A coated tool according to the present disclosure includes a base member and a coating layer located on the base member. The coating layer includes a first peak located in a range of 15° to 30° and a second peak located in a range of 60° to 75° in a distribution of X-ray intensity indicated at a axis of a pole figure, the X-ray intensity regarding a plane of the cubic crystal. The coating layer includes a valley part between the first peak and the second peak, and the valley part includes the X-ray intensity smaller than the X-ray intensity at each of the first peak and the second peak. The X-ray intensity at the first peak is 0.7 times or greater of the X-ray intensity at the second peak.

A coated tool according to the present disclosure includes a base member and a coating layer located on the base member. The coating layer includes a first peak located in a range of 15° to 30° and a second peak located in a range of 60° to 75° in a distribution of X-ray intensity indicated at a axis of a pole figure, the X-ray intensity regarding a plane of the cubic crystal. The coating layer includes a valley part between the first peak and the second peak, and the valley part includes the X-ray intensity smaller than the X-ray intensity at each of the first peak and the second peak. The X-ray intensity at the first peak is 0.7 times or greater of the X-ray intensity at the second peak.

Described herein is a submerged-plasma process for the production of amorphous and nanocrystalline nanostructured materials, depending on processing conditions, from precursors that can be in the liquid or injected into the plasma or both.

The present disclosure relates to systems and methods of additive manufacturing that reduce or eliminates defects in the bulk deposition material microstructure resulting from the additive manufacturing process. An additive manufacturing system comprises evaporating a deposition material to form an evaporated deposition material and ionizing the evaporated deposition material to form an ionized deposition material flux. After forming the ionized deposition material flux, the ionized deposition material flux is directed through an aperture, accelerated to a controlled kinetic energy level and deposited onto a surface of a substrate. The aperture mechanism may comprise a physical, electrical, or magnetic aperture mechanism. Evaporation of the deposition material may be performed with an evaporation mechanism comprised of resistive heating, inductive heating, thermal radiation, electron heating, and electrical arc source heating.

The present disclosure relates to systems and methods of additive manufacturing that reduce or eliminates defects in the bulk deposition material microstructure resulting from the additive manufacturing process. An additive manufacturing system comprises evaporating a deposition material to form an evaporated deposition material and ionizing the evaporated deposition material to form an ionized deposition material flux. After forming the ionized deposition material flux, the ionized deposition material flux is directed through an aperture, accelerated to a controlled kinetic energy level and deposited onto a surface of a substrate. The aperture mechanism may comprise a physical, electrical, or magnetic aperture mechanism. Evaporation of the deposition material may be performed with an evaporation mechanism comprised of resistive heating, inductive heating, thermal radiation, electron heating, and electrical arc source heating.

A method for manufacturing a piston ring includes the following steps: (A) a step of supplying an arc current to a cathode formed of a carbon material having a density of 1.70 g/cm.sup.3 or more, to ionize the carbon material; and (B) a step of applying a bias voltage in an environment where hydrogen atoms are substantially absent to form a DLC film on a surface of a base material for a piston ring.

The step (A) is continuously carried out, subsequently the step (A) is interrupted, and then the step (A) is restarted, which sequence is repeated thereby to form the DLC film having an extinction coefficient of 0.1 to 0.4 as measured using light having a wavelength of 550 nm and a nanoindentation hardness of 16 to 26 GPa.

A vacuum process method for a magnetic recording medium having a surface protective layer for protecting a magnetic recording layer formed on a substrate includes a ta-C film forming step of forming a ta-C film on the magnetic recording layer, a transportation step of transporting a substrate on which the ta-C film is formed, a radical generation step of generating radicals by exciting a process gas, and a radical process step of irradiating a surface of the ta-C film with the radicals.

The present invention relates to a coating device comprising a vacuum coating chamber for conducting vacuum coating processes, said vacuum coating chamber comprising: —one or more cooled chamber walls 1 having an inner side 1 b and a cooled side 1 a, —protection shields being arranged in the interior of the chamber as one or more removable shielding plates 2, which cover at least part of the surface of the inner side 1 b of the one or more cooled chamber walls 1, wherein at least one removable shielding plate 2 is placed forming a gap 8 in relation to the surface of the inner side 1 b of the cooled chamber wall 1 that is covered by said removable shielding plate 2, wherein: —thermal conductive means 9 are arranged filling the gap 8 in an extension corresponding to at least a portion of the total surface of the inner side 1 b of the cooled chamber wall 1 that is covered by said removable shielding plate 2, wherein the thermal conductive means 9 enable conductive heat transfer between said removable shielding plate 2 and the respectively covered cooled chamber wall 1.

Provided is a cutting tool comprising a base body and a hard carbon film arranged on the base body, in which, when the cross section of the hard carbon film is observed using a high angle annular dark field scanning transmission electron microscope, the area proportion of black regions with an equivalent circle diameter of 10 nm or more is 0.7% or less, and the hard carbon film has a hydrogen content of 5 atom% or less.

A deposition system includes comprising an induction crucible apparatus configured to produce a material vapour. When in use, the induction crucible apparatus is configured to inductively heat a crucible to generate two or more thermal zones in the crucible. The deposition system further includes a substrate support configured to support a substrate and a plasma source configured to generate a plasma between the induction crucible apparatus and the substrate support such that transmission of the material vapour at least partly through the plasma generates a deposition material for deposition on the substrate.