C25D3/562

Method for microstructure modification of conducting lines

A method for microstructure modification of conducting lines is provided. An electroplating process is performed to deposit the metal thin film/conducting line(s) with a face-centered cubic (FCC) structure and a preferred crystallographic orientation over a surface of a substrate. The metal thin film/conducting line(s) is subsequently subjected to a thermal annealing process to modify its microstructure with the grain sizes in a range of 5 μm to 100 μm. The thermal annealing process is conducted at the temperature of above 25 degrees Celsius and below 240 degrees Celsius.

Metal mask substrate for vapor deposition, metal mask for vapor deposition, production method for metal mask substrate for vapor deposition, and production method for metal mask for vapor deposition

A vapor deposition metal mask substrate includes a nickel-containing metal sheet including a obverse surface and a reverse surface, which is opposite to the obverse surface. At least one of the obverse surface and the reverse surface is a target surface for placing a resist layer. The target surface has a surface roughness Sa of less than or equal to 0.019 μm. The target surface has a surface roughness Sz of less than or equal to 0.308 μm.

Metal plate for manufacturing deposition mask and manufacturing method for metal plate, and deposition mask and manufacturing method for deposition mask

The metal plate includes a plurality of pits located on the surface of the metal plate. The manufacturing method for a metal plate for use in manufacturing of a deposition mask includes an inspection step of determining a quality of the metal plate based on a sum of volumes of a plurality of pits located at a portion of the surface of the metal plate.

Articles including a nickel and chromium layer and methods of forming the same

Articles including a layer comprising nickel and chromium as well as related methods are described herein.

ELECTROLYTE FOR ELECTROCHEMICAL MACHINING OF GAMMA-GAMMA PRIME NICKEL-BASED SUPERALLOYS

An electrolyte for electrochemical machining of a γ-γ′ nickel-based superalloy includes NaNO.sub.3 at a content of between 10 and 50% by weight relative to the total weight of the electrolyte; an additive chosen from KBr, NaBr, KI, NaI and mixtures thereof, in an additive/NaNO.sub.3 molar ratio of between 1 and 15; optionally an ethylenediaminetetraacetic acid-based complexing agent at a content of between 1 and 5% by weight relative to the total weight of the electrolyte at a pH of between 6 and 12; optionally an anionic surfactant at a content of between 1 and 5% by weight relative to the total weight of the electrolyte; optionally NaOH to obtain the appropriate pH; and an aqueous solvent.

PLATED STEEL SHEET FOR HOT STAMPING

The present invention relates to a plated steel sheet for hot stamping comprising a steel sheet and a Zn—Ni plating layer formed on at least one surface of the steel sheet, wherein the Zn—Ni plating layer has an Ni concentration of 8 mass % or more, a plating deposition amount of 10 g/m.sup.2 or more and 90 g/m.sup.2 or less per surface, and an average grain size of 50 nm or more, and a difference between a diffraction peak of the Zn—Ni plating layer after heat treating the plated steel sheet for hot stamping at 200° C. for 1 hour, and a diffraction peak of the Zn—Ni plating layer before heat treating it, is 0.3° or less.

Terminal material for connectors, terminal, and electric wire termination structure

A terminal material for a connector terminal, using a copper or copper alloy substrate is crimped to an end of wire formed from an aluminum wire material; and a terminal using this terminal material: a zinc layer 4 that is formed of zinc or a zinc alloy and a tin layer 5 that is formed of tin or a tin alloy are sequentially laminated in this order on a substrate 2 that is formed of copper or a copper alloy: with respect to the zinc layer and the tin layer, the adhesion amount of tin contained in the whole layers is from 0.5 mg/cm.sup.2 to 7.0 mg/cm.sup.2 (inclusive) and the adhesion amount of zinc contained in the whole layers is from 0.07 mg/cm.sup.2 to 2.0 mg/cm.sup.2 (inclusive), and the content percentage of zinc in the vicinity of the surface is from 0.2% by mass to 10.0% by mass (inclusive).

Iron tungsten coating formulations and processes

An electrolyte solution for iron-tungsten plating is prepared by dissolving in an aqueous medium a divalent iron salt (e.g., iron (II) sulfate) and an alkali metal citrate (e.g., sodium citrate, potassium citrate, or other alkali metal citrate) to form a first solution, dissolving in the first solution a tungstate salt (e.g., sodium tungstate, potassium tungstate, or other potassium tungstate) to form a second solution, and dissolving in the second solution a citric acid to form the electrolyte solution. An iron-tungsten coating is formed on a substrate using the electrolyte solution by passing a current between a cathode and an anode through the electrolyte solution to deposit iron and tungsten on the substrate.

Electrode for battery and fabrication method thereof

An electrode for a battery, comprising an active material and a metallic fabric is disclosed. The metallic fabric comprises fibers being at least partially covered by a coating of nickel or copper, which comprises a layer and a plurality of protrusions protruding from the layer. The active material is attached on the protrusions. The metallic fabric provides a high electrical conductivity and a high mechanical stability, and demonstrates outstanding performance for the use as a current collector of battery.

IRON ALLOY WIRE COATINGS FOR WIRELESS RECHARGING DEVICES AND RELATED METHODS

Articles and methods for depositing iron alloy coatings onto metal wires for wireless recharging devices are generally described.