This application discloses a feeding device for a crucible, belonging to the field of display technology. The feeding device includes: a base, a robot arm and a bottle holder. The base is movably connected to one end of the robot arm, the one end of the robot arm can move linearly on the base, a motion trajectory of the robot arm is parallel to a lengthwise direction of the crucible. The bottle holder is disposed at the other end of the robot arm and the bottle holder is rotatable at the other end. This application can protect operator's health, improve production efficiency and reduce production costs.

According to the embodiment, a vaporization system includes a vaporizer, a body, a sensor, a moving mechanism, and a supplier. The vaporizer includes a plurality of containers which can store powdered solid materials. The body in a vacuum state can house the vaporizer. The sensor detects a residue of the solid materials stored in a plurality of the containers respectively. The moving mechanism, on the basis of a detection result of the sensor, moves the plurality of the containers respectively between a first position located inside the vaporizer, and a second position located outside of the vaporizer. A supplier supplies the solid material to the container located in the second position among the plurality of the containers.

A pressure control method in a film forming apparatus having a plurality of incompletely partitioned processing regions in one vacuum container, includes a first adjustment step of adjusting an opening degree of an exhaust valve provided in each of the processing regions, on the basis of a target pressure and a target flow rate determined for each of the processing regions and learning information indicating a relationship between a flow rate, a pressure and an opening degree, and a second adjustment step of, after the first adjustment step, adjusting an opening degree of an exhaust valve provided in one of the processing regions, on the basis of a pressure in one of the processing regions.

A vaporization system without a pressure sensor including: a vaporizer that vaporizes the liquid material; a supply amount controller that controls the supply amount of the liquid material to the vaporizer; a flow rate regulation valve that regulates the flow rate of vaporized gas produced by the vaporizer; a flow rate sensor that measures the flow rate of the vaporized gas; and a valve control part that outputs a drive signal to the flow rate regulation valve to control a valve opening level so that a measured flow rate measured by the flow rate sensor becomes equal to a predetermined set flow rate, is adapted to acquire a drive signal value that is a value indicated by the drive signal; and output a control signal to the supply amount controller on the basis of the drive signal value and control the supply of the liquid material.

A flow resistant part having a rod shape is disposed in a raw liquid introduction path in a manner such that the raw liquid is sprayed onto a vaporization plate to reduce the conductance of the raw liquid introduction path with respect to the raw liquid. Because the pressure on an outlet side of the liquid mass flow controller is increased, and the pressure difference from the pressure on the inlet side of the liquid mass flow controller is reduced, the occurrence of cavitation can be prevented. A plurality of the flow resistant parts can be provided.

A method and apparatus for direct liquid injection (DLI) of chemical precursors into a processing chamber is provided. The DLI system includes a liquid precursor source vaporization system, which vaporizes liquid stably and efficiently. In one implementation, the DLI system is a closed loop integrated system which combines, an injection valve (IV) along with a Liquid Flow Meter (LFM), an ampoule assembly as a source of pressurized precursor, an inert push gas to pressurize the precursor in the ampoule assembly, a temperature controller to maintain a targeted temperature regime, leak detection and controlled carrier gas flow to gas heater.

An apparatus for manufacturing a display apparatus includes: a chamber; a plurality of source units outside the chamber, wherein the plurality of source units which accommodate a deposition material and transform the deposition material into gas; a nozzle unit in the chamber, wherein the nozzle unit is connected to the plurality of source units and injects, into the chamber, the deposition material supplied from one of the plurality of source units; and a regulating unit between each of the plurality of source units and the nozzle unit, wherein the regulating unit interrupts the deposition material supplied from each of the plurality of source units to the nozzle unit and selectively connects the plurality of source units with the nozzle unit.

A supply line guide for guiding a plurality of supply lines in a vacuum chamber of a processing system is described. The supply line guide includes a guiding arrangement including a plurality of connected elements, wherein the connected elements are angle-adjustable relative to each other. Further, the supply line guide includes a flexible tube provided around the guiding arrangement.

A material deposition arrangement for depositing a material on a substrate in a vacuum deposition chamber is described. The material deposition arrangement includes at least one material deposition source having a crucible configured to evaporate the material, a distribution assembly configured for providing the evaporated material to the substrate, and a force application device configured for applying a contact force at a connection between the crucible and the distribution assembly.

A preparation device has a chamber, molten metal containers, a rotatable base in the chamber and having a deposition substrate, laser sets generating a dual-pulse laser, a base controller and a data collection control unit. The containers communicate with the chamber and each has a pulse pressurization apparatus pressing the molten metal into the chamber. The laser sets correspond to the containers such that beams of an emitted dual-pulse laser bombard the pulsed droplets, plasmas are generated and are sputtered and deposited on the substrate forming a multi-element alloy thin film. The unit collects base temperature and displacement information, and controls the pressurization frequency of the pulse pressurization apparatus, and the emission frequency and energy of the dual-pulse laser of the laser sets controlling the frequency and energy of the dual-pulse laser bombarding the corresponding pulsed droplets. The base controller controls the base temperature, rotation and movement.