Methods are provided for selectively depositing a material on a first surface of a substrate relative to a second, different surface of the substrate. The selectively deposited material can be, for example, a metal, metal oxide, or dielectric material.

A layered tetravalent metal phosphate composition (e.g., a layered zirconium phosphate composition) and a first corrosion inhibitor (e.g., cerium (III), a vanadate, a molybdate, a tungstate, a manganous, a manganate, a permanganate, an aluminate, a phosphonate, a thiazole, a triazole, and/or an imidazole) is dispersed in an aqueous solution and stirred to form a first solution. A precipitate of the first solution is collected and washed to form a first corrosion inhibiting material (CIM), which includes the first corrosion inhibitor intercalated in the layered tetravalent metal phosphate composition. The first CIM is added to a first sol-gel composition to form a first CIM-containing sol-gel composition. The first CIM-containing sol-gel composition is applied on a substrate to form a CIM-containing sol-gel layer, cured by UV radiation, and thermally cured to form a corrosion-resistant coating. One or more additional sol-gel composition may be applied on the substrate.

The present disclosure relates to a self-supporting electrocatalytic material and a preparation method thereof, the self-supporting electrocatalytic material is a Cu.sub.2O/WO.sub.3/CF self-supporting electrocatalytic material. The Cu.sub.2O/WO.sub.3/CF self-supporting electrocatalytic material comprises: a foamed copper substrate, and Cu.sub.2O and WO.sub.3 grown in situ on the foamed copper substrate.

Porous, binderless ceramic surface modification materials are described, and applications of use thereof. The ceramic material may include a metal oxide and/or metal hydroxide, and/or hydrates thereof, on a substrate surface.

Methods are provided for selectively depositing a material on a first surface of a substrate relative to a second, different surface of the substrate. The selectively deposited material can be, for example, a metal, metal oxide, or dielectric material.

Provided is a barrier film, comprising a base layer and an inorganic layer including a first region and a second region, which have different elemental contents (atomic %) of Si, N, and O from each other as measured by XPS, and having a compactness expressed through an etching rate of 0.17 nm/s in the thickness direction for an Ar ion etching condition to etch Ta.sub.2O.sub.5 at a rate of 0.09 nm/s, wherein the second region has a higher elemental content of N than that of the first region, and the second region has a thickness of 10% or more relative to the total thickness of the inorganic layer. The barrier film has excellent barrier properties and optical properties and can be used for electronic products which are sensitive to moisture and the like.

The present invention relates to a photoelectric film and a fabrication method thereof, and in particular, to a layered polycrystalline lead selenide (PbSe) film and a fabrication method thereof. The fabrication method mainly includes: (1) fabricating a dense PbSe layer on a substrate through chemical bath deposition (CBD); (2) fabricating a loose plumbonacrite (Pb.sub.10O(OH).sub.6(CO.sub.3).sub.6) layer on the dense PbSe layer through CBD; (3) placing a sample with the dense PbSe layer and the Pb.sub.10O(OH).sub.6(CO.sub.3).sub.6 layer in a selenium ion-containing solution to allow an ion exchange reaction to finally form the layered polycrystalline PbSe film. The fabrication method has the advantages of simple process, low cost, and high controllability. The PbSe film fabricated by the method is composed of a lower dense polycrystalline cubic PbSe layer and an upper loose polycrystalline cubic PbSe layer, which can be widely used in the fabrication of components in the field of photoelectric conversion or thermoelectric conversion, such as infrared (IR) sensors, solar cells, laser emitters, and thermoelectric converters.

The plasma-resistant coating film according to the present invention is formed on a substrate, including crystalline Y.sub.2O.sub.3 particles having an average particle diameter of 0.5 μm to 5.0 μm in a SiO.sub.2 film, in which a film density of the plasma-resistant coating film is 90% or more, the film density being obtained by performing image analysis of a cross section of the film with an electron scanning microscope and by using the following expression (1), a size of pores in the film is 5 μm or less in terms of diameter, and a peeling rate of the film from the substrate measured by performing a cross-cut test is 5% or less. Film density (%)=[(S.sub.1−S.sub.2)/S.sub.1]×100 (1). However, in the expression (1), S.sub.1 is an area of the film and S.sub.2 is an area of a pore portion in the film.

The present invention relates to fan cover (6), in particular a fan cover (6) for a cooking appliance (1), obtainable by a process characterised by the following steps, a) providing a fan cover (6) having an inner surface (7a), an outer surface (7b) and at least one opening (8) allowing a fluid to flow through, b) pretreating of at least the inner surface (7a) of the fan cover (6) for providing a surface having a roughness being suitable for applying a non-stick and/or non-wetting coating (12) by mechanical treatment, physical treatment or chemical treatment, in particular by sandblasting and/or laser treatment and/or an enamelling process to form a ground layer (13), c) applying the non-stick and/or non-wetting coating (12) to the inner surface (7a) of the fan cover (6) or the surface (14a) of the ground layer (13), wherein the non-stick and/or non-wetting coating (12) comprises at least one layer (17) that is obtained by a sol-gel process from a first composition comprising a silica sol and a silane. The invention further relates to a cooking appliance (1), in particular a domestic oven comprising such a fan cover (6) and a method for manufacturing such a fan cover (6).

The present invention relates to component, in particular a top plate (2) for a gas hob (1) and/or a burner cap (6a, 6b) of a gas burner (5a, 5b) for a gas hob (1), having a non-stick and/or non-wetting coating (12) obtainable by a process characterised by the following steps, a) providing a component, in particular a top plate (2) and/or a burner cap (6a, 6b), having an upper surface (7a) and a bottom surface (11b), b) preferably, pretreating of at least the upper surface of the component, in particular the top plate or the burner cap, for providing a surface having a roughness being suitable for applying a non-stick and/or non-wetting coating, by mechanical treatment, physical treatment or chemical treatment, in particular by sand-blasting and/or laser treatment and/or a surface activation treatment, particularly a plasma treatment, and/or an enameling process to form a ground layer (13), thus applying an enamel layer onto the upper surface of the component, in particular the top plate or the burner cap, c) applying the non-stick and/or non-wetting coating (12) to the upper surface (11a) of the component, in particular a top plate (2) and/or a burner cap (6a, 6b), or the surface (14a) of the ground layer (13), wherein the non-stick and/or non-wetting coating (12) comprises at least one layer (17) that is obtained by a sol-gel process from a first composition comprising a silica sol and a silane. The invention further relates to a cooking appliance (1), in particular a gas hob comprising such a component, in particular a top plate (2) and/or a burner cap (6a, 6b), and a method for manufacturing such a component, in particular a top plate (2) and/or a burner cap (6a, 6b).