Patent classifications
C25D5/14
Electrodeposited copper foil, current collector, electrode, and lithium ion secondary battery comprising the same
Provided are an electrodeposited copper foil, a current collector, an electrode, and a lithium-ion secondary battery comprising the same. The electrodeposited copper foil has a deposited side and a drum side opposite the deposited side. In a first aspect, ΔRS between the deposited side and the drum side is at most about 95 MPa, and the deposited side exhibits a Vv in a range from about 0.15 μm.sup.3/μm.sup.2 to about 1.35 μm.sup.3/μm.sup.2. In a second aspect, the deposited side has a Sku of about 1.5 to about 6.5 and the deposited side exhibits a Vv in a range from about 0.15 μm.sup.3/μm.sup.2 to about 1.35 μm.sup.3/μm.sup.2. The characteristics are beneficial to improve the quality of the electrodeposited copper foil, thereby extending the charge-discharge cycle life of a lithium-ion secondary battery comprising the same.
Electrodeposited copper foil, current collector, electrode, and lithium ion secondary battery comprising the same
Provided are an electrodeposited copper foil, a current collector, an electrode, and a lithium-ion secondary battery comprising the same. The electrodeposited copper foil has a deposited side and a drum side opposite the deposited side. In a first aspect, ΔRS between the deposited side and the drum side is at most about 95 MPa, and the deposited side exhibits a Vv in a range from about 0.15 μm.sup.3/μm.sup.2 to about 1.35 μm.sup.3/μm.sup.2. In a second aspect, the deposited side has a Sku of about 1.5 to about 6.5 and the deposited side exhibits a Vv in a range from about 0.15 μm.sup.3/μm.sup.2 to about 1.35 μm.sup.3/μm.sup.2. The characteristics are beneficial to improve the quality of the electrodeposited copper foil, thereby extending the charge-discharge cycle life of a lithium-ion secondary battery comprising the same.
Method to enable electroplating of golden silver nanoparticles
A method to enable electroplating of nano-silver like gold material ([Ag.sub.25(SR).sub.18].sup.− where SR is a thiolate). The method includes activating a surface of a substrate using first counter flow conditioning rinses (CFCR) with a solution of acetone followed by a solution of alcohol; rinsing the substrate surface; drying using a nitrogen gas; cleaning using a soak-clean solution; activating using an activator solution; rinsing using an ammonia dead rinse solution; conditioning using second CFCR; etching using hydrochloric acid; rinsing third CFCR; depositing woods nickel strike material and electrolytic nickel metal; electrodeposition of a gold strike metal to the surface of the substrate; and electroplating of a nano-silver like gold material and a nano-silver like gold alloy material on to the surface of the substrate using an electroplating solution and a rate of deposition 0.0001 μm/h.
ADDITIVELY MANUFACTURED THERMOSET POLYMERS FOR METAL PLATING AND METAL PLATED PARTS FORMED THEREFROM
A thermoset resin for forming parts to be metal plated includes a vat photopolymerization (VPP) thermoset resin and an etchable phase disposed in the VPP thermoset resin. The etchable phase is etched from a surface of a part formed from the VPP thermoset resin such that a plurality of micro-mechanical locking sites is formed on the surface of the part. The etchable phase is at least one of organic particles, organic resins, inorganic particles, and copolymers of the VPP thermoset resin. For example, the etchable phase can be a polybutadiene phase and/or a mineral such as calcium carbonate.
CONNECTOR TERMINAL MATERIAL AND TERMINAL FOR CONNECTOR
To provide a method of manufacturing a connector terminal material and a terminal for a connector to improve wear resistance and heat resistance. A connector terminal material of the present invention is provided with a base material in which at least a surface layer is made of copper or copper alloy and a silver-nickel alloy layer covering at least a part of a surface of the base material and having a film thickness of 0.5 μm or more and 50 μm or less; and nickel content of the silver-nickel alloy layer is 0.05 at % or more and 2.0 at % or less. Between the base material and the silver-nickel alloy layer, a nickel layer made of nickel or nickel alloy is provided; and a film thickness of the nickel layer is preferably 0.5 μm or more and 5 μm or less.
Metallic terminal and manufacturing method thereof
A metallic terminal includes a terminal body, a first plating layer, a second plating layer, and a third plating layer. The first plating layer is on the terminal body, and the thickness of the first plating layer at the bent portion of the terminal body is 0.3 to 1.75 micrometers, and the thickness of rest portions of the first plating layer is 2 to 10 micrometers. The second plating layer is on the first plating layer and corresponds to the contact portion of the terminal body, and the thickness of the second plating layer is 0.5 to 2 micrometers. The third plating layer is on the first plating layer and corresponds to the soldering portion of the terminal body, and the thickness of the third plating layer is 0.01 to 0.1 micrometers. A manufacturing method of metallic terminal is also provided.
Surface Treated Copper Foil, Copper Clad Laminate, And Printed Circuit Board
A surface treated copper foil 1 includes a copper foil 2, and a first surface treatment layer 3 formed on one surface of the copper foil 2. The first surface treatment layer 3 of the surface treated copper foil 1 has a Ni deposited amount of 20 to 200 μg/dm.sup.2 and a Zn deposited amount of 20 to 1,000 μg/dm.sup.2. A copper clad laminate 10 includes the surface treated copper foil 1 and an insulating substrate 11 adhered to the first surface treatment layer 3 of the surface treated copper foil 1.
Surface Treated Copper Foil, Copper Clad Laminate, And Printed Circuit Board
A surface treated copper foil 1 includes a copper foil 2, and a first surface treatment layer 3 formed on one surface of the copper foil 2. The first surface treatment layer 3 of the surface treated copper foil 1 has a Ni deposited amount of 20 to 200 μg/dm.sup.2 and a Zn deposited amount of 20 to 1,000 μg/dm.sup.2. A copper clad laminate 10 includes the surface treated copper foil 1 and an insulating substrate 11 adhered to the first surface treatment layer 3 of the surface treated copper foil 1.
Surface Treated Copper Foil, Copper Clad Laminate, And Printed Circuit Board
A surface treated copper foil 1 includes a copper foil 2, and a first surface treatment layer 3 formed on one surface of the copper foil 2. The first surface treatment layer 3 of the surface treated copper foil 1 has L* of a CIE L*a*b* color space of 44.0 to 84.0. A copper clad laminate 10 includes the surface treated copper foil 1 and an insulating substrate 11 adhered to a surface of the surface treated copper foil 1 opposite to the first surface treatment layer 3.
STEEL SHEET FOR CAN MAKING AND METHOD FOR MANUFACTURING THE SAME
A steel sheet for can making and methods for manufacturing the same. The steel sheet includes, in order from a steel sheet side, an iron-nickel diffusion layer, a metallic chromium layer, and a chromium oxide layer. The iron-nickel diffusion layer has a nickel coating weight of 50 mg/m.sup.2 to 500 mg/m.sup.2 per surface of the steel sheet and a thickness of 0.060 μm to 0.500 μm per surface of the steel sheet. The metallic chromium layer includes a flat-like metallic chromium sublayer and a granular metallic chromium sublayer placed on a surface of the flat-like metallic chromium sublayer. The total chromium coating weight of both sublayers per surface of the steel sheet is 60 mg/m.sup.2 to 200 mg/m.sup.2. The chromium oxide layer has a chromium coating weight 3 mg/m.sup.2 to 10 mg/m.sup.2 per surface of the steel sheet in terms of metallic chromium.