Disclosed is an exterior chemical cleaning composition for a vehicle. The chemical cleaning composition may be capable of functioning as a universal cleaning solvent includes 2% hydrogen peroxide by volume, predetermined quantities of acetone water, propylene carbonate, dimethyl glutamate, dimethyl adipate, glycerin, panthenol, tocopheryl acetate, desired amount of distilled water, 1% by volume of acetate fragrance, 5 benzophenone-1, benzoate, yellow 11 and remaining water content. The chemical cleaning composition may be utilized for forming an effective solvent for cleaning a variety of surfaces including car body, kitchen hood, and other surfaces subjected to deposition of all kinds of stain, dirt, oil, marks, droppings and other coatings. The chemical cleaning composition may be used as an effective, simple and quick means for cleaning a vehicle body without affecting the underlying paint coating on the vehicle body.

The present disclosure relates to a thinner composition for cleaning SUS pipes and discharge nozzles in a process using a colored photosensitive composition, and to solve the problem of color mixing or particle generation due to colored residues in the subsequent process. That is, the composition within the range according to the present disclosure can effectively clean a colored photosensitive composition containing organic or inorganic pigments and organic or inorganic dyes, and can increase the yield in display production without residues, dark spots, etc.

Provided is a cleaning solvent composition that comprises a cis-1-chloro-3,3,3-trifluoropropene solvent and an additive, wherein the additive contains at least one type of compound selected from the group consisting of nitroalkanes and epoxides.

A wiping composition and a wiping product containing the composition are disclosed. The wiping composition contains a combination of an antimicrobial agent with a preservative enhancing agent that not only provides antiseptic properties when applied to an adjacent surface, but also is well suited to preserving the substrate that is used to apply the composition. In particular, the composition has been unexpectedly found to inhibit or destroy bacteria, particularly Burkholderia cepacia, even when the active ingredients are used at extremely low levels.

The invention relates to a composition intended for the cleaning of contaminants and flux residues on electronic assemblies, particularly solder cream residue. Said composition comprises: from 20% to 99.5% by weight of a main solvent consisting of at least a C6-C15 glycol ether, and optionally a secondary solvent, from 0.5% to 20% by weight of a selected acid additive which is a phosphoric acid ester. The invention also relates to a defluxing product incorporating said composition, as well as to the defluxing methods using these products

This disclosure relates to methods and compositions for treating a semiconductor substrate having a pattern disposed on a surface of the substrate.

A semiconductor processing composition for removing residues and/or contaminants from substrate containing Cu, barrier metal and low-k dielectric. The processing composition includes at least one quaternary base, at least one organic amine, at least one surface modifier, at least one antioxidant, at least one complexing agent and balance water. The processing composition provides a sufficient corrosion protection to Cu and metal barrier during process queue time without deteriorating reliability of electronic devices.

The present invention relates to a cleaning composition for a liquid crystal alignment layer, a manufacturing method of a liquid crystal alignment layer using the same, and a liquid crystal display device including the liquid crystal alignment layer manufactured by the manufacturing method. More specifically, the present invention relates to a cleaning composition for a liquid crystal alignment layer that is capable of solving a non-uniformity problem of the liquid crystal alignment layer and effectively removing an ionic byproduct on a polymer surface to increase anisotropy of the liquid crystal alignment layer, by using a cleaning composition including a specific solvent in a cleaning process after a UV alignment process, and a manufacturing method of a liquid crystal alignment layer.

A composition effective for removing solder fluxes either as a concentrated material or when diluted with water. The composition is effective in removing all types of solder fluxes including rosin type, resin type, no-clean, low residue, lead-free, organic acid and water soluble soldering fluxes. The composition comprises isopropylidene glycerol and an alkali and has a pH of greater than 7.5. The composition may contain additional optional solvents and additives to enhance cleaning of articles or to impart other properties to the composition. The composition can be contacted with a surface to be cleaned in a number of ways and under a number of conditions depending on the manufacturing or processing variables present.

The invention provides a composition for cleaning contaminants from semiconductor wafers following chemical-mechanical polishing. The cleaning composition contains a bulky protecting ligand, an organic amine, an organic inhibitor, and water. The invention also provides methods for using the cleaning composition.