C23C16/36

COMPOSITIONS AND METHODS USING SAME FOR DEPOSITION OF SILICON-CONTAINING FILM

Compositions and methods using same are used for forming a silicon-containing film such as without limitation a silicon carbide, silicon oxynitride, a carbon-doped silicon nitride, a carbon-doped silicon oxide, or a carbon doped silicon oxynitride film on at least a surface of a substrate having a surface feature. The silicon-containing film is deposited using an alkylhydridosilane compound containing at least one Si—H bond.

COMPOSITIONS AND METHODS USING SAME FOR DEPOSITION OF SILICON-CONTAINING FILM

Compositions and methods using same are used for forming a silicon-containing film such as without limitation a silicon carbide, silicon oxynitride, a carbon-doped silicon nitride, a carbon-doped silicon oxide, or a carbon doped silicon oxynitride film on at least a surface of a substrate having a surface feature. The silicon-containing film is deposited using an alkylhydridosilane compound containing at least one Si—H bond.

COATED CUTTING TOOL
20230093032 · 2023-03-23 ·

A coated cutting tool for metal machining has a base body of cemented carbide, cermet, ceramics, steel or high-speed steel, and a wear resistant coating deposited thereon. The coating includes a layer of Ti.sub.1-xAl.sub.xC.sub.yN.sub.z with 0.40≤x≤0.95, 0≤y≤0.10 and 0.85≤z≤1.15, and a portion of MeC.sub.aN.sub.b, 0≤a≤1, 0≤b≤1, a+b=1, present on the layer of Ti.sub.1-xAl.sub.xC.sub.yN.sub.z. The portion of MeC.sub.aN.sub.b covers from 5 to 28% of the layer of Ti.sub.1-xAl.sub.xC.sub.yN.sub.z. A process for the production of the coated cutting tool and the use of the coated cutting tool in machining of stainless steel is also provided.

COATED CUTTING TOOL
20230093032 · 2023-03-23 ·

A coated cutting tool for metal machining has a base body of cemented carbide, cermet, ceramics, steel or high-speed steel, and a wear resistant coating deposited thereon. The coating includes a layer of Ti.sub.1-xAl.sub.xC.sub.yN.sub.z with 0.40≤x≤0.95, 0≤y≤0.10 and 0.85≤z≤1.15, and a portion of MeC.sub.aN.sub.b, 0≤a≤1, 0≤b≤1, a+b=1, present on the layer of Ti.sub.1-xAl.sub.xC.sub.yN.sub.z. The portion of MeC.sub.aN.sub.b covers from 5 to 28% of the layer of Ti.sub.1-xAl.sub.xC.sub.yN.sub.z. A process for the production of the coated cutting tool and the use of the coated cutting tool in machining of stainless steel is also provided.

Coated tool, cutting tool, and method for manufacturing machined product
11478858 · 2022-10-25 · ·

A coated tool may include a base member and a coating layer. The coating layer may include a plurality of first AlTi layers indicated by Al.sub.1-x1Ti.sub.x1 and a plurality of second AlTi layers indicated by Al.sub.1-x2Ti.sub.x2. The coating layer may have alternating first AlTi layers and second AlTi layers, i.e. one upon another in a direction away from the base member, and x1 may be larger than x2. The plurality of first AlTi layers may include a first region having two or more adjacent first AlTi layers, where a first AlTi layer of the two or more adjacent first AlTi layers is located farther away from the base member and is smaller in thickness than a first AlTi layer of the two or more adjacent first AlTi layers located closer to the base member.

Method of Deposition
20230079067 · 2023-03-16 ·

According to the present invention there is provided a method of depositing a hydrogenated silicon carbon nitride (SiCN:H) film onto a substrate by plasma enhanced chemical vapour deposition (PECVD) comprising the steps of: providing the substrate in a chamber; introducing silane (SiH.sub.4), a hydrocarbon gas or vapour, nitrogen gas (N.sub.2), and hydrogen gas (H.sub.2) into the chamber; and sustaining a plasma in the chamber so as to deposit SiCN:H onto the substrate by PECVD at a process temperature of less than about 200° C.

Method of Deposition
20230079067 · 2023-03-16 ·

According to the present invention there is provided a method of depositing a hydrogenated silicon carbon nitride (SiCN:H) film onto a substrate by plasma enhanced chemical vapour deposition (PECVD) comprising the steps of: providing the substrate in a chamber; introducing silane (SiH.sub.4), a hydrocarbon gas or vapour, nitrogen gas (N.sub.2), and hydrogen gas (H.sub.2) into the chamber; and sustaining a plasma in the chamber so as to deposit SiCN:H onto the substrate by PECVD at a process temperature of less than about 200° C.

SURFACE COATED CUTTING TOOLS
20230085248 · 2023-03-16 ·

In one aspect, cutting tools are described herein comprising wear resistant coatings employing one or more refractory layers of polycrystalline α-Al.sub.2O.sub.3. Briefly, a coated cutting tool described herein comprises a substrate, and a coating adhered to the substrate, the coating comprising a layer of polycrystalline α-Al.sub.2O.sub.3 deposited by chemical vapor deposition (CVD), wherein at least 5% of all grain boundaries in the polycrystalline α-Al.sub.2O.sub.3 layer have a misorientation angle less than 15 degrees as determined using a field-emission scanning electron microscope (FESEM) and an electron backscatter diffraction (EBSD) detector.

SURFACE COATED CUTTING TOOLS
20230085248 · 2023-03-16 ·

In one aspect, cutting tools are described herein comprising wear resistant coatings employing one or more refractory layers of polycrystalline α-Al.sub.2O.sub.3. Briefly, a coated cutting tool described herein comprises a substrate, and a coating adhered to the substrate, the coating comprising a layer of polycrystalline α-Al.sub.2O.sub.3 deposited by chemical vapor deposition (CVD), wherein at least 5% of all grain boundaries in the polycrystalline α-Al.sub.2O.sub.3 layer have a misorientation angle less than 15 degrees as determined using a field-emission scanning electron microscope (FESEM) and an electron backscatter diffraction (EBSD) detector.

COATED TOOL
20230126815 · 2023-04-27 ·

A coated tool includes a base and a coating layer on the base. The coating layer includes a first layer including Al.sub.2O.sub.3 particles, and a second layer on the first layer. The second layer includes, sequentially from the base, a first film, a second film in contact with the first film, and a third film in contact with the second film. The first to third films individually include Ti. The first film, the second film and the third film individually include at least one kind selected from C and N. The coated tool satisfies a relationship of a first N content>a third N content>a second N content, in which the first N content is an N content in the first film, the second N content is an N content in the second film, and the third N content is an N content in the third film.