This disclosure relates to a cleaning composition that contains 1) at least one redox agent; 2) at least one chelating agent, the chelating agent being a polyaminopolycarboxylic acid; 3) at least one corrosion inhibitor, the corrosion inhibitor being a substituted or unsubstituted benzotriazole; 4) at least one sulfonic acid; and 5) water.

A solvent composition has an oxygenated solvent and a siloxane solvent. In one embodiment, the oxygenated solvent is propylene glycol methyl ether and the siloxane solvent is hexamethyldisiloxane or octamethyltrisiloxane. In another embodiment, the solvent composition is an azeotrope of propylene glycol n-butyl ether and decamethyltetrasiloxane. The siloxane solvent can be used in any situation where one desires to remove a silicone deposit, e.g., conformal coatings, adhesives, sealants, greases, heat transfer fluids, paints, oils, etc.

A cleaning fabric wound on a roll (12) is used for cleaning printing cylinders (2, 3, 4) of a printing system (1). The cleaning fabric (13) includes a liquid absorbable material configured to be soaked with a cleaning liquid containing a polar additive configured to make the cleaning liquid polar. The roll (12) of cleaning fabric (13) is included in a cleaning cassette (10) which is movable between an idle position out of contact with the printing cylinders, and an active position in which the cleaning fabric (13) included in the cassette (10) is in contact with a printing cylinder to be cleaned.

A detergent composition for dry cleaning is disclosed. The detergent composition for dry cleaning includes a) 5 to 10% by weight of a fluorinated (fluoro-based) solvent, b) 1 to 2% by weight of a cleaning booster, c) 5 to 10% by weight of an anti-shrinkage agent, d) 40 to 50% by weight of a water-soluble solvent, and e) 30 to 40% by weight of water.

A solvent composition has an oxygenated solvent and a siloxane solvent. In one embodiment, the oxygenated solvent is propylene glycol methyl ether and the siloxane solvent is hexamethyldisiloxane or octamethyltrisiloxane. In another embodiment, the solvent composition is an azeotrope of propylene glycol n-butyl ether and decamethyltetrasiloxane. The siloxane solvent can be used in any situation where one desires to remove a silicone deposit, e.g., conformal coatings, adhesives, sealants, greases, heat transfer fluids, paints, oils, etc.

A process of cleaning a reactor includes providing an alcohol-containing material to the reactor; and providing a metathesis catalyst to the reactor. The reactor contains a high molecular weight polymer gel and an organoaluminum material. The alcohol-containing material is not an alkyl tartrate and may be selected from triisopropanolamine, 4-tert-butylcatechol, isopropanol, and phenol formaldehyde resins.

The present disclosure provides methods and compositions for cleaning soils from surfaces of processing equipment. The soils include aqueous based emulsion polymers that need to be removed from associated polymerization processing equipment. The equipment may be used in the production of paint or coating components. A cleaning composition is heated and applied to the equipment to be cleaned. Cleaning of interior surfaces can be performed using clean-in-place methods. The cleaning composition can include combinations of organic solvent, alkanolamine, water, chelating agent, alkali metal hydroxide, or surfactant.

The present invention provides cleaning solutions for removing ink, coating, varnish, adhesive, etc. residue from printing equipment. The cleaning solutions of the present invention comprise one or more solvents, preferably selected from acetoacetates, alcohols, glycol ethers, glycol esters, terpenes, and water, and are preferably free of surfactants. The cleaning solutions of the invention have a relative evaporation time (RET) of less than 60 seconds, and a ratio of the RET to the radius of the sphere of solubility of the resin in the ink to be removed of less than 6.

Improved stripper solutions for removing photoresists from substrates are provided that typically have flash points above about 95? C. and high loading capacities. The stripper solutions comprise diethylene glycol butyl ether, quaternary ammonium hydroxide, and an alkanolamine having at least two carbon atoms, at least one amino substituent and at least one hydroxyl substituent, the amino and hydroxyl substituents attached to two different carbon atoms. Some formulations can additionally contain a secondary solvent. The formulations do not contain DMSO. Methods for use of the stripping solutions are additionally provided.

A composition for semiconductor processing according to the disclosure contains (A) a compound represented by the following general formula (1), (B) a compound represented by the following general formula (2), (C) a compound having at least one functional group selected from the group consisting of an amino group and a salt thereof and a hydroxyl group (excluding the compound represented by the following general formula (1), a compound having a carboxyl group and a nitrogen-containing heterocyclic compound) and (D) a liquid medium, and, when the content of the (A) component is indicated by M.sub.A [mass %] and the content of the (B) component is indicated by M.sub.B [mass %], M.sub.A/M.sub.B is 1.0?10.sup.2 to 1.0?10.sup.4.

R.sub.2N(OH)(1)

R.sub.2NH(2) (In the formula (1) and the formula (2), R's each independently represent an alkyl group having 1 to 4 carbon atoms.)