A system includes multi-zone heater with heating elements within a substrate support that correspond to multiple zones of the substrate support. A processing device coupled to the heating elements and to access a temperature matrix with multiple vectors corresponding to zones; determine a temperature map of the substrate support by multiplying the temperature matrix by a weight vector, the weight vector containing estimated weight values for each respective vector; determine a target thickness map of a film on a substrate based on an original thickness map and the temperature map, the original thickness map having data characterizing an original thickness across locations of an original film at a uniform temperature; iteratively update the estimated weight values so that the temperature map results in minimization to a standard deviation of thickness values within the target thickness map; and employ the estimated weight values as control values for the heating elements.

An apparatus for coating surfaces of objects by a gas deposition method under vacuum conditions in process chambers, including at least one treatment chamber for receiving the objects to be coated and at least one additional process chamber, connected to the at least one treatment chamber, for conducting gases to be deposited and/or discharging portions of non-deposited partial gas quantities. A measuring unit for detecting the coating thickness on a surface or sections of the surface of the process chambers is arranged in at least one additional process chamber. The measuring unit is connectable to a control and evaluation unit. The measuring unit detects ACTUAL data of the coating thickness on a surface of the at least one additional process chamber as measured value and these ACTUAL data are forwarded to an evaluation device, in which these ACTUAL data are compared with NOMINAL data.

Cathode structures are disclosed for use with pulsed cathodic arc deposition systems for forming diamond-like carbon (DLC) films on devices, such as on the sliders of hard disk drives. In illustrative examples, a base layer composed of an electrically- and thermally-conducting material is provided between the ceramic substrate of the cathode and a graphitic paint outer coating, where the base layer is a silver-filled coating that adheres to the ceramic rod and the graphitic paint. The base layer is provided, in some examples, to achieve and maintain a relatively low resistance (and hence a relatively high conductivity) within the cathode structure during pulsed arc deposition to avoid issues that can result from a loss of conductivity within the graphitic paint over time as deposition proceeds. Examples of suitable base material compounds are described herein where, e.g., the base layer can withstand temperatures of 1700° F. (927° C.).

Provided is a surface treatment facility in which both surfaces of a material are subjected to continuous film deposition by PVD as the material is conveyed in the longitudinal direction, wherein flutter of the material subjected to coating can be suppressed. This surface treatment facility comprises a chamber configured to continuously deposit a film by PVD on both surfaces of a material as the material is conveyed in the longitudinal direction through the chamber; a conveyance mechanism for conveying the material subjected to coating; a blowing mechanism for blowing film-forming gas in the longitudinal direction on both sides of the material present in the chamber; and has an X/Y ratio within a range of 0.4 to 3.0 where X is the film-forming gas blowing speed, and Y is the conveyance speed of the material subjected to coating, and where the unit of measurement of X and Y is m/min.

A component including a substrate surface coated with a coating including at least one MoN layer having a thickness not less than 40 nm. Between the substrate surface and the at least one MoN layer the component includes: i) a substrate surface hardened layer, which is a hardened, nitrogen-containing substrate surface layer that is the result of a nitriding treatment carried out at the substrate surface and has a thickness not less than 10 nm, preferably not less than 20 nm and not greater than 150 nm, and/or ii) a layer system composed of more than 2 MoN layers and more than 2 CrN layers, wherein the MoN and CrN layers forming the layer system are individual layers deposited alternatingly one on each other forming a multilayer MoN/CrN coating film.

Provided is a transparent structure having improved wear resistance and flexibility, and a structure according to the present invention is a nanolayered structure in which a nitride nanofilm of one or more elements selected from metals and metalloids; and a boron nitride nanofilm are alternately layered.

Techniques and mechanisms for cooling a substrate in a processing chamber by a bi-directional cooling process prior to transferring the substrate outside the processing chamber are provided. First cooling gas is introduced into the processing chamber from an upper gas source in a downward direction towards the upward facing surface of the substrate. An apparatus is placed underneath and in proximity to the substrate. Second cooling gas is introduced from the apparatus into the processing chamber in an upward direction towards the downward facing surface of the substrate. One or more gaps are cut out of the body portion of the apparatus, the gaps configured to allow the apparatus to avoid contact with the support structure holding the substrate, as the apparatus is moved in a horizontal direction into position underneath the substrate during placement of the body portion of the apparatus in proximity to the substrate.

Embodiments of the present disclosure relate to optical device films and methods of forming optical device films. Specifically, embodiments described herein provide for an optical device film having a constant oxygen-concentration, a first concentration profile of the first material, and a second concentration profile of the second material. The first material, described and referenced to herein, has a first refractive index about 2.0 or greater and the second material has a second refractive index less than 2.0.

A method for preparing a super-lubricative multi-layer composite fullerene-like carbon layer/graphene-like boron nitride thin film is provided. A substrate is ultrasonically cleaned in absolute ethyl alcohol and acetone sequentially for 15 min. The substrate is cleaned by argon plasma bombardment for 15 min. A fullerene-like carbon layer A having an onion-like structure is prepared by high-vacuum medium-frequency magnetron sputtering for 30 s. A graphene-like boron nitride layer B is prepared by high-vacuum medium-frequency magnetron sputtering and coating device to sputter the elemental boron target for 30 s. Steps (3) and (4) are repeated 80 times to overlay the fullerene-like carbon layer A and the graphene-like boron nitride layer B in an alternate way. The super-lubricative multi-layer composite fullerene-like carbon layer/graphene-like boron nitride thin film has a large load capacity, and excellent wear resistance, high temperature resistance and super lubrication.

A coating device that can control a coating thickness distribution along the circumferential direction of a work is provided. The coating device includes a work turning device that holds a plurality of works to rotate and revolve the works, a target having an emission face from which particles come out as a material of a coating formed on an outer circumferential face of each of the works, a power source that supplies an arc current to the target to cause the particles to come out of the target, and a controller that controls the power source to set the arc current in a particular period to be higher than a reference output, the particular period being at least a portion of a period in which a particular portion of the rotating work faces the emission face.