The present invention relates to a method for manufacturing a device for heat transmission, dissipation and highly efficient capillary siphoning action. The method comprises preparing a metal substrate; processing a surface of the metal substrate to form a rugged surface layer thereon; neutralizing, cleaning and drying the metal substrate to remove oil and rust thereon; placing the metal substrate into a first vacuum chamber for heating, deoxygenizing by hydrogen gas and ion bombarding to the rugged surface layer. Further, the metal substrate can be selectively subject to deposition, decomposition, degradation and reaction treatments for obtainment of a device for heat transmission, dissipation and highly efficient capillary siphoning action.

An object is to provide a method of producing a semiconductor epitaxial wafer having higher gettering capability and a reduced haze level of the surface of a semiconductor epitaxial layer.

The method of producing a semiconductor epitaxial wafer, according to the present invention includes: a first step of irradiating a semiconductor wafer 10 with cluster ions 16 thereby forming a modifying layer 18 formed from a constituent element of the cluster ions 16 contained as a solid solution, in a surface portion 10A of the semiconductor wafer; a second step of performing heat treatment for crystallinity recovery on the semiconductor wafer 10 after the first step such that the haze level of the semiconductor wafer surface portion 10A is 0.20 ppm or less; and a third step of forming an epitaxial layer 20 on the modifying layer 18 of the semiconductor wafer after the second step.

A component for a gas turbine engine is described. The component may comprise a body portion formed from a metallic material. The component may further comprise an abrasive surface forming at least one surface of the body portion, and the abrasive surface may be configured to abrade an abradable material. The abrasive surface may be formed from electrical discharge machining of the metallic material.

A finishing and coating apparatus is configured for power polishing optical components. The apparatus includes a housing, a substrate holder, a vacuum pump system, a laser, and a coating source. The housing defines a chamber and the substrate holder is disposed within the chamber and configured to hold one or more optical components. The vacuum pump system is configured to create a vacuum within the chamber. The laser includes a laser engine and a laser beam delivery apparatus configured to direct a beam from the laser engine toward the one or more optical components. The laser is configured to finish the one or more optical components prior to coating the one or more optical components.

A manufacturing method is provided. During this method, a preform component is provided for a turbine engine. The preform component includes a substrate. A meter section of a cooling aperture is formed in the substrate. An internal coating is applied onto a surface of the meter section. An external coating is applied over the substrate. A diffuser section of the cooling aperture is formed in the external coating and the substrate to provide the cooling aperture.

A method for forming an electrode catalyst layer by putting catalyst ink within an insulative container having a conductive nozzle in communication with the interior of the container and applying an electrospray voltage to the nozzle to cause electrospray of the catalyst ink through the tip end of the nozzle and thereby to form an electrode catalyst layer, the method includes preparing catalyst ink containing a mixture of at least electrode catalyst, polymer electrolyte binder and volatile organic compound and/or water, putting the catalyst ink within the container with a space remaining inside thereof and air-tightly sealing the container, and electrospraying with the space inside of the air-tightly sealed container being conditioned to have a negative pressure of a level at which the catalyst ink cannot drip off from the nozzle.

The invention relates to a method of patterning a substrate with graphene-based or other electroactive-material-based solution that includes solid-phase particles as hard templates, reducing the solution, and processing the reduced solution to expose the particles. The exposed hard template particles are removed to leave a three-dimensional (3D) porous architecture that can be beneficially used for a variety of applications, including but not limited to bio sensors and supercapacitors. In one example, the exposure is by etching with a CO.sub.2 laser. The method can be practiced with scalable MEMS fabrication technologies.

A nitride underlayer structure includes a sputtered AlN buffer layer with open band-shaped holes, thus providing a stress release path before the nitride film is grown over the buffer layer. A light-emitting diode with such nitride underlayer structure has improved lattice quality of the nitride underlayer structure and the problem of surface cracks is resolved. A fabrication method of the nitride underlayer includes providing a substrate and forming a band-shaped material layer over the substrate; sputtering an AlN material layer over the band-shaped material layer and the substrate to form a flat film; scanning back and forth from the substrate end with a laser beam to decompose the band-shaped material layer to form a sputtered AlN buffer layer with flat surface and band-shaped holes inside; and forming an Al.sub.xIn.sub.1-x-yGa.sub.yN layer (0x1, 0y1) over the sputtered AlN buffer layer.

A fuel cell separator includes a metal substrate having a surface; an ion penetration layer including carbon diffusion-inhibiting ions extending from the surface of the metal substrate into the metal substrate; and a carbon coating layer disposed on the surface of the metal substrate.

A finishing and coating apparatus combines finishing and coating optical components into one vacuum apparatus. The apparatus includes a vacuum system, a substrate holder, a finisher including a laser engine and a beam delivery apparatus, and a coating source. The finisher is configured to finish the optical components prior to coating the optical components. The finisher includes a laser engine and a laser beam delivery apparatus configured to direct a beam from the laser engine toward each of the optical components.