Patent classifications
C23C16/12
Applied low emissivity coatings for reduced emission of thermal radiation in disposable containers
Various embodiments of the presented technology include the application of a low emissivity coating, such as a vacuum chemical vapor deposited aluminum coating, to: a) a paper substrate; b) a recyclable polymer substrate; c) a biodegradable polymer substrate; d) any biodegradable substrate; e) a polymer substrate; that is then laminated to a container, such as a disposable paper coffee or tea cup. In some embodiments, the low emissivity coated laminate may be applied to the container materials prior to the materials being formed, or they may be laminated after the disposable container has been formed. The final form is a container, such as a disposable paper coffee or tea cup that has a low emissivity coating applied to all surfaces facing away from the containers contents.
Applied low emissivity coatings for reduced emission of thermal radiation in disposable containers
Various embodiments of the presented technology include the application of a low emissivity coating, such as a vacuum chemical vapor deposited aluminum coating, to: a) a paper substrate; b) a recyclable polymer substrate; c) a biodegradable polymer substrate; d) any biodegradable substrate; e) a polymer substrate; that is then laminated to a container, such as a disposable paper coffee or tea cup. In some embodiments, the low emissivity coated laminate may be applied to the container materials prior to the materials being formed, or they may be laminated after the disposable container has been formed. The final form is a container, such as a disposable paper coffee or tea cup that has a low emissivity coating applied to all surfaces facing away from the containers contents.
VAPORIZATION VESSEL AND METHOD
A tray for a vaporization vessel that includes a tray having a side wall, a bottom plate, one or more apertures that extend through the bottom plate, and a duct that extends through and from the bottom plate. The tray configured to support a solid reagent to be vaporized. A method of assembling the tray that includes forming a first tray that has the side wall and the bottom plate. A vaporization vessel that includes one or more of the trays.
Implantation using solid aluminum iodide (ALI3) for producing atomic aluminum ions and in situ cleaning of aluminum iodide and associated by-products
An ion implantation system is provided having an ion source configured to form an ion beam from aluminum iodide. A beamline assembly selectively transports the ion beam to an end station configured to accept the ion beam for implantation of aluminum ions into a workpiece. The ion source has a solid-state material source having aluminum iodide in a solid form. A solid source vaporizer vaporizes the aluminum iodide, defining gaseous aluminum iodide. An arc chamber forms a plasma from the gaseous aluminum iodide, where arc current from a power supply is configured to dissociate aluminum ions from the aluminum iodide. One or more extraction electrodes extract the ion beam from the arc chamber. A water vapor source further introduces water to react residual aluminum iodide to form hydroiodic acid, where the residual aluminum iodide and hydroiodic acid is evacuated from the system.
Implantation using solid aluminum iodide (ALI3) for producing atomic aluminum ions and in situ cleaning of aluminum iodide and associated by-products
An ion implantation system is provided having an ion source configured to form an ion beam from aluminum iodide. A beamline assembly selectively transports the ion beam to an end station configured to accept the ion beam for implantation of aluminum ions into a workpiece. The ion source has a solid-state material source having aluminum iodide in a solid form. A solid source vaporizer vaporizes the aluminum iodide, defining gaseous aluminum iodide. An arc chamber forms a plasma from the gaseous aluminum iodide, where arc current from a power supply is configured to dissociate aluminum ions from the aluminum iodide. One or more extraction electrodes extract the ion beam from the arc chamber. A water vapor source further introduces water to react residual aluminum iodide to form hydroiodic acid, where the residual aluminum iodide and hydroiodic acid is evacuated from the system.
GLITTER AND ITS USE IN COSMETIC FORMULATIONS, COATING MATERIALS AND PLASTICS
The present invention relates to biodegradable glitters with enhanced solvent resistance and enhanced temperature stability, and also to the use thereof in cosmetic formulations, coating materials, and plastics; the glitters comprise a foil which comprises cellulose.
GLITTER AND ITS USE IN COSMETIC FORMULATIONS, COATING MATERIALS AND PLASTICS
The present invention relates to biodegradable glitters with enhanced solvent resistance and enhanced temperature stability, and also to the use thereof in cosmetic formulations, coating materials, and plastics; the glitters comprise a foil which comprises cellulose.
Hydrogen co-gas when using aluminum iodide as an ion source material
An ion implantation system is provided having an ion source configured to form an ion beam from aluminum iodide. A beamline assembly selectively transports the ion beam to an end station configured to accept the ion beam for implantation of aluminum ions into a workpiece. An arc chamber forms a plasma from the aluminum iodide, where arc current from a power supply is configured to dissociate aluminum ions from the aluminum iodide. One or more extraction electrodes extract the ion beam from the arc chamber. A hydrogen co-gas source further introduces a hydrogen co-gas to react residual aluminum iodide and iodide, where the reacted residual aluminum iodide and iodide is evacuated from the system.
Hydrogen co-gas when using aluminum iodide as an ion source material
An ion implantation system is provided having an ion source configured to form an ion beam from aluminum iodide. A beamline assembly selectively transports the ion beam to an end station configured to accept the ion beam for implantation of aluminum ions into a workpiece. An arc chamber forms a plasma from the aluminum iodide, where arc current from a power supply is configured to dissociate aluminum ions from the aluminum iodide. One or more extraction electrodes extract the ion beam from the arc chamber. A hydrogen co-gas source further introduces a hydrogen co-gas to react residual aluminum iodide and iodide, where the reacted residual aluminum iodide and iodide is evacuated from the system.
ULTRALIGHT ROBUST PLATE MATERIALS
A nanoscale plate structure includes base plates and rib plates with nanoscale thickness and macroscopic lateral dimensions. The base plate resides in the first plane, the ribs can reside out-of-plane and form at least one strengthening rib, and additional base plates can reside in planes parallel to the first plane. The strengthening rib can be patterned such that there is no straight line path extending through a lateral dimension of the plate structure that does not intersect the at least one base plate and the at least one strengthening rib. The plates and ribs used in the structure have a thickness between about 1 nm and about 100 nm. The plate structures can be fabricated using a conformal deposition method including atomic layer deposition.