Patent classifications
C11D7/261
Stripping compositions for removing photoresists from semiconductor substrates
This disclosure relates to compositions containing 1) at least one water soluble polar aprotic organic solvent; 2) at least one quaternary ammonium hydroxide; 3) at least one carboxylic acid; 4) at least one Group II metal cation; 5) at least one copper corrosion inhibitor selected from the group consisting of 6-substituted-2,4-diamino-1,3,5-triazines; and 6) water, in which the composition is free of a compound comprising at least three hydroxyl groups. The compositions can effectively strip positive or negative-tone resists or resist residues, and be non-corrosive to bumps and underlying metallization materials (such as SnAg, CuNiSn, CuCoCu, CoSn, Ni, Cu, Al, W, Sn, Co, and the like) on a semiconductor substrate.
HAND SANITIZERS WITH IMPROVED AESTHETICS AND SKIN-CONDITIONING TO ENCOURAGE COMPLIANCE WITH HAND HYGIENE GUIDELINES
Hand sanitizers are provided with improved aesthetics and skin-conditioning effects, such that healthcare workers and others subject to high frequency hand hygiene requirements are encouraged to comply with said requirements. The hand sanitizers provide excellent antimicrobial efficacy and skin conditioning benefits that actually increase with increased frequency of use. The sanitizing compositions are hydroalcoholic, and contain a synergistic combination of skin-conditioning agents.
WET WIPER ARTICLES AND METHODS FOR CLEANING REMOVABLE DENTAL APPLIANCES
A wet wiper for cleaning accumulated oral debris from removable dental appliances. The wet wiper comprises a water insoluble substrate and a physiologically acceptable cleansing composition, wherein the cleansing composition comprises: (i) a liquid carrier consisting of a solution of water and ethyl alcohol, wherein the ethyl alcohol is about 3% to about 90% by weight of the cleansing composition, and wherein the water is q.s. to 100%; (ii) about 0.001% to about 5% by weight of the cleansing composition of a flavor; (iii) 0 to about 5% by weight of the cleansing composition of an anionic surfactant; (iv) 0 to about 5% by weight of the cleansing composition of a nonionic surfactant; (v) 0 to about 5% by weight of the cleansing composition of a suds suppressor; (vi) 0 to about 2% by weight of the cleansing composition of a zinc salt; (vii) 0 to about 3% by weight of the cleansing composition of a chelant; (viii) 0 to about 5% by weight of the cleansing composition of a buffering agent; (ix) 0 to about 5% by weight of the cleansing composition of an antimicrobial, antiplaque agent; (x) 0 to about 5% by weight of the cleansing composition of an anticalculus agent; (xi) 0 to about 30% by weight of the cleansing composition of a humectant; (xii) 0 to about 5% by weight of the cleansing composition of a preservative; (xiii) 0 to about 2% by weight of the cleansing composition of a sweetener; and (xiv) 0 to about 2% by weight of the cleansing composition of a water soluble polymer; wherein the cleansing composition has a pH of from about 3.0 to about 13.0 and is loaded onto the substrate at a loading factor of at least about 0.5 grams of composition per gram of dry substrate so that the substrate is wet by the composition. Methods for cleaning removable dental appliances are also provided, such methods comprising the step of contacting, for a time sufficient to reduce oral debris, the removable dental appliances, with a wet wiper of the present invention.
RUBBER CLEANING AND DEOXIDIZING COMPOSITION
A rubber cleaning composition includes water, a cleaning and oxidation removal agent, a conditioning agent, and a drying agent. The cleaning agent includes citric acid. The conditioning agent includes glycerin. The cleaning and oxidation removal agent is present in a water:cleaning and oxidation removal agent volume ratio of about 100:1 to about 300:1. The conditioning agent is present in a water:conditioning agent volume ratio of about 7:1 to about 8:1. The drying agent is present in a water:drying agent volume ratio of about 1:1 to about 2:1. The composition cleans, protects, and improves performance of rubber, such as climbing shoe rubber.
