Patent classifications
C23C14/243
Gas system for reactive deposition process
A gas lance unit configured for a reactive deposition process with a plurality of spaced apart crucibles, wherein spaces are provided between the crucibles, is described. The gas lance unit includes a gas guiding tube having one or more outlets for providing a gas for the reactive deposition process, and a condensate guiding element for guiding a condensate, particularly an aluminum condensate, to one or more positions above the spaces.
Dry coating apparatus
Provided is a dry coating apparatus for coating a coating material, i.e., deposition vapor (metal vapor) on a substrate (a steel strip). The dry coating apparatus includes a coating part disposed in a vacuum to coat deposition vapor generated through heating and evaporation of a supplied coating material onto a proceeding object to be coated and a heating source disposed in an atmosphere to heat and levitate the coating material in the coating part.
SiC single crystal manufacturing apparatus and structure having container and filler for manufacturing SiC single crystal
A SiC single crystal manufacturing apparatus of the present invention includes a growth container having a growth space in which a SiC single crystal is grown in a first direction and a heat insulating material which covers the growth container and includes a plurality of units, and the plurality of units include a first unit and a second unit having at least a thermal conductivity different from that of the first unit, and the first unit includes a container made of at least one of graphite and a metal carbide and a filler filled into the container in a replaceable manner.
CRUCIBLE REPLACING APPARATUS
The present invention relates to the technical field of displays, in particular to a crucible replacing apparatus. The crucible replacing apparatus comprises: a base, a first mechanical arm and a second mechanical arm; the first mechanical arm and the second mechanical arm are disposed on the base respectively, and perform the actions of turning, rising and falling along with the base; one end of the first mechanical arm is for catching a crucible to be replaced; and one end of the second mechanical arm is for carrying and placing a spare crucible, thus achieving the replacement of the crucible in the evaporation source without opening the chamber and cooling to the room temperature.
EVAPORATION CRUCIBLE AND EVAPORATION SYSTEM
An evaporation crucible and an evaporation system are disclosed. The evaporation crucible includes a crucible body and at least one nozzle located on a top face of the crucible body. The crucible body includes an inner wall and an outer wall that are bonded together, where the inner wall is formed of a first material, the outer wall is made of a second material, and a heat conductivity of the first material is larger than that of the second material. The evaporation crucible and the evaporation system may solve technical problem of non-uniform evaporation of vapor deposition material in prior arts, such that a uniform coating on OLED substrate may be achieved.
SYSTEM AND METHOD BASED ON MULTI-SOURCE DEPOSITION FOR FABRICATING PEROVSKITE FILM
A system and method for fabricating a perovskite film is provided, the system including a substrate stage configured to rotate around its central axis at a rotation speed, a first set of evaporation units, each coupled to the side section or the bottom section of the chamber, a second set of evaporation units coupled to the bottom section, and a shield defining two or more zones having respective horizontal cross-sectional areas, which are open and facing the substrate, designated for the two or more evaporation units in the second set. The resultant perovskite film includes multiple unit layers, wherein each unit layer is formed by one rotation of the substrate stage, and the composition and thickness of the unit layer are controlled by adjusting at least the evaporation rates, the rotation speed and the horizontal cross-sectional areas.
AMORPHOUS LEAD OXIDE BASED ENERGY DETECTION DEVICES AND METHODS OF MANUFACTURE THEREOF
PbO-based photoconductive X-ray imaging devices are disclosed in which the PbO photoconductive layer exhibits an amorphous crystal structure. According to selected embodiments, the amorphous PbO photoconductive layer may be formed by providing a substrate inside an evacuated evaporation chamber and evaporating lead oxide to deposit a photoconductive lead oxide layer onto the substrate, while subjecting the photoconductive layer to ion bombardment with oxygen ions having an ion energy between 25 and 100 eV. X-ray direct detection imaging devices formed from such amorphous PbO photoconductive layers are shown to exhibit image lag that is suitable for fluoroscopic imaging.
Thermal evaporation sources for wide-area deposition
A thermal evaporation sources are described. These thermal evaporation sources include a crucible configured to contain a volume of evaporant and a vapor space above the evaporant.
CRUCIBLE APPARATUS AND DEPOSITION APPARATUS INCLUDING THE SAME
An apparatus for making substrates of a display device includes: a crucible to vaporize a deposition material and including a first metal; and a sacrificial material electrically connected to the crucible and including a second metal having a second ionization energy less than a first ionization energy of the first metal.
EVAPORATION SOURCE, VAPOR DEPOSITION APPARATUS, AND METHOD FOR COATING A SUBSTRATE IN A VACUUM CHAMBER
An evaporation source for depositing an evaporated material on a substrate is described. The evaporation source includes an evaporation crucible for evaporating a material; a vapor distributor with a plurality of nozzles for directing the evaporated material toward the substrate; a vapor conduit extending in a conduit length direction (A) from the evaporation crucible to the vapor distributor and providing a fluid connection between the evaporation crucible and the vapor distributor, wherein at least one nozzle of the plurality of nozzles has a nozzle axis extending in, or essentially parallel to, the conduit length direction (A); and a baffle arrangement in the vapor conduit. Further described are a vapor deposition apparatus including such an evaporation source and methods of coating a substrate in a vacuum chamber.