Disclosed herein are a solvent composition and methods of using the solvent composition. The solvent composition includes at least 80 wt. % of trans-1,2-dichloroetheylene (t-DCE), and 0.1 to 20 wt. % of at least one organic compound. The organic compound may be a hydrocarbon and/or an oxygenated solvent. The solvent composition may be used to clean a surface by contacting the surface with the composition to dissolve a contaminant on the surface. The composition may be used to remove a coating from a surface of a substrate by contacting the surface with the solvent composition to dissolve the coating and removing the composition containing the coating from the surface. The composition may also be used to deposit material on a substrate by dissolving the material in the solvent composition, applying the composition containing the material onto the substrate, and evaporating the composition from the substrate.

Composition, method and system for TiN hard mask removal from electronic circuitry devices, such as advanced pattern wafers have been disclosed. The cleaning compositions preferably comprise an etchant agent (also referred to as a base), an oxidizing agent, an oxidizing stabilizer (also referred to as a chelating agent), an ammonium salt, a corrosion inhibitor, and a solvent. Other optional additives could be provided. It is preferable that the pH of the cleaning composition be greater than 5.5. The cleaning composition is preferably free from dimethyl sulfoxide and tetramethylammonium hydroxide.

Various uses of monochlorotrifluoropropenes, in combination with one or more other components, including other fluoroalkenes, hydrocarbons; hydrofluorocarbons (HFCs), ethers, alcohols, aldehydes, ketones, methyl formate, formic acid, water, trans-1,2-dichloroethylene, carbon dioxide and combinations of any two or more of these, in a variety of applications, including as blowing agents, are disclosed.

Disclosed herein are a solvent composition and methods of using the solvent composition. The solvent composition includes at least 80 wt. % of trans-1,2-dichloroetheylene (t-DCE), and 0.1 to 20 wt. % of at least one organic compound. The organic compound may be a hydrocarbon and/or an oxygenated solvent. The solvent composition may be used to clean a surface by contacting the surface with the composition to dissolve a contaminant on the surface. The composition may be used to remove a coating from a surface of a substrate by contacting the surface with the solvent composition to dissolve the coating and removing the composition containing the coating from the surface. The composition may also be used to deposit material on a substrate by dissolving the material in the solvent composition, applying the composition containing the material onto the substrate, and evaporating the composition from the substrate.

The present application provides liquefied-gas aerosol compositions which are useful in for preventing incidents of inhalation abuse. The compositions described herein comprise, for example, i) a propellant component comprising one or more hydrohaloolefins; and ii) one or more bitterants.

Various uses of monochlorotrifluoropropenes, in combination with one or more other components, including other fluoroalkenes, hydrocarbons; hydrofluorocarbons (HFCs), ethers, alcohols, aldehydes, ketones, methyl formate, formic acid, water, trans-1,2-dichloroethylene, carbon dioxide and combinations of any two or more of these, in a variety of applications, including as blowing agents, are disclosed.

In an embodiment a solvent composition can comprise, based on the total volume of the solvent composition, 10 to 95 volume percent of a first solvent, wherein the first solvent has Hansen solubility parameters of: 15 MPa.sup.0.5.sub.D17 MPa.sup.0.5, 4.sub.P10.5 MPa.sup.0.5, and 7.sub.H10 MPa.sup.0.5; 5 to 95 volume percent of a second solvent, wherein the second solvent has Hansen solubility parameters of: 16 MPa.sup.0.5.sub.D17.5 MPa.sup.0.5, 0.sub.P3 MPa.sup.0.5, and 0.sub.H3 MPa.sup.0.5; and 0 to 85 volume percent parachlorobenzotrifluoride; wherein the amounts of the first solvent, the second solvent, and parachlorobenzotrifluoride sum to at least 85 volume percent. The first solvent can comprise methyl acetate, acetone, dimethyl carbonate, ethyl acetate, n-butylamine, propyl acetate, tetrahydrofuran, or a combination thereof. The second solvent can comprise cyclohexene, cyclohexane, cyclopentane, methylcyclohexane, or a combination thereof. The solvent compositions are particularly useful in an adhesive composition. An adhesive composition includes the solvent composition, a rubber, and a tackifying resin. A method of bonding two surfaces is also described.

Composition, method and system for TiN hard mask removal from electronic circuitry devices, such as advanced pattern wafers have been disclosed. The cleaning compositions preferably comprise an etchant agent (also referred to as a base), an oxidizing agent, an oxidizing stabilizer (also referred to as a chelating agent), an ammonium salt, a corrosion inhibitor, and a solvent. Other optional additives could be provided. It is preferable that the pH of the cleaning composition be greater than 5.5. The cleaning composition is preferably free from dimethyl sulfoxide and tetramethylammonium hydroxide.

An aerosolized HVAC/R system solvent for decontaminating HVAC/R components and line sets The solvent contains 25-90 wt % propellant, and 10-75 wt % solvent mixture which is about 60-95 wt % trans-1,2,dichloroethylene, about 5-20 wt % n-propanol, and an inerting constituent providing a weight percent ratio of the inerting constituent to n-propanol of less than 1.5. The solvent is packaged in a container that is connected to the HVAC/R components or line sets to be decontaminated for supplying the solvent mixture under pressure to the HVAC/R components or line sets.

Disclosed herein are a solvent composition and methods of using the solvent composition. The solvent composition includes at least 80 wt. % of trans-1,2-dichloroetheylene (t-DCE), and 0.1 to 20 wt. % of at least one organic compound. The organic compound may be a hydrocarbon and/or an oxygenated solvent. The solvent composition may be used to clean a surface by contacting the surface with the composition to dissolve a contaminant on the surface. The composition may be used to remove a coating from a surface of a substrate by contacting the surface with the solvent composition to dissolve the coating and removing the composition containing the coating from the surface. The composition may also be used to deposit material on a substrate by dissolving the material in the solvent composition, applying the composition containing the material onto the substrate, and evaporating the composition from the substrate.