A composite wafer has an oxide single-crystal film transferred onto a support wafer, the film being a lithium tantalate or lithium niobate film, and the composite wafer being unlikely to have cracking or peeling caused in the lamination interface between the film and the support wafer. More specifically, a method of producing the composite wafer, includes steps of: implanting hydrogen atom ions or molecule ions from a surface of the oxide wafer to form an ion-implanted layer inside thereof; subjecting at least one of the surface of the oxide wafer and a surface of the support wafer to surface activation treatment; bonding the surfaces together to obtain a laminate; heat-treating the laminate at 90 C. or higher at which cracking is not caused; and applying ultrasonic vibration to the heat-treated laminate to split along the ion-implanted layer to obtain the composite wafer.

There is provided a method for manufacturing graphene. The method includes an adsorption step of causing six-membered ring structures of carbon atoms to be adsorbed to a surface of a substrate; and an irradiation step of irradiating the surface of the substrate with a beam of a molecule containing carbon atoms.

The present invention relate to a transparent substrate laminate (10) having a transparent substrate (12), an antireflection layer (14) and an antifouling layer (16) in this order, the antireflection layer (14) contains a low-refractive index layer (142) and a high-refractive index layer (144) laminating alternately, the antifouling layer (16) contains a fluorine-containing organic compound, and when washing with ethanol and washing with a fluorine solvent under specific conditions are carried out on the antifouling layer (16) in this order, the antifouling layer (16) satisfies a ratio (i)/(ii) being more than 1 in which (i) represents a fluorine amount after the washing with ethanol and (ii) represents a fluorine amount after the washing with the fluorine solvent, and in which the fluorine amount (F amount) is measured by using an X-ray fluorescence instrument (XRF).

A device including a near field transducer, the near field transducer including gold (Au) and at least one other secondary atom, the at least one other secondary atom selected from: boron (B), bismuth (Bi), indium (In), sulfur (S), silicon (Si), tin (Sn), hafnium (Hf), niobium (Nb), manganese (Mn), antimony (Sb), tellurium (Te), carbon (C), nitrogen (N), and oxygen (O), and combinations thereof; erbium (Er), holmium (Ho), lutetium (Lu), praseodymium (Pr), scandium (Sc), uranium (U), zinc (Zn), and combinations thereof; and barium (Ba), chlorine (Cl), cesium (Cs), dysprosium (Dy), europium (Eu), fluorine (F), gadolinium (Gd), germanium (Ge), hydrogen (H), iodine (I), osmium (Os), phosphorus (P), rubidium (Rb), rhenium (Re), selenium (Se), samarium (Sm), terbium (Tb), thallium (Th), and combinations thereof.

Techniques and devices including a biocompatible antibacterial film are provided. An example method for depositing a biocompatible antibacterial film using physical vapor deposition (PVD) includes providing a substrate in a PVD processing chamber, forming a deposited film by co-depositing a first material and a second material onto the substrate from a vapor plume, wherein at least the first material is biocompatible and at least the second material is antibacterial, and nano-texturing the deposited film to produce nano-scale surface asperities that provide at least one of inhibition of bacterial growth, promotion of osseointegration, promotion of epithelial attachment, or promotion of endothelial attachment.

Provided is a sliding member having a hard carbon coating that makes high wear resistance compatible with a low coefficient of friction and that has excellent peeling resistance. A sliding member (100) includes a base member (10) and a hard carbon coating (12) formed on the base member (10). The indentation hardness of the hard carbon coating (12) decreases gradually from the base member side to the surface side. The hard carbon coating (12) has an indentation hardness distribution at 0T/Ttotal0.6 approximated by a first line and an indentation hardness distribution at 0.9T/Ttotal1 approximated by a second line, and the intersection between the first line and the second line (T2/Ttotal, H2) satisfies Expression (1), (H3H1)T2/Ttotal+H1<H20.9H1, and Expression (2), 0.6T2/Ttotal0.9.

An apparatus includes a substrate, an anodic oxidation layer, and a base layer. The anodic oxidation layer is disposed on a surface of the substrate, and the base layer is disposed on a surface of the anodic oxidation layer. The base layer includes a first base layer and a second base layer stacked on the anodic oxidation layer, and each of the first base layer and the second base layer includes a deposition layer of a first metal. An average grain size of the first base layer is less than an average grain size of the second base layer. The anodic oxidation layer includes a nanopore structure, and gains of the first base layer is at least partially embedded in the nanopore structure of the anodic oxidation layer.

The process for producing an orthopedic implant having an integrated silicon nitride surface layer includes steps for positioning the orthopedic implant inside a vacuum chamber, mixing nitrogen gas and vaporized silicon atoms in the vacuum chamber, emitting a relatively high energy beam into the mixture of nitrogen gas and vaporized silicon atoms in the vacuum chamber to cause a gas-phase reaction between the nitrogen gas and the vaporized silicon atoms to form reacted precipitate silicon nitride molecules, and driving the precipitate silicon nitride molecules with the same beam into an outer surface of the orthopedic implant at a relatively high energy such that the precipitate silicon nitride molecules implant therein and form at least a part of the molecular structure of the outer surface of the orthopedic implant, thereby forming the integrated silicon nitride surface layer.

Disclosed is a method of producing a multicomponent nanopattern having a regular array and allowing a variety of combinations of compositions by depositing a film including a multicomponent material on a substrate having a prepattern formed thereon and then conducting ion-etching thereon twice. The method can be utilized in a variety of applications requiring considerably regularly arranged multicomponent nanostructures such as transistors, organic optoelectronic devices, catalysts and gas sensors.

The process for producing an orthopedic implant having an integrated silicon nitride surface layer includes steps for positioning the orthopedic implant inside a vacuum chamber, mixing nitrogen gas and vaporized silicon atoms in the vacuum chamber, emitting a relatively high energy beam into the mixture of nitrogen gas and vaporized silicon atoms in the vacuum chamber to cause a gas-phase reaction between the nitrogen gas and the vaporized silicon atoms to form reacted precipitate silicon nitride molecules, and driving the precipitate silicon nitride molecules with the same beam into an outer surface of the orthopedic implant at a relatively high energy such that the precipitate silicon nitride molecules implant therein and form at least a part of the molecular structure of the outer surface of the orthopedic implant, thereby forming the integrated silicon nitride surface layer.