER, LUBRICANT AND PROTECTANT COMPOSITION
An all-natural multi-purpose cleaner, lubricant, and protectant composition includes 85-90 percent by weight Ethanol; 5-10 percent by weight D-Limonene: 1-5 percent by weight Lard; and less than 1 percent by weight Beeswax.
BODY MOULDING SOLUTIONS
A solution for use in removing a double sided adhesive tape from mouldings and which can have the further property of conditioning the moulding for re-use. The solution comprising an admixture of ingredients which can synergistically function to give the desired properties and advantages. The mixture comprising: (a) a ratio of about 1:1 of Kerosene:Diesel; (b) 1 to 10% by vol. of an additive comprising a highly aromatic hydrocarbon solvent; and (c) 0 to 10% by vol. of perfume.
All-natural cleaner, lubricant and protectant composition
An all-natural multi-purpose cleaner, lubricant, and protectant composition includes 85-90 percent by weight Ethanol; 5-10 percent by weight D-Limonene: 1-5 percent by weight Lard; and less than 1 percent by weight Beeswax.
Cleaning agent composition and cleaning method
A cleaning agent composition for use in removal of a polysiloxane adhesive remaining on a substrate, the composition containing a tetrahydrocarbylammonium fluoride and an organic solvent, wherein the organic solvent contains an aromatic compound represented by formula (1) and a lactam compound represented by formula (2). ##STR00001##
(in formulas (1) and (2), s represents the number of substituents R.sup.100s of the benzene ring and is 2 or 3; s groups of R.sup.100s each independently represent a C1 to C6 alkyl group; the total number of carbon atoms in s groups of C1 to C6 alkyl groups is 3 or greater; R.sup.101 represents a C1 to C6 alkyl group; and R.sup.102 represents a C1 to C6 alkylene group.)
CLEANING COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN USING THE SAME
A cleaning composition according to an embodiment includes an alcohol solvent and a cumene compound. The content of the cumene compound is greater than 0 and 1 ppb or less based on the total weight of the composition. The cleaning composition may exhibit improved time-dependent stability and improved cleaning performance of semiconductor substrate residues.
Method for cleaning semiconductor substrate, method for producing processed semiconductor substrate, and stripping composition
The invention provides a semiconductor substrate cleaning method including a step of removing an adhesive layer provided on a semiconductor substrate by use of a remover composition, wherein the remover composition contains a solvent but no salt; and the solvent includes an organic solvent represented by formula (L) (in the formula, L represents a substituent to the benzene ring, and each of a plurality of Ls represents a C1 to C4 alkyl group; and k represents the number of Ls and is an integer of 0 to 5) in an amount of 80 mass % or more. ##STR00001##