C11D7/261

DETERGENT COMPOSITION FOR HARD SURFACES
20170362544 · 2017-12-21 ·

The cleaning agent composition for hard surface contains at least one kind of carboxylic acid compound selected from the group consisting of an aliphatic monocarboxylic acid, a polycarboxylic acid, and any neutralized salt of these, a specific first alkyleneoxy group-containing compound, a specific second alkyleneoxy group-containing compound, and a specific oxypropylene group-containing compound.

AGENT FOR LIQUEFYING CRUDE OIL AND/OR FOR REMOVING OIL RESIDUES
20230183618 · 2023-06-15 ·

The invention relates to a composition comprising a fatty acid-methyl ester component and an alcohol component, the composition being liquid at normal pressure at 20° C. and being immiscible with water. The invention further relates to a mixture containing crude oil, oil sludge and/or oil residues and the aforementioned composition. The invention also relates to a method for reducing the viscosity of crude oil, oil sludge and/or oil residues. The invention finally relates to a method for cleaning a surface from crude oil, oil sludge and/or oil residues.

Stabilized Heat Transfer Fluid Compositions
20230183538 · 2023-06-15 · ·

The present application provides stabilized compositions (e.g., stabilized heat transfer fluids) comprising methyl perfluoroheptene for use, for example, in refrigeration and heat transfer applications. The stabilized compositions of the present invention are useful in methods for producing cooling and heating, methods for replacing refrigerants and refrigeration, air conditioning, heat pump apparatuses, and as solvents or dewatering agents.

SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD

Disclosed is a substrate treating apparatus including the following units: a supplying unit which supplies a process liquid including a sublimable substance in a melt state on a pattern-formed surface of a substrate W; a solidifying unit which solidifies the process liquid on the pattern-formed surface to produce a solidified body; and a sublimating unit which sublimates the solidified body to remove the solidified body from the pattern-formed surface. In this apparatus, the sublimable substance includes a fluorinated carbon compound.

Cleaning composition and method for cleaning semiconductor wafers after CMP

The invention provides a composition for cleaning contaminants from semiconductor wafers following chemical-mechanical polishing. The cleaning composition contains one or more quaternary ammonium hydroxides, one or more organic amines, one or more metal inhibitors, and water. The invention also provides methods for using the cleaning composition.

Compositions and methods with efficacy against spores and other organisms

Compositions and methods for the disinfection of surfaces are provided. The compositions include at least about 40 weight percent of a C.sub.1-6 alcohol, and a primary enhancer selected from protein denaturants. The disinfectant composition is characterized by a pH of less than about 3. Broad spectrum efficacy is achieved, and synergistic activity is exhibited against C. difficile spores.

METHOD FOR DISSOLUTION OF POLYMERIZED SOIL
20170313960 · 2017-11-02 ·

A method for removing polymerized soil by adding to the soil a composition which includes: (a) from 4 to 30 wt % of a hydroxide or alkoxide, (b) from 10 to 96 wt % of a C.sub.1-C.sub.12 primary alcohol; and (c) from 0 to 75 wt % of an organic solvent which is not a C.sub.1-C.sub.12 primary alcohol; wherein the composition contains no more than 40 wt % water.

CLEANER COMPOSITION AND PREPARATION OF THIN SUBSTRATE

A cleaner composition consisting essentially of (A) 92.0 wt % to less than 99.9 wt % of an organic solvent, (B) 0.1 wt % to less than 8.0 wt % of a C.sub.3-C.sub.6 alcohol, and (C) 0.001-3.0 wt % of a quaternary ammonium salt is effective for removing any silicone adhesive residues on a silicon semiconductor substrate. A satisfactory degree of cleanness is achieved within a short time and at a high efficiency without causing corrosion to the substrate.

CLEANER COMPOSITION AND PREPARATION OF THIN SUBSTRATE

A cleaner composition consisting essentially of (A) 90.0-99.9 wt % of an organic solvent and (B) 0.1-10.0 wt % of a C.sub.3-C.sub.6 alcohol, and containing (C) 20-300 ppm of sodium and/or potassium is effective for cleaning a surface of a silicon semiconductor substrate. A satisfactory degree of cleanness is achieved within a short time and at a high efficiency without causing corrosion to the substrate.

Bioactive protein-polymer compositions

Bioactive coatings that include a base and a protein associated with the base for actively promoting the removal of organic stains are provided. In aspects, bioactive coatings that are stabilized against inactivation by weathering are provided including a base associated with a chemically modified enzyme, and, optionally a first polyoxyethylene present in the base and independent of the enzyme. The coatings are optionally overlayered onto a substrate to form an active coating facilitating the removal of organic stains or organic material from food, insects, or the environment.