This invention relates to a bleaching composition comprising hypochlorite-based bleach particles and moisture-sensitive particles encapsulating an oil within starch or starch-derivative matrix, the composition being surprisingly stable toward degradation of the starch upon storage.

A polishing method for polishing by sliding a semiconductor silicon wafer, held by a polishing head, against a polishing pad attached to a turn table while supplying a polishing agent, wherein the semiconductor silicon wafer is subjected to primary polishing, secondary polishing, and final polishing in turn, the secondary polishing comprises polishing by an alkaline based polishing agent which includes free abrasive grains and does not include a water-soluble polymer agent, and subsequent rinse polishing by a polishing agent which includes a water-soluble polymer agent and the rinse polishing includes two stages of polishing, wherein, after performing a first stage of the rinse polishing while supplying a polishing agent which includes a water-soluble polymer agent, a second stage of the rinse polishing is performed while supplying a switched polishing agent whose water-soluble polymer agent has an average molecular weight larger than the polishing agent of the first stage.

Solid detergent compositions for dishwashing or warewashing compositions and applications of use are disclosed. In particular, solid carbonate-based compositions that do not require a traditional dispenser for controlled rate of release over multiple cycles are disclosed. Compositions, methods of employ and cleaning using the same are disclosed.

An enzymatically produced -glucan oligomer/polymer compositions is provided. The enzymatically produced -glucan oligomer/polymers can be derivatized into -glucan ether compounds. The -glucan oligomers/polymers and the corresponding -glucan ethers are cellulose and/or protease resistant, making them suitable for use in fabric care and laundry care applications. Methods for the production and use of the present compositions are also provided.

An enzymatically produced -glucan oligomer/polymer compositions is provided. The enzymatically produced -glucan oligomer/polymers can be derivatized into -glucan ether compounds. The -glucan oligomers/polymers and the corresponding -glucan ethers are cellulose and/or protease resistant, making them suitable for use in fabric care and laundry care applications. Methods for the production and use of the present compositions are also provided.

Compositions and methods of the invention are directed to the removal of solid films, and particularly paint layers, from substrates, and particularly smooth, porous, and/or mineralogically fragile substrates such as sandstone. The compositions include cooked aqueous solutions of starch. The compositions can advantageously remove paints and other unwanted solid films from these and other substrates without damaging the substrate itself.

A cleaning solution, composition, and portable cleaner are provided that is all natural, safe, non-toxic, edible, anti-bacterial, anti-viral, anti-microbial, deodorizing, and further includes a pleasant fragrance and taste. In addition, the cleaning composition can be free from sugar, alcohol, surfactants, and other harmful or harsh ingredients. In addition, the cleaning composition allows for quick cleaning of any type of object that may be placed in the mouth, such as pacifiers, toys, candy, eating utensils, musical instruments, and mouth-pieces, among others.

A composition comprising a plurality of particles, wherein said particles comprise: 40 to 95 w.t. % polyethylene glycol, wherein the polyethylene glycol has a weight average molecular weight from 4000 to 12000; 0.1 to 50 w.t. % anhydrous saccharide comprising one to ten monosaccharide units; and 0.1 to 20 w.t. % perfume materials.

A polishing method for polishing by sliding a semiconductor silicon wafer, held by a polishing head, against a polishing pad attached to a turn table while supplying a polishing agent, wherein the semiconductor silicon wafer is subjected to primary polishing, secondary polishing, and final polishing in turn, the secondary polishing comprises polishing by an alkaline based polishing agent which includes free abrasive grains and does not include a water-soluble polymer agent, and subsequent rinse polishing by a polishing agent which includes a water-soluble polymer agent and the rinse polishing includes two stages of polishing, wherein, after performing a first stage of the rinse polishing while supplying a polishing agent which includes a water-soluble polymer agent, a second stage of the rinse polishing is performed while supplying a switched polishing agent whose water-soluble polymer agent has an average molecular weight larger than the polishing agent of the first stage.

A treatment liquid is a treatment liquid for a semiconductor device containing an oxidizing agent, a corrosion inhibitor, water, and Fe, in which the content ratio of the Fe to the oxidizing agent is 10.sup.10 to 10.sup.4 in terms of mass ratio.