C23C14/548

Coated cutting tool
11224921 · 2022-01-18 · ·

Provided is a coated cutting tool that has a nitride hard coating that contains Ti at 70 at % to 95 at % and Si at 5 at % to 30 at % with respect to the total amount of metallic elements, and Ar at 0.05 at % to 0.20 at % with respect to the total amount of metallic and non-metallic elements, has a NaCl-type crystalline structure, exhibits maximum diffraction peak intensity in the (200) plane, and has an average grain size of 5 nm to 30 nm. When 100 at % is defined as the total of content rates of the metallic elements, nitrogen, oxygen, and carbon in a composition at intervals of 20 nm from a depth of 20 nm to 200 nm from a surface of the hard coating, the content rate of nitrogen is 50.0 at % or more.

Apparatus and method for vacuum deposition

A vacuum deposition facility is provided for continuously depositing on a running substrate coatings formed from metal alloys including a main element and at least one additional element. The facility includes a vacuum deposition chamber and a substrate running through the chamber. The facility also includes a vapor jet coater, an evaporation crucible for feeding the vapor jet coater with a vapor having the main element and the at least one additional element, a recharging furnace for feeding the evaporation crucible with the main element in molten state and maintaining a constant level of liquid in the evaporation crucible, and a feeding unit being fed with the at least one additional element in solid state for feeding the evaporation crucible with the at least one additional element either in molten state, in solid state or partially in solid state. A process is also provided.

SYSTEM AND METHOD FOR DETECTING CONTAMINATION OF THIN-FILMS
20210341390 · 2021-11-04 ·

A thin-film deposition system deposits a thin-film on a wafer. A radiation source irradiates the wafer with excitation light. An emissions sensor detects an emission spectrum from the wafer responsive to the excitation light. A machine learning based analysis model analyzes the spectrum and detects contamination of the thin-film based on the spectrum.

COATED CUTTING TOOL
20230311215 · 2023-10-05 · ·

Provided is a coated cutting tool having improved wear resistance and fracture resistance and a long tool life. The coated cutting tool include a substrate and a coating layer formed on the substrate, wherein the coating layer has an alternately laminated structure of a first layer and a second layer, the first layer contains a compound having a composition represented by (Al.sub.aM.sub.bTi.sub.1-a-b, wherein M represents at least one of a Mo element and a W element, and 0.75≤a≤0.90 and 0.00<b≤0.20 are satisfied, the second layer contains a compound having a composition represented by (Al.sub.cM.sub.dTi.sub.1-c-d)N, wherein M represents at least one of a Mo element and a W element, and 0.75≤c≤0.90 and 0.00≤d≤0.20 are satisfied, the compound contained in the second layer being different from the compound contained in the first layer, at least one of a and c is 0.80 or more and, and an average thickness of the alternately laminated structure is 0.5 μm or more and 5.0 μm or less.

SYSTEM AND METHOD FOR DETECTING CONTAMINATION OF THIN-FILMS
20230296523 · 2023-09-21 ·

A thin-film deposition system deposits a thin-film on a wafer. A radiation source irradiates the wafer with excitation light. An emissions sensor detects an emission spectrum from the wafer responsive to the excitation light. A machine learning based analysis model analyzes the spectrum and detects contamination of the thin-film based on the spectrum.

Physical vapor deposition system and processes
11639544 · 2023-05-02 · ·

A physical vapor deposition (PVD) chamber and a method of operation thereof are disclosed. Chambers and methods are described that provide a chamber comprising an upper shield with two holes that are positioned to permit alternate sputtering from two targets.

RAZOR BLADE AND MANUFACTURING METHOD THEREOF
20230022996 · 2023-01-26 · ·

The present disclosure provides a razor blade coating by a physical vapor deposition method through performing a deposition with a single composite target composed of dissimilar materials with their area ratio defined to be varied in the single composite target in the direction of transferring the razor blade subject to the deposition, thereby forming a single layer in which the composition ratio of the dissimilar materials gradually changes in the thickness direction of the coating layer to improve the durability of the razor blade coating layer.

IN SITU AND TUNABLE DEPOSITION OF A FILM
20230374654 · 2023-11-23 ·

A method is provided. The method includes the following steps: introducing a first physical vapor deposition (PVD) target and a second PVD target in a PVD system, the first PVD target containing a boron-containing cobalt iron alloy (FeCoB) with an initial boron concentration, and the second PVD target containing boron; determining parameters of the PVD system based on a target boron concentration larger than the initial boron concentration; and depositing a FeCoB film on a substrate according to the parameters of the PVD system.

AL-RICH ALCRN COATING LAYERS PRODUCED BY PVD FROM METALLIC TARGETS
20230374650 · 2023-11-23 ·

A coating layer and a method for producing thereof, wherein the coating layer includes Al, Cr and N as main components according to formula (Al.sub.aCr.sub.b).sub.xO.sub.yC.sub.zN.sub.q, where a and b are respectively the concentration of aluminium and chromium in atomic ratio considering only Al and Cr for the calculation of the element composition in the layer, whereby a+b=1 and 0≠a≥0.7 and 0≠b≥0.2, and where x is the sum of the concentration of Al and the concentration of Cr, and y, z and q are the concentration of oxygen, carbon and nitrogen respectively in atomic ratio considering only Al, Cr, O, C and N for the calculation of the element composition in the layer, whereby x+y+z+q=1 and 0.45≤x≤0.55, 0≤y≤0.25, 0≤z≤0.25, and wherein the coating layer exhibits 90% or more of fcc cubic phase, and compressive stress of 2.5 GPa or more, preferably between 2.5 GPa and 6 GPa.

System and method for fabricating perovskite film for solar cell applications

A system and method for fabricating perovskite films for solar cell applications are provided, the system including a housing for use as a vacuum chamber, a substrate stage coupled to the top section of the housing; a first evaporator unit coupled to the bottom section of the housing and configured to generate BX.sub.2 (metal halide material) vapor; a second evaporator unit coupled to the housing and configured to generate AX (organic material) vapor; and a flow control unit coupled to the housing for controlling circulation of the AX vapor. The dimensions of the horizontal cross-sectional shape of the first evaporator unit, the dimensions of the horizontal cross-sectional shape of the substrate stage, and the relative position in the horizontal direction between the two horizontal cross-sectional shapes are configured to maximize the overlap between the two horizontal cross-sectional shapes.