Patent classifications
C23C14/025
FILM STACK COMPOSITION, RELATED METHOD, AND APPLICATIONS
A multi-layer PVD film stack contains high index of refraction base material(s), followed by a semi-transparent low index of refraction cap layer. The base layer(s) provide the color range of the film. The thickness of the cap layer dictates the degree to which the film retains the color properties of the base material and the reflectivity of the cap material. The cap layer not only increases the reflectivity of the base material, but it also decreases the reflectivity lost when the PVD film is topcoat lacquered. The lacquering is advantageous in protecting the PVD film but it decreases the reflectivity of the high index of refraction materials (generally n value>1.9 at 632 nm). These materials are desirable due to their color properties but are too dark after lacquering for many commercial applications. We address this problem by utilizing a high refractive index metal, or metals, as an opaque first layer followed by a thin semi-transparent second layer of a low refractive index metal. Upon topcoat lacquering, the resulting coating retains most of the aesthetically pleasing properties of the base metal(s) but minimizes the darkening of the metal(s) after topcoat due to the low refractive index of the second layer, which is in contact with the lacquer.
WHITE, BACTERIA-RESISTANT, BIOCOMPATIBLE, ADHERENT COATING FOR IMPLANTS, SCREWS AND PLATES INTEGRATED IN HARD AND SOFT TISSUE AND PRODUCTION METHOD
The invention relates to a white, bacteria-resistant, biocompatible, adherent coating for an element which can be integrated in hard and soft tissue, in particular an implant, a screw or a plate, having a structure made from metalliferous gradient layers having varying oxygen content, wherein the band gap of the outer-most gradient layer is greater than 3.1 eV, wherein the outer-most gradient layer is crystalline and wherein the gradient layers comprise tantalum and/or niobium and/or zirconium and/or titanium.
NANO-TWINNED STRUCTURE ON METALLIC THIN FILM SURFACE AND METHOD FOR FORMING THE SAME
A nano-twinned structure on a metallic thin film surface is provided. The nano-twinned structure includes a substrate, an adhesive-lattice-buffer layer over the substrate, and a metallic thin film including Ag, Cu, Au, Pd or Ni over the adhesive-lattice-buffer layer. The bottom region of the metallic thin film has equi-axial coarse grains. The surface region of the metallic thin film contains parallel-arranged high-density twin boundaries (Σ3+Σ9) with a pitch from 1 nm to 100 nm. The quantity of the parallel-arranged twin boundaries is 50% to 80% of the total quantity of twin boundaries in the cross-sectional view of the metallic thin film. The parallel-arranged twin boundaries include 30% to 90% [111] crystal orientation. The nano-twinned structure on the metallic thin film surface is formed through a post-deposition ion bombardment on the evaporated metallic thin film surface after the evaporation process.
METHOD FOR DECORATING A SUBSTRATE
A method for decorating a substrate which includes the succession of the following steps: provide the substrate; deposit a layer of a sacrificial material over a surface of the substrate; structure the sacrificial material layer so as to create in this sacrificial material layer a plurality of cavities to form a decorative or technical pattern; eliminate the sacrificial material layer except at the location where the pattern is provided.
COPPER CLAD LAMINATE FILM AND ELECTRONIC DEVICE INCLUDING SAME
Disclosed are a copper-clad laminate film and an electronic device including the same. The copper-clad laminate film includes: a polyimide-based substrate having a fluorine layer disposed on at least one side thereof; a tie-layer disposed on the polyimide-based substrate having the fluorine layer placed thereon; and a copper layer disposed on the tie layer, wherein the tie-layer includes at least one metal element selected from among metal elements of Group 4, Group 6, Group 13, and Group 14 in the Periodic Table, and the at least one metal element may have a metal-oxygen (M-O) bond dissociation energy of 400 kJ/mol or more.
Anti-corrosion conductive film and pulse bias alternation-based magnetron sputtering deposition method and application thereof
The disclosure provides an anti-corrosion conductive film and methods of making and using thereof. The anti-corrosion conductive film is formed by sequentially forming an anti-corrosion protective layer, a stress transition layer and a conducting layer on the surface of a substrate by deposition through a high-low pulse bias alternation method. The anti-corrosion conductive film is a nano-multilayer anti-corrosion conductive film exhibiting excellent corrosion resistance and conductivity. The anti-corrosion conductive film has great application prospects in the fields of metal polar plates of fuel cells, ground grid equipment of power transmission lines, and the like.
NITRIDE LAMINATE AND MANUFACTURING METHOD OF THE SAME
A nitride laminate, in which contamination in the nitride layer is suppressed and crystallinity is improved, is provided. A nitride laminate includes a polymer substrate, and a nitride layer provided on at least one of the surfaces of the polymer substrate. The nitride layer has a wurtzite crystal structure. The atomic proportion of oxygen in the nitride layer is 2.5 atm. % or less, and the atomic proportion of hydrogen in the nitride layer is 2.0 atm. % or less. The FWHM of the X-ray rocking curve of the nitride layer is 8 degree or less.
COATED PART COMPRISING A PROTECTIVE COATING BASED ON MAX PHASES
A coated part includes a metallic substrate, a thermal barrier comprising a ceramic material and covering the metallic substrate, wherein the coated part further includes a protective coating covering the thermal barrier, the protective coating including, in a first region, a first MAX phase, denoted PZ2, of formula (Zr.sub.xTi.sub.1-x,).sub.2AlC or a first MAX phase, denoted PC2, of formula (Cr.sub.xTi.sub.1-x,).sub.2AlC with x non-zero and less than or equal to 1 in the MAX phases PZ2 and PC2, and the protective coating includes, in a second region covering the first region, a second MAX phase of formula Ti.sub.2AlC.
Coating comprising MCrAl-X coating layer
Coated substrate comprising a substrate (1) comprising a metal substrate surface (11) coated with a coating system (7) consisting of or comprising a functional coating film (5), said functional coating film (5) consisting of or comprising at least one MCr Al—X coating layer, whereas ° the at least one MCr Al—X coating layer is deposited directly on the metal substrate (11), or ° the at least one MCr Al—X coating layer is deposited on an intermediate coating layer (3) that is formed of at least one substrate matching layer (31), wherein the at least one substrate matching layer (31) is deposited directly on the metal substrate surface (11), wherein the layer deposited directly on the metal substrate surface (11), it means respectively the MCr Al—X coating layer if it is deposited directly on the metal substrate surface (11) or the substrate matching layer (31) if it is deposited on the metal substrate surface (11) exhibits: ° epitaxial growth in part or totally, or ° heteroepitaxial growth in part or totally.
Component for fuel injector and method for coating the same
Disclosed are a component for a fuel injector and a method for coating the same. The component for the fuel injector may include a base material, a bonding layer laminated on the base material, a support layer laminated on the outer surface of the bonding layer, and an NbSiCN functional layer including an NbCN layer and an SiCN layer and alternately laminated on the outer surface of the support layer, thereby reducing friction, high hardness, shock resistance, heat resistance, and durability of the component for the fuel injector.