C23C16/487

Method for manufacturing crystal film

A method for manufacturing a crystal film including: forming a Zr film on a substrate heated to 700? C. or more by a vapor deposition method using a vapor deposition material having a Zr single crystal; forming a ZrO.sub.2 film on said Zr film on a substrate heated to 700? C. or more, by a vapor deposition method using said vapor deposition material having a Zr single crystal, and oxygen; and forming a Y.sub.2O.sub.3 film on said ZrO.sub.2 film on a substrate heated to 700? C. or more, by a vapor deposition method using a vapor deposition material having Y, and oxygen.

METHOD OF BURYING SAMPLE TRENCH
20180282870 · 2018-10-04 · ·

The invention provides a method of burying trenches of a sample comprises at least the steps of: from the sample having the trenches extending from one surface into a depth direction, cutting a sample piece of a small part including the trenches; and by irradiating an electron beam toward the inside of the trenches from a side surface extending along the depth direction of the sample piece and simultaneously injecting a compound gas into the inside of the trenches from openings on the side of the one surface of the trench, decomposing the compound gas with secondary electrons generated by irradiation of the electron beam and depositing constituents of the compound gas within the trenches. Therefore, the method can bury the trenches uniformly without generating cavities within the trenches even if the trenches of the sample piece have a high aspect ratio deep in a depth direction.

DEPOSITION OR TREATMENT OF DIAMOND-LIKE CARBON IN A PLASMA REACTOR

A method of performing deposition of diamond-like carbon on a workpiece in a chamber includes supporting the workpiece in the chamber facing an upper electrode suspended from a ceiling of the chamber, introducing a hydrocarbon gas into the chamber, and applying first RF power at a first frequency to the upper electrode that generates a plasma in the chamber and produces a deposition of diamond-like carbon on the workpiece. Applying the RF power generates an electron beam from the upper electrode toward the workpiece to enhance ionization of the hydrocarbon gas.

ALTERNATING BETWEEN DEPOSITION AND TREATMENT OF DIAMOND-LIKE CARBON

A method of forming a layer of diamond-like carbon on a workpiece includes supporting the workpiece in a chamber with the workpiece facing an upper electrode, and forming a plurality of successive sublayers to form the layer of layer of diamond-like carbon by alternating between depositing a sublayer of diamond-like carbon on the workpiece in the chamber and treating the sublayer with a plasma of the inert gas or an electron beam from the upper electrode.

Patterned atomic layer etching and deposition using miniature-column charged particle beam arrays

Methods and systems for direct atomic layer etching and deposition on or in a substrate using charged particle beams. Electrostatically-deflected charged particle beam columns can be targeted in direct dependence on the design layout database to perform atomic layer etch and atomic layer deposition, expressing pattern with selected 3D-structure. Reducing the number of process steps in patterned atomic layer etch and deposition reduces manufacturing cycle time and increases yield by lowering the probability of defect introduction. Local gas and photon injectors and detectors are local to corresponding columns, and support superior, highly-configurable process execution and control.

Method for Long-Term Storage of Information and Storage Medium Therefor
20240416458 · 2024-12-19 ·

The present invention relates to an information storage medium and a method for long-term storage of information comprising the steps of: providing a ceramic substrate; coating the ceramic substrate with a layer of a second material different from the material of the ceramic substrate, the layer having a thickness no greater than 10 m; tempering the coated ceramic substrate to form a writable plate or disc; encoding information on the writable plate or disc by using a laser and/or a focused particle beam to manipulate localized areas of the writable plate or disc.

Precision material modification using miniature-column charged particle beam arrays

Methods, devices and systems for targeted, maskless modification of material on or in a substrate using charged particle beams. Electrostatically-deflected charged particle beam columns can be targeted in direct dependence on the design layout database to perform direct and knock-on ion implantation, producing patterned material modifications with selected chemical and 3D-structural profiles. The number of required process steps is reduced, reducing manufacturing cycle time and increasing yield by lowering the probability of defect introduction. Local gas and photon injectors and detectors are local to corresponding individual columns, and support superior, highly-configurable process execution and control. Targeted implantation can be used to prepare the substrate for patterned blanket etch; patterned ALD can be used to prepare the substrate for patterned blanket deposition; neither process requiring photomasks or resist. Arrays of highly configurable beam columns can also be used to perform both positive and negative tone lithography in a single pass.

Precision material modification using miniature-column charged particle beam arrays

Methods, devices and systems for targeted, maskless modification of material on or in a substrate using charged particle beams. Electrostatically-deflected charged particle beam columns can be targeted in direct dependence on the design layout database to perform direct and knock-on ion implantation, producing patterned material modifications with selected chemical and 3D-structural profiles. The number of required process steps is reduced, reducing manufacturing cycle time and increasing yield by lowering the probability of defect introduction. Local gas and photon injectors and detectors are local to corresponding individual columns, and support superior, highly-configurable process execution and control. Targeted implantation can be used to prepare the substrate for patterned blanket etch; patterned ALD can be used to prepare the substrate for patterned blanket deposition; neither process requiring photomasks or resist. Arrays of highly configurable beam columns can also be used to perform both positive and negative tone lithography in a single pass.

Deposition of a protective coating including metal-containing and chromium-containing layers on zirconium alloy for nuclear power applications

The invention relates to compositions and methods for coating a zirconium alloy cladding of a fuel element for a nuclear water reactor. The coating includes a first tier or layer and a second tier or layer. The first layer includes an elemental metal and the second layer is an oxidation-resistant layer that includes elemental chromium. The first layer serves as an intermediate layer between the zirconium alloy substrate and the second layer. This intermediate layer can be effective to improve adhesion of the second layer to the zirconium alloy substrate. The multilayer coating forms a protective layer which provides improved capability for the zirconium alloy cladding to withstand normal and accident conditions to which it is exposed in the nuclear reactor.

Graphene-coated steel sheet, and method for manufacturing same

A graphene-coated steel sheet and a method for manufacturing the same are provided. The graphene-coated steel sheet includes a steel sheet and a graphene layer formed on the steel sheet. Therefore, the graphene-coated steel sheet can be useful in preventing corrosion of iron, such as oxidation of iron, and has remarkably excellent thermal conductivity and electrical conductivity, as well as excellent heat resistance resulting from thermal stability of graphene. Also, the method can be useful in manufacturing a high-quality graphene-coated steel sheet having a monocrystalline form and showing substantially no defects or impurities.