The invention is directed at sputter targets including 50 atomic % or more molybdenum, a second metal element of titanium, and a third metal element of chromium or tantalum, and deposited films prepared by the sputter targets. In a preferred aspect of the invention, the sputter target includes a phase that is rich in molybdenum, a phase that is rich in titanium, and a phase that is rich in the third metal element.

A titanium product for a separator of a proton exchange membrane fuel cell according to the present invention includes: a base material that consists of commercially pure titanium; a first oxide layer that is formed in a surface layer of the titanium product, consists of TiO.sub.2 of a rutile crystallinity, and has a thickness of 0.1 to 1.5 nm; and a second oxide layer that is formed between the base material and the first oxide layer, consists of TiO.sub.x (1<x<2), and has a thickness of 3 to 20 nm. This titanium product is suitable to be used as a separator of a proton exchange membrane fuel cell that has a high corrosion resistance in an environment in a fuel cell, is capable of keeping a low contact resistance with an electrode consisting of carbon fiber and the like, and is inexpensive.

A coated titanium material includes a titanium material and a coating film formed on a surface of the titanium material. A Ti-based oxide is included in an interface between the titanium material and the coating film. The Ti-based oxide is one or both rutile type TiO.sub.2 and Ti.sub.2O.sub.3. In a case where a cut surface of the coating film is formed by using a SAICAS method under conditions that a horizontal speed is 2 m/s and a vertical speed is 0.1 m/s, on the cut surface, an area percentage of the Ti-based oxide is 30.0% or more in a region having a distance of 15 m from a reference line specified on the basis of a boundary line, which is an intersection line between the cut surface and the interface, to a coating film side.

A method of forming an implant to be implanted into living bone is disclosed. The method comprises the act of roughening at least a portion of the implant surface to produce a microscale roughened surface. The method further comprises the act of immersing the microscale roughened surface into a solution containing hydrogen peroxide and a basic solution to produce a nanoscale roughened surface consisting of ranopitting superimposed on the microscale roughened surface. The nanoscale roughened surface has a property that promotes osseointegration.

The invention relates to a method for modification of a biocompatible component. The method of the invention includes the steps of a) providing a biocompatible component at least partly covered by metallic oxide; and b) treating at least a part of the component, which part is covered by the metallic oxide, with an aqueous composition that includes oxalic acid; whereby a modified metallic oxide, is obtained. The invention also relates to a biocompatible component-including a substrate having a surface with a) a microstructure including pits separated by plateus and/or ridges; and b) a primary nanostructure being superimposed on the microstructure, the primary nanostructure having depressions arranged in a wave-like formation.

The manufacturing cost of a sputtering target is reduced and the impurity concentration of the manufactured sputtering target is also reduced. A method of manufacturing a sputtering target includes: surface-treating at least one of a used sputtering target and a scrap material; melting at least one of the used sputtering target and the scrap material after the surface treatment to form an ingot; and manufacturing a sputtering target by subjecting the ingot to forging, rolling, heat treating, and machining.

An acidic treatment liquid processing apparatus includes: a tank having an interior space; a diaphragm permeable to a metal cation and separating the interior space of the tank into a first chamber and a second chamber; a first electrode disposed in the first chamber; a second electrode disposed in the second chamber; a power supply configured to apply a voltage while using the first electrode as an anode and the second electrode as a cathode; a first liquid passing part configured to pass an acidic treatment liquid containing a dichromate ion and a metal cation into the first chamber; and a second liquid passing part configured to pass an acid aqueous solution into the second chamber.

A high-purity tantalum powder and a preparation method therefor. The sum of W, Mo and Nb content of the high-purity tantalum powder is less than 0.6 ppm, Mg content is less than 1 ppm, and oxygen content is less than 600 ppm. The high-purity tantalum powder can be used to prepare a high-purity tantalum target.