COMPOSITION FOR AVOIDING PATTERN COLLAPSE WHEN TREATING PATTERNED MATERIALS WITH LINE-SPACE DIMENSIONS OF 50 NM OR BELOW COMPRISING A BORON-TYPE ADDITIVE
Described herein is a non-aqueous composition including (a) an organic solvent, and (b) at least one additive of formulae I,
##STR00001##
where R.sup.1, R.sup.2, R.sup.3, and R.sup.4 are independently selected from C.sub.1 to C.sub.10 alkyl, C.sub.1 to C.sub.11 alkylcarbonyl, C.sub.6 to C.sub.12 aryl, C.sub.7 to C.sub.14 alkylaryl, and C.sub.7 to C.sub.14 arylalkyl; and n is 0 or 1.
Nail polish removing composition
The invention relates to compositions for removing nail polish comprising a solvent and a high load of colorant, preferably between 0.5 wt % and 5.0 wt %. Preferably, the composition has an absorption peak in a range between 460 nm and 600 nm, and a normalized extinction of at least 0.5 for at least one wavelength in the range when measured in an optically transparent solvent via spectrophotometer and across 1 cm path length in a ratio of 1:8 composition to optically transparent solvent. Methods of removing nail polish are also provided.
Magnetic recording medium and magnetic recording and reproducing apparatus
The magnetic recording medium includes: a non-magnetic support; and a magnetic layer including ferromagnetic powder, in which a difference S.sub.after−S.sub.before between a spacing S.sub.after measured on a surface of the magnetic layer by optical interferometry after ethanol cleaning and a spacing S.sub.before measured on the surface of the magnetic layer by optical interferometry before ethanol cleaning is more than 0 nm and 6.0 nm or less, and the non-magnetic support is an aromatic polyester support having a moisture absorption of 0.3% or less.
HEAT TRANSFER FLUID
The invention relates to a fluid comprising or consisting of glycerol and potassium acetate in a weight ratio interval of 3:2 to 1:6 with a water content of 55-80 w %, wherein the combined weight of glycerol and potassium acetate constitutes 20-45 w %, up to a maximum or total of 100 w %. The inventive fluid is useful as a heat transfer fluid, a deicing fluid or a windscreen washing fluid. A method for producing the inventive fluid is also provided.
NON-CORROSIVE PROCESS FOR CLEANING A RECYCLABLE MATERIAL
The invention relates to a non-corrosive process for cleaning a recyclable material comprising the following steps: (a) providing a contaminated recyclable material; (b) treating the contaminated recyclable material at a temperature in the range of from 45-30° C. with a solution that contains one or more polyols to remove contaminants from the contaminated recyclable material, wherein the one or more polyols is (are) present in an amount of at least 15 wt. %, based on the total weight of the solution, thereby forming a liquid 10 mixture which comprises one or more polyols, contaminants removed from the recyclable material, and treated recyclable material; (c) separating at a temperature in the range 10-55° C. at least part of the recyclable material as obtained in step (b) from the liquid mixture as obtained in step (b); (d) allowing at least part of the remaining liquid mixture as obtained in step (c) to phase-1 separate into a polyol phase and a phase which contains contaminants removed from the contaminated recyclable material; (e) recovering the polyol phase as obtained in step (d); (f) recovering the phase which contains contaminants removed from the recyclable material as obtained in step (d); and 20 (g) recovering the separated recyclable material as obtained in step (c).
SHORT-TERM WASH TREATMENT OF PRODUCE
A produce wash system, method, and short-term wash treatment are provided. For example, the produce wash system includes a produce line including a short-term wash device followed by a wash device, a short-term wash treatment that is applied by the short-term wash device to a product, wherein the short-term wash treatment is applied using a spray device that creates micrometer sized droplets, and wherein the short-term wash treatment remains on the product for a pretreatment time that lasts until the product reaches the wash device, and a wash treatment that is applied by the wash device to the product, wherein the wash treatment rinses the short-term wash treatment from the product defining the end of the pretreatment time. The pretreatment time is set at or below a damage threshold time beyond which the short-term wash treatment damages the product beyond a damage threshold.