Provided is a method of manufacturing a plasma-resistant multilayer coating film, the method including performing a primary surface treatment on a surface of a base material having a pinhole, in which a base material includes at least one material selected from ceramic, metal, semiconductor, or glass, depositing a preliminary primary coating layer covering the pinhole, on the surface of the base material, performing a secondary surface treatment on the preliminary primary coating layer to form a primary coating layer, and depositing a secondary coating layer on the primary coating layer, in which the secondary surface treatment is an ion beam treatment process, and an upper surface of the primary coating layer is flattened by the secondary surface treatment.

The invention relates to a method for treating a mirrored optical item, comprising: a substrate (10), a mirroring stack (21) of at least two interference layers (M1 to M6) carried by the substrate (10), thus increasing the reflection and having: an interference layer (M1) distant from the substrate (10), with a first initial thickness and a first refractive index and at least one near interference layer (M2) arranged between the substrate (10) and the distant interference layer (M1), with a second thickness and a second refractive index different from the first refractive index, the mirroring stack (21) giving the mirrored optical ilem (1) a first colouring according to the CIELAB space, by means of an interferometry phenomenon, the method comprising a step (103) of removing, by ion bombardment, at least in one first predetemrined zone (Z1), a thickness of the mirrored stack that is less than the sum of the initial thicknesses concerned by the removal step, the mirrored optical item having, by means of an interferometry phenomenon, a second colouring according to the CIELAB space different from the first colouring.

The present invention relates to an information storage medium and a method for long-term storage of information comprising the steps of: providing a ceramic substrate; coating the ceramic substrate with a layer of a second material different from the material of the ceramic substrate, the layer having a thickness no greater than 10 m; tempering the coated ceramic substrate to form a writable plate or disc; encoding information on the writable plate or disc by using a laser and/or a focused particle beam to manipulate localized areas of the writable plate or disc.

A film forming apparatus has a process chamber and a processing unit provided in the process chamber and forming adhesive film. The surface of the inner walls of the process chamber is formed of a material having a large getter effect on gas or water (H.sub.2O) remaining in the process chamber.

A coated tool of the present invention includes a base material and a hard coating film on the base material. The hard coating film is a nitride or carbonitride containing aluminum (Al) of 65 atomic % or more 90 atomic % or less, titanium (Ti) of 10 atomic % or more 35 atomic % or less, a total of aluminum (Al) and titanium (Ti) of 85 atomic % or more, and argon (Ar) of 0.20 atomic % or less. The hard coating film satisfies a relationship of Ih100/Is12 when a peak intensity of a (010) plane of AlN of a hexagonal close-packed structure is Ih and a sum of peak intensities due to predetermined nine crystal planes of TiN and AlN is Is in an intensity profile obtained from a selected area diffraction pattern of a transmission electron microscope.