An additive manufacturing technique may include forming, on a surface of a substrate, a layer of material using an additive manufacturing technique. The material may include a sacrificial binder and a powder comprising an oxide-dispersion strengthened alloy dispersed in the binder. The technique may include forming, on the layer of material, at least one additional layer of material to form an additively manufactured component. The binder may be selectively sacrificed to leave the powder, for example, to form a component including an alloy.

A sputtering target containing, as metal components, 0.5 to 45 mol % of Cr and remainder being Co, and containing, as non-metal components, two or more types of oxides including Ti oxide, wherein a structure of the sputtering target is configured from regions where oxides including at least Ti oxide are dispersed in Co (non-Cr-based regions), and a region where oxides other than Ti oxide are dispersed in Cr or Co—Cr (Cr-based region), and the non-Cr-based regions are scattered in the Cr-based region. An object of this invention is to provide a sputtering target for forming a granular film which suppresses the formation of coarse complex oxide grains and generates fewer particles during sputtering.

In some examples, a method for additive manufacturing an article, the method including depositing a filament via a filament delivery device to form at least one track of the deposited filament, the at least one track of the deposited filament forming at least a portion of a preform article, wherein the filament includes a sacrificial binder and a powder, wherein the powder includes a plurality of elongated particles with each respective particle defining a longitudinal axis, wherein the longitudinal axes of the plurality of particles are substantially aligned with each other within the at least one track of the deposited filament; removing substantially all the binder from the at least one track of the preform article to form a powder article; and sintering the powder article to form a sintered article.

The present invention relates to a powder for sintering containing a mixture of a metal powder and metal oxide particles having an average particle diameter of 5 nm or more and 200 nm or less, and to a sintered body.

Methods of forming dispersoid hardened metallic materials are provided. In an exemplary embodiment, a method of producing dispersoid hardened metallic materials includes forming a starting composition with a base metal component and a dispersoid forming component. The starting composition includes the base metal component in an amount from about 50 to about 99.999 weight percent and the dispersoid forming component in an amount from about 0.001 to about 1 weight percent, based on the total weight of the starting composition. A starting powder is formed from the starting composition, and the starting powder is fluidized with a fluidizing gas for a period of time sufficient to oxidize the dispersoid forming component to form the dispersoid hardened metallic material. The dispersoid forming component is oxidized while the starting powder is a solid.

Provided is a sputtering target capable of reducing generation of particles, and a method for producing the same. The sputtering target includes: 10 mol % or more and 85 mol % or less of Co, 0 mol % or more and 47 mol % or less of Pt, and 0 mol % or more and 47 mol % or less of Cr, as metal components; and at least B.sub.6O as an oxide component.

A blade (10) for a turbine engine that includes an internal cooling system (56) formed from at least one cavity (58) positioned within a generally elongated airfoil (12). A squealer tip (36) and at least one densified oxide dispersion strengthened layer (38) extend radially from a radially outer tip cap (70) of the blade (10), the tip cap (70) having a tip cap upper surface (50).

A target for use in a physical vapor deposition process includes a matrix composed of a composite material selected from the group consisting of aluminum-based material, titanium-based material and chromium-based material and all combinations thereof. The matrix is doped with doping elements and the doping elements are embedded as constituents of ceramic compounds or aluminum alloys in the matrix. The doping elements are selected from the group of the lanthanides: La, Ce, Nb, Sm and Eu. A process for producing such a target and a use of such a target in a physical vapor deposition process are also provided.

A sputtering target according to the present invention contains Co and one or more metals selected from the group consisting of Cr and Ru, as metal components, wherein a molar ratio of the content of the one or more metals to the content of Co is ½ or more, and wherein the sputtering target contains Nb.sub.2O.sub.5 as a metal oxide component.

A metal composition, a method for additive manufacturing using such metal composition and the use of such metal composition is provided. The components of the metal composition are selected according to ranges and typically provide a more generic applicability in additive manufacturing.