C11D7/265

COFFEE OR MILK MACHINE AND METHOD OF OPERATING SUCH A MACHINE

A coffee machine including a frother with an outlet channel for coffee and milk foam, and supply channels for milk, air, and steam respectively, and a nonreturn valve to prevent a fluid in one of the channels from flowing in an undesirable direction. The coffee machine also includes a clean water supply channel that connects to the milk supply channel with a T-junction distant from the frother. The T-junction further connects to a source channel for the milk.

Cleaning method and cleaning apparatus
11612915 · 2023-03-28 · ·

There is provided a cleaning method and a cleaning apparatus capable of removing dirt on electrical contacts, the dirt being unable to be removed with deionized water, without adversely affecting a plating solution and a substrate holder which is a member for holding a substrate. A cleaning method according to the present disclosure is a cleaning method for a substrate holder having electrical contacts for supplying electric power to a substrate by contacting the substrate to plate the substrate, the method including a cleaning step of cleaning the electrical contacts attached to the substrate holder with a citric acid aqueous solution.

POWDER AND SOLID ALKALINE CLEANING COMPOSITIONS AND USE THEREOF FOR REMOVING GREASY SOILS
20230090860 · 2023-03-23 ·

Powder and cast solid alkaline cleaning compositions are disclosed. Powders and/or solidification of a highly alkaline detergent composition are provided including sodium hydroxide beads and/or liquid and sodium carbonate in combination with water conditioning polymers. Methods of cleaning for soil removal of baked on, greasy soils, including those found in ovens, are also disclosed.

Composition having suppressed alumina damage and production method for semiconductor substrate using same

The present invention pertains to: a composition capable of removing dry etching residue present on the surface of a semiconductor integrated circuit, while suppressing alumina damage in a production process for the semiconductor integrated circuit; a cleaning method for semiconductor substrates that use alumina; and a production method for a semiconductor substrate having an alumina layer. This composition is characterized by containing 0.00005%-1% by mass of a barium compound (A) and 0.01%-20% by mass of a fluorine compound (B) and having a pH of 2.5-8.0.

Phosphorus free low temperature ware wash detergent for reducing scale build-up

Phosphorus-free detergent compositions are provided. Detergent compositions including an aminocarboxylate, water conditioning agent, source of alkalinity and water beneficially do not require the use of additional surfactants and/or polymers to provide suitable detergency and prevent scale build-up on treated surfaces. The detergent compositions are used with a sanitizer to employ the phosphorus-free detergent compositions for use as low temperature ware wash detergents that beneficially reduce scale build-up. Methods of employing the phosphorus-free detergent compositions are also provided.

A METHOD TO DEINK PLASTIC MATERIAL
20230129662 · 2023-04-27 ·

This disclosure relates to a method to deink plastic material comprising or provided with ink. The method comprises the step of contacting the plastic material with an oxidizing inorganic acid having a standard electrode potential of at least 0 V. The disclosure also relates to a method to delaminate and deink plastic material by contacting the plastic material with an oxidizing inorganic acid and with a short chain or medium chain fatty acid. Furthermore, the disclosure relates to an installation to deink or to delaminate and deink plastic material.

CLEANING AGENT COMPOSITION AND METHOD FOR PRODUCING PROCESSED SEMICONDUCTOR SUBSTRATE

The invention provides a cleaning agent composition for use in removing an adhesive residue, characterized in that the composition contains a quaternary ammonium salt, a metal corrosion inhibitor, and an organic solvent, and the metal corrosion inhibitor is formed of a C7 to C40 saturated aliphatic hydrocarbon compound monocarboxylic acid, a C7 to C40 saturated aliphatic hydrocarbon compound dicarboxylic acid or anhydride, a C7 to C40 unsaturated aliphatic hydrocarbon compound monocarboxylic acid, or a C7 to C40 unsaturated aliphatic hydrocarbon compound dicarboxylic acid or anhydride.

Cleaning liquid, cleaning method, and method for producing semiconductor wafer

The present invention relates to a cleaning liquid containing a component (A): a compound represented by the following formula (1), component (B): alkylamine, component (C): polycarboxylic acid, and component (D): ascorbic acid, in which a mass ratio of the component (A) to a total mass of the component (B) and the component (C) is 1 to 15, and in the formula (1), R.sup.1, R.sup.2, and R.sup.3 each have a definition same as the definition described in the description, ##STR00001##

Methods of treating fabrics with organic acids and related treatment compositions

Processes and uses related to treating fabrics with an organic acid, such as citric acid with certain treatment liquors or consumer product treatment compositions. A process to determine the presence of a metal-based residue on a fabric. Uses of a treatment composition or a treatment liquor to rejuvenate a non-white color of a fabric. Processes to demonstrate and/or display the color-rejuvenation benefits of a treatment composition.

ACIDIC LIQID FABRIC CARE COMPOSITIONS

An acidic liquid fabric care composition that includes: citric acid and/or a salt thereof; a first sulfur-containing compound selected from a sulfate compound, a bisulfate compound, or a combination thereof; a fragrance material; and water. Related methods of making and using such compositions.