C25D3/60

ELECTRONIC COMPONENT AND METHOD THEREOF
20200203720 · 2020-06-25 · ·

An electronic component includes an element main body and at least a pair of outer electrodes on the element main body. The outer electrodes each include an underlying electrode layer positioned so as to be in contact with the element main body and a plating layer positioned so as to be in contact with the underlying electrode layer. The plating layer includes a NiSn alloy plating layer positioned so as to be in contact with the underlying electrode layer.

Tin-plated product and method for producing same

There is provided a tin-plated product having an excellent minute sliding abrasion resistance property when it is used as the material of insertable and extractable connecting terminals, and a method for producing the same. After a nickel layer 16 is formed on a substrate 10 of copper or a copper alloy so as to have a thickness of 0.1 to 1.5 m by electroplating, a tin-copper plating layer 12 containing tin 12b mixed with a copper-tin alloy 12a is formed thereon so as to have a thickness of 0.6 to 10 m by electroplating using a tin-copper plating bath which contains 5 to 35% by weight of copper with respect to the total amount of tin and copper, and then, a tin layer 14 is formed thereon so as to have a thickness of 1 m or less by electroplating if necessary.

Tin-plated product and method for producing same

There is provided a tin-plated product having an excellent minute sliding abrasion resistance property when it is used as the material of insertable and extractable connecting terminals, and a method for producing the same. After a nickel layer 16 is formed on a substrate 10 of copper or a copper alloy so as to have a thickness of 0.1 to 1.5 m by electroplating, a tin-copper plating layer 12 containing tin 12b mixed with a copper-tin alloy 12a is formed thereon so as to have a thickness of 0.6 to 10 m by electroplating using a tin-copper plating bath which contains 5 to 35% by weight of copper with respect to the total amount of tin and copper, and then, a tin layer 14 is formed thereon so as to have a thickness of 1 m or less by electroplating if necessary.

Joining member, solder material, solder paste, formed solder, flux coated material, and solder joint

Provided herein is a solder material that includes a spherical core that provides space between a joint object and another object to be joined to the joint object and a solder coated layer that has a melting point at which a core layer of the core is not melted. The solder coated layer includes Sn as a main ingredient and 0 to 2 mass % of Ag, and coats the core. The solder coated layer has an average grain diameter of crystal grains of 3 m or less, and the solder material has a spherical diameter of 1 to 230 m and a sphericity of 0.95 or more.

Joining member, solder material, solder paste, formed solder, flux coated material, and solder joint

Provided herein is a solder material that includes a spherical core that provides space between a joint object and another object to be joined to the joint object and a solder coated layer that has a melting point at which a core layer of the core is not melted. The solder coated layer includes Sn as a main ingredient and 0 to 2 mass % of Ag, and coats the core. The solder coated layer has an average grain diameter of crystal grains of 3 m or less, and the solder material has a spherical diameter of 1 to 230 m and a sphericity of 0.95 or more.

Methods and apparatuses for mitigating tin whisker growth on tin and tin-plated surfaces by doping tin with germanium

The present disclosure generally relates to the field of tin electroplating. More specifically, the present disclosure relates to methods for mitigating tin whisker formation on tin-plated films and tin-plated surfaces by doping the tin with germanium.

Methods and apparatuses for mitigating tin whisker growth on tin and tin-plated surfaces by doping tin with germanium

The present disclosure generally relates to the field of tin electroplating. More specifically, the present disclosure relates to methods for mitigating tin whisker formation on tin-plated films and tin-plated surfaces by doping the tin with germanium.

ELECTROLYTIC TIN ALLOY PLATING SOLUTION

An electrolytic tin alloy plating solution contains a compound serving as a source of supply of tin ions, a compound serving as a source of supply of silver ions, an oxide of a nitrogen-containing heterocyclic compound, and a flavonoid compound.

ELECTROLYTIC TIN ALLOY PLATING SOLUTION

An electrolytic tin alloy plating solution contains a compound serving as a source of supply of tin ions, a compound serving as a source of supply of silver ions, an oxide of a nitrogen-containing heterocyclic compound, and a flavonoid compound.

COMPOSITION FOR TIN OR TIN ALLOY ELECTROPLATING COMPRISING LEVELING AGENT

The present invention relates to the use of an aqueous composition comprising tin ions optionally further alloy metal ions selected from silver, copper, indium, and bismuth ions and at least one additive comprising a linear or branched polyimidazolium compound comprising the structural unit of formula (L1) for depositing tin or tin alloy containing layers and a process for depositing tin alloy layer onto a substrate.

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