This disclosure relates to a cleaning composition that contains 1) hydroxylamine, 2) an amino alcohol, 3) hexylene glycol, and 4) water.

Compositions and methods useful for removing residue and photoresist from a semiconductor substrate comprising: from about 5 to about 60% by wt. of water; from about 10 to about 90% by wt. of a water-miscible organic solvent; from about 5 to about 90% by wt. of at least one alkanolamine; from about 0.05 to about 20% by wt. of at least one polyfunctional organic acid; and from about 0.1 to about 10% by wt. of at least one phenol-type corrosion inhibitor, wherein the composition is substantially free of hydroxylamine.

A process for processing an alcohol-containing solvent is described. The process according to the invention is used in particular for the treatment of alcohol-containing solvents which are used, for example, for cleaning metal parts. Further subject matter of the present invention are compositions which are suitable for the aforementioned intended use, as well as the use of certain compositions for the purification of alcohol-containing solvents.

The present application provides quaternary azeotrope or azeotrope-like compositions comprising trans-dichloroethylene and three or more additional components. Methods of using the compositions provided herein in cleaning, defluxing, deposition, and carrier fluid applications are also provided.

This disclosure relates to a cleaning composition that contains 1) at least one redox agent; 2) at least one alkylsulfonic acid or a salt thereof, the alkylsulfonic acid containing an alkyl group substituted by OH or NH.sub.2; and 3) at least one aminoalcohol.

The present invention relates to a method, a system, and a kit of parts for cleaning a surface contaminated with a hazardous drug or a hazardous drug related product, which involves cleaning in succession with a quaternary ammonium solution followed by an isopropyl alcohol solution.

The present invention provides a means capable of improving a residue removing effect and improving storage stability in a composition for surface treatment which is used for reducing residues on a surface of an object to be polished after being polished chemical mechanical polishing. The present invention relates to a composition for surface treatment, wherein the composition contains a solvent and a dissolved gas, a concentration of the dissolved gas is 0.01 mg/L or more and 10 mg/L or less with respect to a total volume of the composition and the composition is used for reducing residues on a surface of an object to be polished after being polished by chemical mechanical polishing.

Bioactive coatings that include a base and a protein associated with the base for actively promoting the removal of organic stains are provided. In aspects, bioactive coatings that are stabilized against inactivation by weathering are provided including a base associated with a chemically modified enzyme, and, optionally a first polyoxyethylene present in the base and independent of the enzyme. The coatings are optionally overlayered onto a substrate to form an active coating facilitating the removal of organic stains or organic material from food, insects, or the environment.

Methods for cleaning a substrate are disclosed. The substrate comprises a dielectric surface and a metal surface. The methods comprise providing a cleaning agent to the reaction chamber.

Provided are a maintenance liquid and a maintenance method that can solve an ejection problem of a UV curable inkjet printer. The maintenance liquid includes: a first ingredient in which a water-soluble compound is soluble and a cured matter of a UV curable ink is insoluble. The maintenance method includes: a first cleaning process at which a water-soluble compound that adheres to an inkjet head included in the UV curable inkjet printer is dissolved by a first maintenance liquid including the first ingredient in which the water-soluble compound is soluble and a cured matter of a UV curable ink is insoluble, and a second cleaning process at which the inkjet head is cleaned by a second maintenance liquid including a second ingredient in which the water-soluble compound is insoluble and the cured matter of the UV curable ink is soluble.