C23C16/545

Atomic layer deposition apparatus, film-forming method using atomic layer deposition apparatus, and cleaning method of atomic layer deposition apparatus

A plasma atomic layer deposition apparatus includes: a source gas supply port functioning also as a cleaning gas supply port provided on a first side wall of a film-forming container; and a source gas exhaust port functioning also as a cleaning gas exhaust port provided on a second side wall opposed to the first side wall of the film-forming container.

Thin film deposition preparation device and method

The invention provides a thin film deposition system and a method, and relates to the field of thin film deposition. The deposition method comprises the following steps: 1) heating metal substrate; carrying out deposition. The method is characterized in the step 1) that a current is conducted into the metal substrate at one end of the growth zone by one electrode, and out of the metal substrate at the other end of the growth zone by the other electrode, so that the metal substrate is heated by the heat emitting of the resistant of the metal substrate itself. According to the method, the quality of the prepared thin film is improved, while the preparation cost of the thin film is reduced. In addition, the consistent double-sided thin films can be easily prepared on two surfaces of the metal substrate by employing the system and method.

DEVICE AND METHOD FOR OPENLY AND CONTINUOUSLY GROWING CARBON NANOMATERIALS
20210348268 · 2021-11-11 ·

The invention discloses equipment and preparation method for open and continuous growth of a carbon nanomaterial. The equipment comprises a metal foil tape feeding system, a CVD system and a collection system. The method includes continuously conveying a metal foil tape pretreated or not into the CVD system via the metal foil tape feeding system, depositing a required carbon nanomaterial on the surface of the metal foil tape by CVD, directly collecting by the collection system or directly post-treating the carbon nanomaterial by a post-treatment system, and even directly producing a end product of the carbon nanomaterial. All the systems in the invention are arranged in the open atmosphere rather than an air-isolated closed space. The invention can realize round-the-clock continuous operation to greatly improve the production efficiency of carbon nanomaterials.

SYSTEM AND METHOD FOR DEPOSITING OF A FIRST AND SECOND LAYER ON A SUBSTRATE
20220002874 · 2022-01-06 ·

System and method for depositing a first layer on a flexible strip-shaped or sheet-shaped substrate and a second layer on the first layer. The system comprises a first deposition unit of a first type which is provided with a first supporting body, a conveying device for conveying the substrate in a conveying direction which extends parallel to a first central line of the first supporting body along the radial outer side of the supporting body. Downstream of the first deposition unit, the system furthermore comprises a second deposition unit which is provided with a second supporting body with a second central line which is in line with the first central line, and a wrapping device for keeping the substrate in a wrapped state, the substrate being wrapped around at least a part of the radial outer sides of the first supporting body and of the second supporting body.

VACUUM PROCESSING DEVICE

A device of executing vacuum processing is provided with: a chamber including a single main chamber executing the vacuum processing and being capable of keeping the chamber as a whole in a depressurized state; a plurality of feeding rollers so arranged as to hang down a plurality of threads in the main chamber with keeping the threads from each other; a plurality of winding bobbins respectively winding the plurality of threads independently, the winding bobbins arranged in the chamber horizontally apart from the plurality of threads vertically hung down; and a plurality of movable arms being respectively movable in the chamber from a first position horizontally apart from the plurality of threads vertically hung down, via a second position in contact with any of the plurality of threads, to a third position to make the threads in contact be in contact with corresponding winding bobbins.

VACUUM PROCESSING DEVICE

A device of executing vacuum processing is provided with: a chamber including a single main chamber executing the vacuum processing and being capable of keeping the chamber in a depressurized state; a feeding roller so disposed as to hang down a reinforcement fiber in the main chamber; a winding bobbin winding the reinforcement fiber, the winding bobbin disposed in the chamber horizontally apart from the reinforcement fiber vertically hung down; and a swing body pivotally supported in the chamber to swing about a pivot and including a suspension arm capable of capturing and suspending the reinforcement fiber according to a swing motion of the swing body, the suspension arm is capable of swinging from a first position horizontally apart from the reinforcement fiber vertically hung down, via a second position for capturing the reinforcement fiber, to a third position to suspend the reinforcement fiber above the winding bobbin.

Nozzle exit contours for pattern composition

A deposition nozzle is provided that includes offset deposition apertures disposed between exhaust apertures on either side of the deposition apertures. The provided nozzle arrangements allow for deposition of material with a deposition profile suitable for use in devices such as OLEDs.

Heat treatment apparatus for high-quality graphene synthesis
11214869 · 2022-01-04 · ·

A heat treatment apparatus for high-quality graphene synthesis comprises an upper roll chamber, a deposition chamber connected to the upper roll chamber to deposit graphene on a catalytic metal film, and a lower roll chamber mounted on a lower portion of the deposition chamber. The upper roll chamber includes a supply roller and the lower roll chamber includes a lower direction shifting roller shifting a direction of the catalytic metal film supplied from the supply roller. In the deposition chamber, a catalytic metal film at a supply side transferred from the supply roller to the lower direction shifting roller and a catalytic metal film at a discharge side transferred from the lower direction shifting roller to a winding roller are passed, and a heater portion is mounted around the catalytic metal film at the supply side and the catalytic metal film at the discharge side.

CONTINUOUS PRODUCTION OF NANOFORESTS

Methods and apparatuses for continuous, large scale, commercially viable production of nanoforests. A roll-to-roll process passes a flexible substrate, including fibers and fabrics, through a furnace. Precursors are introduced in a growth zone in which a vertical or horizontal nanoforest of nanotubes or nanowires is grown on the substrate. Sensors and actuators with feedback control are provided for parameters such as substrate speed, substrate tension, furnace temperature, precursor flow rate, nanoforest thickness, and nanoforest. The furnace is preferably enclosed for environmental and safety purposes. The feed roll and take-up roll are disposed in housings can be attached to the furnace via airlocks, which enables rapid loading and unloading of the rolls using techniques well known in the industry while maintaining furnace conditions. The furnace can encompass flattening rollers and a second growth zone to enable manufacture of orthogonal nanoforests comprising a vertical nanoforest grown on a horizontal nanoforest.

Cyclical epitaxial deposition system and gas distribution module thereof

A cyclical epitaxial deposition system and a gas distribution module are provided. The gas distribution module includes an inflow element having a plurality of inlet holes, a guide assembly, and an outflow element. The guide assembly disposed between the inflow and outflow elements includes a plurality of guide channels separate from one another and a plurality of temporary gas retention trenches respectively corresponding to the guide channels. Each of the guide channels is in fluid communication with the corresponding inlet hole. The outflow element has a plurality of diffusion regions respectively corresponding to the gas retention trenches, and a plurality of outlet channels respectively corresponding to the diffusion regions. Each of the diffusion regions has a plurality of diffusion apertures, and each of the temporary gas retention trenches is in fluid communication with the corresponding outlet channel through the diffusion apertures in the corresponding diffusion region.