Disclosed are coatings made of inorganic materials on molds for glass molding, particularly, a graded coating of element diffusion inhibition and adhesion resistance on molds for glass molding. The graded coating includes a Cr adhesion layer which is bonded with a substrate, a CrN intermediate layer and a Cr.sub.xW.sub.yN.sub.(1-x-y) surface layer, where 0.15<x<0.4, and 0.2≤y<0.45. The graded coating has excellent crack growth suppression and adhesion resistance.

Embodiments of the present disclosure relate to optical device films and methods of forming optical device films. Specifically, embodiments described herein provide for an optical device film having a constant oxygen-concentration, a first concentration profile of the first material, and a second concentration profile of the second material. The first material, described and referenced to herein, has a first refractive index about 2.0 or greater and the second material has a second refractive index less than 2.0.

A low friction wear film includes a chromium layer provided on a surface of a metal substrate, a tungsten carbide layer provided on a surface of the chromium layer, and a diamond-like carbon layer as a top layer provided on a surface of the tungsten carbide layer. The tungsten carbide layer includes a chromium-tungsten carbide gradient layer and a tungsten carbide uniform layer. In the tungsten carbide layer, a tungsten-concentrated layer in which a tungsten simple substance is present is not provided at a boundary between the chromium-tungsten carbide gradient layer and the tungsten carbide uniform layer.

A component for a processing chamber includes a ceramic body having at least one surface with a first average surface roughness. The component further includes a conformal protective layer on at least one surface of the ceramic body, wherein the conformal protective layer is a plasma resistant rare earth oxide film having a substantially uniform thickness of less than 300 μm over the at least one surface and having a second average surface roughness that is less than the first average surface roughness.

To provide a decorative member having a cherry blossom pink color. A cherry blossom pink decorative member of the present invention includes a base and a decorative coating formed on the base, wherein the decorative coating is formed by layering an undercoat layer and a finishing layer from the base side, the undercoat layer is a carbonitride layer composed of a carbonitride of a metal containing Ti and at least one selected from Nb and Ta, and the finishing layer is a Au alloy layer composed of an alloy containing Au, a metal having a silver color, and Cu.

Coated tool for hot stamping of coated or uncoated sheet metals, in particular for hot stamping of AlSi- or Zn-coated sheet metals.sub.[KM2], comprising a coated substrate surface to be in contact with the coated or uncoated metal sheet, wherein the coating in the coated substrate surface is a multi-layer coating comprising one or more inferior layers and one or more superior layers, where the inferior layers are deposited closer to the substrate surface than the superior layers, whereas: —the inferior layers are designed for providing load bearing capacity, —the superior layers are designed for providing galling resistance, —at least one superior layer (layer 5) is deposited having a multi-nanolayer structure formed by sublayers of the type A, B and C, said three kind of sublayers being nanolayers deposited alternate one on each other forming a sequence of the type . . . A/B/C/A/B/C/A . . . , wherein at least two sequences of one A nanolayer, one B nanolayer and one C nanolayer are deposited forming the multi-nanolayer structure wherein: —the nanolayer of type A is composed in at least 90 at.-% of chromium and nitrogen, —the nanolayer of type B is composed in at least 90 at.-% of titanium, aluminum and nitrogen, —the nanolayer of type C is composed I at least 90 at.-% of vanadium carbon and nitrogen, and —the layer thickness of the at least one superior layer (layer 5) is not lower than 0.5 μm and not higher than 15 μm.

To provide a decorative member having a cherry blossom pink color.

A cherry blossom pink decorative member of the present invention includes a base and a decorative coating formed on the base, wherein the decorative coating is formed by layering an undercoat layer and a finishing layer from the base side, the undercoat layer is a carbonitride layer composed of a carbonitride of a metal containing Ti and at least one selected from Nb and Ta, and the finishing layer is a Au alloy layer composed of an alloy containing Au, a metal having a silver color, and Cu.

Conventional electrochromic devices frequently suffer from poor reliability and poor performance. Improvements are made using entirely solid and inorganic materials. Electrochromic devices are fabricated by forming an ion conducting electronically-insulating interfacial region that serves as an IC layer. In some methods, the interfacial region is formed after formation of an electrochromic and a counter electrode layer. The interfacial region contains an ion conducting electronically-insulating material along with components of the electrochromic and/or the counter electrode layer. Materials and microstructure of the electrochromic devices provide improvements in performance and reliability over conventional devices.

A component for a processing chamber includes a ceramic body having at least one surface with a first average surface roughness. The component further includes a conformal protective layer on at least one surface of the ceramic body, wherein the conformal protective layer is a plasma resistant rare earth oxide film having a substantially uniform thickness of less than 300 μm over the at least one surface and having a second average surface roughness that is less than the first average surface roughness.

Conventional electrochromic devices frequently suffer from poor reliability and poor performance. Improvements are made using entirely solid and inorganic materials. Electrochromic devices are fabricated by forming an ion conducting electronically-insulating interfacial region that serves as an IC layer. In some methods, the interfacial region is formed after formation of an electrochromic and a counter electrode layer. The interfacial region contains an ion conducting electronically-insulating material along with components of the electrochromic and/or the counter electrode layer. Materials and microstructure of the electrochromic devices provide improvements in performance and reliability over conventional devices.