C11D7/30

AEROSOL DETERGENT COMPOSITION
20230220312 · 2023-07-13 · ·

A method for washing of car/vehicle/transportation means and braking device using an aerosol composition containing (Z)-1-chloro-3,3,3-trifluoropropene and gas propellant which is N.sub.2, compressed air, CO.sub.2, argon, or a mixture of two or more thereof.

AEROSOL DETERGENT COMPOSITION
20230220312 · 2023-07-13 · ·

A method for washing of car/vehicle/transportation means and braking device using an aerosol composition containing (Z)-1-chloro-3,3,3-trifluoropropene and gas propellant which is N.sub.2, compressed air, CO.sub.2, argon, or a mixture of two or more thereof.

Azeotropic composition containing 1,1,1,3,3,3-hexafluoro-2-methoxypropane
11530376 · 2022-12-20 · ·

An azeotropic composition a formulated with 1,1,1,3,3,3,-hexafluoro-2-methoxypropane and a second component selected from the group consisting of isopropyl alcohol, ethanol, methanol, and trans-1,2-dichloroethylene. The azeotropic composition exhibits a substantially constant boiling point at a constant pressure and is useful for various cleaning and degreasing applications.

Azeotropic composition containing 1,1,1,3,3,3-hexafluoro-2-methoxypropane
11530376 · 2022-12-20 · ·

An azeotropic composition a formulated with 1,1,1,3,3,3,-hexafluoro-2-methoxypropane and a second component selected from the group consisting of isopropyl alcohol, ethanol, methanol, and trans-1,2-dichloroethylene. The azeotropic composition exhibits a substantially constant boiling point at a constant pressure and is useful for various cleaning and degreasing applications.

Methods for degreasing surfaces

Methods for cleaning surfaces are provided. Such a method may comprise contacting a surface with a fluid comprising a compound of Formula I for a period of time; and removing the fluid from the surface, thereby providing a cleaned surface. Vapor phase degreasing systems for cleaning a surface of a component are also provided. Such a system may comprise a boil sump comprising liquid comprising a compound of Formula I; and a holder configured to hold a component in a vapor formed from the liquid.

Methods for degreasing surfaces

Methods for cleaning surfaces are provided. Such a method may comprise contacting a surface with a fluid comprising a compound of Formula I for a period of time; and removing the fluid from the surface, thereby providing a cleaned surface. Vapor phase degreasing systems for cleaning a surface of a component are also provided. Such a system may comprise a boil sump comprising liquid comprising a compound of Formula I; and a holder configured to hold a component in a vapor formed from the liquid.

Substrate treating method, substrate treating liquid and substrate treating apparatus
11574821 · 2023-02-07 · ·

A substrate treating method, liquid and apparatus are provided which can reduce the amount of sublimable substance used for the drying of a substrate while reducing the collapse of pattern. The substrate treating method includes a step of supplying a liquid to the pattern-formed surface of the substrate, a step of solidifying the liquid on the pattern-formed surface to form a solidified body and a step of subliming the solidified body so as to remove it from the pattern-formed surface. The substrate treating liquid includes a molten sublimable substance and a solvent, the freezing point of the sublimable substance being higher than the freezing point of the solvent. When the sublimable substance and the solvent are separated, the sublimable substance is settled and in the solidification step, the settled sublimable substance is solidified to have a height equal to or higher than the height of a pattern.

Substrate treating method, substrate treating liquid and substrate treating apparatus
11574821 · 2023-02-07 · ·

A substrate treating method, liquid and apparatus are provided which can reduce the amount of sublimable substance used for the drying of a substrate while reducing the collapse of pattern. The substrate treating method includes a step of supplying a liquid to the pattern-formed surface of the substrate, a step of solidifying the liquid on the pattern-formed surface to form a solidified body and a step of subliming the solidified body so as to remove it from the pattern-formed surface. The substrate treating liquid includes a molten sublimable substance and a solvent, the freezing point of the sublimable substance being higher than the freezing point of the solvent. When the sublimable substance and the solvent are separated, the sublimable substance is settled and in the solidification step, the settled sublimable substance is solidified to have a height equal to or higher than the height of a pattern.

SOLVENT COMPOSITION, CLEANING METHOD, AND METHOD FOR PRODUCING ARTICLE PROVIDED WITH COATING FILM
20220348808 · 2022-11-03 · ·

The present invention provides a solvent composition that can inhibit corrosion of a metal, a cleaning method using the solvent composition, and a method for producing an article provided with a coating film. The solvent composition of the present invention comprises 1-chloro-2,3,3-trifluoropropene and a specified second component, and is characterized in that the proportion of the total amount of the content of the second component to the sum of the content of 1-chloro-2,3,3-trifluoropropene and the total amount of the content of the second component is from 0.0001 to 1.0 mass %.

SOLVENT COMPOSITION, CLEANING METHOD, AND METHOD FOR PRODUCING ARTICLE PROVIDED WITH COATING FILM
20220348808 · 2022-11-03 · ·

The present invention provides a solvent composition that can inhibit corrosion of a metal, a cleaning method using the solvent composition, and a method for producing an article provided with a coating film. The solvent composition of the present invention comprises 1-chloro-2,3,3-trifluoropropene and a specified second component, and is characterized in that the proportion of the total amount of the content of the second component to the sum of the content of 1-chloro-2,3,3-trifluoropropene and the total amount of the content of the second component is from 0.0001 to 1.0 mass %.