Patent classifications
C23C28/341
Cold spray metallic coating and methods
The present disclosure relates to a cold spray metal process for imparting electromagnetic interference (EMI) resistance or lightning protection to the surface of a polymer, and a polymer with surface EMI resistance, or lightning protection, articles coated therefrom, and methods of reducing or eliminating electrochemical interactions between the metallic coating and components of the polymer.
COLD SPRAY METALLIC COATING AND METHODS
The present disclosure relates to a cold spray metal process for imparting EMI resistance or lightning protection to the surface of a polymer, and a polymer with surface EMI resistance, or lightning protection, articles coated therefrom, and methods of reducing or eliminating electrochemical interactions between the metallic coating and components of the polymer.
Simultaneous selective deposition of two different materials on two different surfaces
In some embodiments, methods are provided for simultaneously and selectively depositing a first material on a first surface of a substrate and a second, different material on a second, different surface of the same substrate using the same reaction chemistries. For example, a first material may be selectively deposited on a metal surface while a second material is simultaneously and selectively deposited on an adjacent dielectric surface. The first material and the second material have different material properties, such as different etch rates.
Metal-Containing Structures, and Methods of Treating Metal-Containing Material to Increase Grain Size and/or Reduce Contaminant Concentration
Some embodiments include a method of forming a conductive structure. A metal-containing conductive material is formed over a supporting substrate. A surface of the metal-containing conductive material is exposed to at least one radical form of hydrogen and to at least one oxidant. The exposure alters at least a portion of the metal-containing conductive material to thereby form at least a portion of the conductive structure. Some embodiments include a conductive structure which has a metal-containing conductive material with a first region adjacent to a second region. The first region has a greater concentration of one or both of fluorine and boron relative to the second region.
Motor Vehicle Headlamp
The invention relates to a motor vehicle headlamp (8) comprising a vehicle headlamp housing (9), an at least sectionally transparent cover pane (10) that closes the vehicle headlamp housing (9), a light source (11) that is accommodated in the vehicle headlamp housing (9) and serves for radiating light through the cover pane (10), and at least one motor vehicle design element (3) that is accommodated in the vehicle headlamp housing (9), wherein the at least one motor vehicle design element (3) comprises a dimensionally stable substrate (1) with at least one coated side.
COATED PART COMPRISING A PROTECTIVE COATING BASED ON MAX PHASES
A coated part includes a metallic substrate, a thermal barrier comprising a ceramic material and covering the metallic substrate, wherein the coated part further includes a protective coating covering the thermal barrier, the protective coating including, in a first region, a first MAX phase, denoted PZ2, of formula (Zr.sub.xTi.sub.1-x,).sub.2AlC or a first MAX phase, denoted PC2, of formula (Cr.sub.xTi.sub.1-x,).sub.2AlC with x non-zero and less than or equal to 1 in the MAX phases PZ2 and PC2, and the protective coating includes, in a second region covering the first region, a second MAX phase of formula Ti.sub.2AlC.
Black diamond like carbon (DLC) coated articles and methods of making the same
A device comprising: a substrate; a first coating deposited on the substrate; an intermediate coating deposited on the first coating, wherein the first coating is interposed between the substrate and the intermediate coating; and a second coating deposited on the intermediate coating, wherein the intermediate coating is interposed between the first coating and the second coating, and the second coating is outermost and black. The substrate, the first coating, the intermediate coating and the second coating define at least one of a jewelry item and a component of a jewelry item.
SIMULTANEOUS SELECTIVE DEPOSITION OF TWO DIFFERENT MATERIALS ON TWO DIFFERENT SURFACES
In some embodiments, methods are provided for simultaneously and selectively depositing a first material on a first surface of a substrate and a second, different material on a second, different surface of the same substrate using the same reaction chemistries. For example, a first material may be selectively deposited on a metal surface while a second material is simultaneously and selectively deposited on an adjacent dielectric surface. The first material and the second material have different material properties, such as different etch rates.
PRECIOUS METAL LAMINATE AND METHODS OF MANUFACTURE
A precious metallic laminate may include a first transparent substrate, a transparent transition layer deposited on the first transparent substrate, and a metallic layer deposited on the transparent transition layer. The metallic layer may include a precious metal. The laminate may include a second transparent substrate covering the metallic layer.
METHOD AND APPARATUS FOR ETCHING A LITHOGRAPHY MASK
Method for the particle beam-induced etching of a lithography mask, more particularly a non-transmissive EUV lithography mask, having the steps of: a) providing the lithography mask in a process atmosphere, b) beaming a focused particle beam onto a target position on the lithography mask, c) supplying at least one first gaseous component to the target position in the process atmosphere, where the first gaseous component can be converted by activation into a reactive form, where the reactive form reacts with a material of the lithography mask to form a volatile compound, and d) supplying at least one second gaseous component to the target position in the process atmosphere, where the second gaseous component under predetermined process conditions with exposure to the particle beam forms a deposit comprising a compound of silicon with oxygen, nitrogen and/or carbon.