A mask structure for a deposition device includes first segments and second segments. The first segments are arranged in a direction surrounding a central axis and separated from one another. The second segments are disposed above the first segments. Each of the second segments overlaps two of the first segments adjacent to each other in a vertical direction parallel to an extending direction of the central axis. A deposition device includes a process chamber, a stage, and the mask structure. The stage is at least partially disposed in the process chamber and includes a holding structure of a substrate. The mask structure is disposed in the process chamber, located over the stage, and covers a peripheral region of the substrate to be held on the stage. An operation method of the deposition device includes horizontally adjusting positions of the first segments and the second segments respectively between different deposition processes.

An article is provided. The article includes a first transparent conductive oxide layer, a transparent metal layer on the first transparent conductive oxide layer, wherein a thickness of the transparent metal layer continuously decreases in a direction; and a second transparent conductive oxide layer on the transparent metal layer.

An apparatus for performing a sputtering process on a substrate is provided. The apparatus includes a processing chamber having a substrate support on which the substrate is placed, a target for emitting target particles to be adhered to the substrate by plasma formed in the processing chamber, a magnet, provided on a rear surface of the target, for adjusting a state of the plasma on the surface of the target, and a magnet moving mechanism for repeatedly moving the magnet between a position on one side and a position on the other side set across a center portion on the rear surface of the target. The apparatus further includes a collimator having two regulating plates for limiting an incident angle of the target particles to the substrate, and an arrangement position adjustment mechanism adjusting positions of the two regulating plates according to the movement of the magnet.

The present disclosure provides a pixel arrangement structure and display panel. The pixel arrangement includes a plurality of pixel repeated combinations. Each of the pixel repeated combinations includes a plurality of pixel units. In the pixel repeated combinations, the plurality of pixel units share a sub-pixel and surround a center of the sub-pixel. By utilizing the present disclosure which makes pixels of the plurality of pixel units sharing one first sub-pixel, the numbers of the first sub-pixels in the pixel arrangement structure and the display panel are reduced, the resolution is enhanced, and fine metal mask (FMM) manufacture technology limitations can be overcome.

This disclosure is directed to an improved process for making glass articles having optical coating and easy-to clean coating thereon, an apparatus for the process and a product made using the process. In particular, the disclosure is directed to a process in which the application of the optical coating and the easy-to-clean coating can be sequentially applied using a single apparatus. Using the combination of the coating apparatus and the substrate carrier described herein results in a glass article having both optical and easy-to-clean coating that have improved scratch resistance durability and optical performance, and in addition the resulting articles are “shadow free.”

The present invention particularly relates to a method for physical vacuum deposition of a coating (R) comprising at least one material (M) on at least a portion of a front face (10) of a support (1), said at least one material (M) originating from an evaporation source or an atomisation source (2), wherein:—use is made of a support (1), at least a portion of the front face (10) of which is smooth, that is to say, does not have any roughness and/or reliefs and/or recesses;—said vacuum deposition is carried out while varying the thickness distribution of the material (M) on said front face (10), that is, while progressively varying the thickness deposited, from a central region (11) in the direction of at least one lateral region (12) contiguous to the central region (11), without modifying the position of the evaporation source or atomisation source (2) of the material particles (M).

The present invention relates to an inorganic alignment film forming apparatus for forming an inorganic alignment film on a substrate, the apparatus comprising: a sputtering means; and an ion beam irradiation means for performing surface treatment on an inorganic alignment film formed by the sputtering means, wherein the sputtering means comprises a stage on which a substrate for forming the inorganic alignment film is arranged, at least one sputtering gun, and a sputtering mask arranged between the stage and the sputtering gun, the ion beam irradiation means comprises a stage on which the substrate is arranged, an ion beam emission unit for generating ions and irradiating the substrate with ions, and an ion beam irradiation mask arranged between the stage and the ion beam emission unit, and the sputtering mask and the ion beam irradiation mask have a plurality of inclined opening parts.

In an embodiment, a fabrication method comprises forming first and second electrodes over a substrate that includes a nanowire that extends between, and beneath portions of, the first and second electrodes. The method also includes forming a mask structure that defines at least one opening over a portion of the nanowire and defines at least one overhang portion over a gap between the substrate and the mask. The method further includes depositing a first gate electrode on the substrate and overlapping a third region of the nanowire, and depositing a second gate electrode on the substrate and overlapping a fourth region of the nanowire. The depositing of the first gate electrode includes depositing conductive material through the at least one opening from a first oblique angle, and the depositing of the second gate electrode includes depositing conductive material through the at least one opening from a second oblique angle.

A plumbing fixture having a multi-color appearance includes a first portion including a first finish having a first appearance and a second portion including a second portion having a second appearance that differs from the first appearance. The plumbing fixture further includes a transition region between the first portion and the second portion, wherein the appearance of the third region is graduated from the first appearance to the second appearance between a first end of the transition region adjacent the first portion and a second end of the transition region adjacent the second portion. The plumbing fixture has an ombré appearance as a result of the graduated transition between the first portion and the second portion.

Method for making an eyeglass lens coated by means of physical vapor deposition PVD, such method comprising a step of arranging a lens blank, provided with a first centering reference, a step of arranging a support body, provided with a first shaped and through opening oriented with respect to a second centering reference thereof, and a step of arranging a centering template. The present method then comprises an assembly step of the lens blank with the support body and of the support body with the centering template. Subsequently, the present method comprises a step of coating the lens blank by means of physical vapor deposition PVD, and finally comprises a cutting step in which the lens blank is cut along a cutting profile shaped in eyeglass lens form and oriented with respect to the first centering reference.