Patent classifications
C11D7/266
DISPERSANT COMPOSITION
Disclosed is a composition comprising, substantially consisting of or consisting of: at least 30% of DMSO; andat least 20% of a fatty acid methyl ester or a mixture of said type of esters, the fatty acid containing 6 to 10 carbon atoms, the percentages being in percent by weight in relation to the total weight of the composition. The invention also relates to the use of a composition of said type as a cleaning agent and/or dispersion and to a method for synthesizing said composition.
SURFACE TREATMENT COMPOSITION, PREPARATION METHOD THEREOF, SURFACE TREATMENT METHOD USING THE SAME
A surface treatment composition according to the present invention is used for treating a surface of a polished object to be polished which is obtained after polishing with a polishing composition including ceria, using the surface treatment composition including a (co)polymer having a monomer-derived structural unit having a carboxyl group or a salt group thereof, a residue removing accelerator composed of a specific compound having a hydroxyl group, and a dispersing medium, wherein pH is less than 7.
Minimum boiling azeotrope of n-butyl-3-hydroxybutyrate and n-undecane and application of the azeotrope to solvent cleaning
A novel minimum boiling binary azeotrope of n-undecane and n-butyl-3-hydroxybutyrate is shown to have utility as a solvent for degreasing of both nonpolar and polar contaminants. The components of the azeotrope are stable against degradation and the composition is largely invariant with pressure, yielding a unique solvent that can be used in cold cleaning and in vapor degreasing at elevated temperatures and over a wide range of pressures.
COMPOSITION FOR DEFLUXING ELECTRONIC ASSEMBLIES
The invention relates to a composition intended for the cleaning of contaminants and flux residues on electronic assemblies, particularly solder cream residue. Said composition comprises: from 20% to 99.5% by weight of a main solvent consisting of at least a C6-C15 glycol ether, and optionally a secondary solvent, from 0.5% to 20% by weight of a selected acid additive which is a phosphoric acid ester. The invention also relates to a defluxing product incorporating said composition, as well as to the defluxing methods using these products
MANUFACTURING METHOD OF SECONDARY BATTERY
A method for manufacturing a secondary battery, includes: an electrode assembly formation process in which a unit stack is wound or stacked to form an electrode assembly; a coating process in which an area of a non-coating portion including a negative electrode tab and a positive electrode tab of the electrode assembly is coated; and a cleaning process in which the negative electrode tab and the positive electrode tab are cleaned after the coating process.
GELS COMPRISING A HYDROPHOBIC MATERIAL
The gel compositions as described herein, are less affected by changes in humidity, are readily formed into complex shapes, and can contain high loadings of the hydrophobic material, even when the material is not highly hydrophobic, and provide a more controlled release of the hydrophobic material.
CLEANING COMPOSITION FOR LIQUID CRYSTAL ALIGNMENT LAYER AND MANUFACTURING METHOD OF LIQUID CRYSTAL ALIGNMENT LAYER USING THE SAME
The present invention relates to a cleaning composition for a liquid crystal alignment layer, a manufacturing method of a liquid crystal alignment layer using the same, and a liquid crystal display device including the liquid crystal alignment layer manufactured by the manufacturing method. More specifically, the present invention relates to a cleaning composition for a liquid crystal alignment layer that is capable of solving a non-uniformity problem of the liquid crystal alignment layer and effectively removing an ionic byproduct on a polymer surface to increase anisotropy of the liquid crystal alignment layer, by using a cleaning composition including a specific solvent in a cleaning process after a UV alignment process, and a manufacturing method of a liquid crystal alignment layer.
NOVEL MINIMUM BOILING AZEOTROPE OF N-BUTYL-3-HYDROXYBUTYRATE AND N-UNDECANE AND APPLICATION OF THE AZEOTROPE TO SOLVENT CLEANING
A novel minimum boiling binary azeotrope of n-undecane and n-butyl-3-hydroxybutyrate is shown to have utility as a solvent for degreasing of both nonpolar and polar contaminants. The components of the azeotrope are stable against degradation and the composition is largely invariant with pressure, yielding a unique solvent that can be used in cold cleaning and in vapor degreasing at elevated temperatures and over a wide range of pressures.
Polyimide-based resin film cleaning liquid, method for cleaning polyimide-based resin film, method for producing polyimide coating, method for producing filter, filter medium, or filter device, and method for producing chemical solution for lithography
A polyimide-based resin film cleaning liquid includes at least one solvent selected from the group consisting of a hydroxy aliphatic carboxylic acid ester, an aliphatic carboxylic acid ester, a chain or cyclic ketone, an alkylene glycol monoalkyl ether, an alkylene glycol monoalkyl ether acetate, and an aprotic polar solvent other than these solvents.
POLYOL ESTERS OF METATHESIZED FATTY ACIDS AND USES THEREOF
Polyol esters of metathesized fatty acids are generally disclosed herein. Methods of using such compounds, for example, as cleaning agents, solvents, and coalescents for paints and coatings, are also disclosed.