Patent classifications
C25F3/26
ELECTROPOLISHING METHOD
A method for electropolishing a manufactured metallic article, the method comprising: contacting the metallic article with an electropolishing electrolyte; and electropolishing the metallic article in the electropolishing electrolyte through the application of an applied current regime comprising: at least one electropolishing regime, each electropolishing regime comprising a current density of at least 2 A/cm.sup.2 and a voltage comprising a shaped waveform having a frequency from 2 Hz to 300 kHz, a minimum voltage of at least 0 V and a maximum voltage of between 0.5 to 500 V.
METHOD AND DEVICE FOR DRY TREATMENT OF METAL SURFACES BY MEANS OF ELECTRICALLY ACTIVE SOLID PARTICLES
Methods and devices for treatment of metal surfaces by means of electrically active solid particles that include a step of contact of the solid particles with the electrode of an electric source, a step of shooting the particles towards the metal surface to be treated and a step of transmission of electric charge of the particles on the metal surface to be treated. The transmission of the electricity between the electric source and the metal surface during the step of shooting preferably is by net charge of the particles or by electric conductivity by contact or by electric conductivity by means of voltaic arches. The current applied to the electrode is preferably a DC or a current that contains positive sections and negative sections.
IN-SITU ELECTROCHEMICAL POLISHING OF ADDITIVELY MANUFACTURED PARTS
An additively manufactured intermediate part includes a body and at least one sacrificial electrode formed within or upon the body. The body includes a plurality of layers and at least one surface having a region to be smoothed in a near-finished state of the additively manufactured intermediate part. The at least one sacrificial electrode is adjacent to the body along the at least one surface, such that at least one of the plurality of layers is adjacent to the at least one sacrificial electrode in the region to be smoothed in the near-finished state of the additively manufactured intermediate part.
IN-SITU ELECTROCHEMICAL POLISHING OF ADDITIVELY MANUFACTURED PARTS
An additively manufactured intermediate part includes a body and at least one sacrificial electrode formed within or upon the body. The body includes a plurality of layers and at least one surface having a region to be smoothed in a near-finished state of the additively manufactured intermediate part. The at least one sacrificial electrode is adjacent to the body along the at least one surface, such that at least one of the plurality of layers is adjacent to the at least one sacrificial electrode in the region to be smoothed in the near-finished state of the additively manufactured intermediate part.
Stent device for spinal fusion
A bone implant for at least partial insertion into a bone and/or cartilage. The bone implant is at least partially formed of a metal alloy of at least about 90 wt % of a solid solution or a rhenium and molybdenum alloy.
Method for manufacturing solid oxide and device therefor
Provided is a method for manufacturing a solid oxide and a device therefor, capable of manufacturing a solid oxide used as an optical material without introducing damaged layers caused by machining, which does not use any polishing agent or abrasive grains including rare earth elements, or does not use any solution, such as hydrogen fluoride, for which handling is difficult and which imposes a heavy environmental burden. In the presence of water 1, a solid oxide in which one or more kinds of elements are bonded through oxygen is used as an object to be manufactured; a catalyst substance, which cuts a backbond between an oxygen element and another element, forming the solid oxide, by dissociation of a water molecule, and adsorbs it, and helps production of a decomposition product by hydrolysis, is used as a machining reference surface (3); the object (5) to be manufactured and the machining reference surface are disposed so that they are brought into contact with each other or they are brought very close to each other in the presence of water; a potential of the machining reference surface is adjusted to a range where neither H.sub.2 nor O.sub.2 is produced; and the object to be manufactured is moved relative to the machining reference surface thereby to remove a decomposition product from the surface of the object to be manufactured.
Method for manufacturing solid oxide and device therefor
Provided is a method for manufacturing a solid oxide and a device therefor, capable of manufacturing a solid oxide used as an optical material without introducing damaged layers caused by machining, which does not use any polishing agent or abrasive grains including rare earth elements, or does not use any solution, such as hydrogen fluoride, for which handling is difficult and which imposes a heavy environmental burden. In the presence of water 1, a solid oxide in which one or more kinds of elements are bonded through oxygen is used as an object to be manufactured; a catalyst substance, which cuts a backbond between an oxygen element and another element, forming the solid oxide, by dissociation of a water molecule, and adsorbs it, and helps production of a decomposition product by hydrolysis, is used as a machining reference surface (3); the object (5) to be manufactured and the machining reference surface are disposed so that they are brought into contact with each other or they are brought very close to each other in the presence of water; a potential of the machining reference surface is adjusted to a range where neither H.sub.2 nor O.sub.2 is produced; and the object to be manufactured is moved relative to the machining reference surface thereby to remove a decomposition product from the surface of the object to be manufactured.
POST-PROCESSING OF AN OBJECT OBTAINED BY DIRECT METAL LASER SINTERING
The present invention relates to a method and a system for treating a surface of an object obtained by direct metal laser sintering. The object is sintered from a metal powder with a grain size distribution. Due to the manufacturing process, the object can comprise a rough surface with remaining grains of the metal powder attached to the surface. The method according to the present invention provides parameters for post-processing the object to achieve a smooth surface suitable for use in medical imaging systems.
METHODS FOR ELECTROPOLISHING AND COATING ALUMINUM ON AIR AND/OR MOISTURE SENSITIVE SUBSTRATES
Methods for electropolishing and coating aluminum on a surface of an air and/or moisture sensitive substrate, including: in a vessel, submerging the substrate in a first molten salt bath and applying an anodizing current to the substrate at a first temperature to electropolish the surface of the substrate; wherein the first molten salt bath includes one of a first organic salt bath and first inorganic salt bath; wherein, when used, the first organic salt bath includes one of (a) aluminum halide and ionic liquid, (b) a combination of an aluminum halide and halogenatedmethylphenylsulfone (C.sub.6(H.sub.5-y,X.sub.y)SO.sub.2CX.sub.3, where y is a number from 0-5), (c) a combination of an aluminum halide, an ionic liquid, and halogenatedmethylphenylsulfone (C.sub.6(H.sub.5-y,X.sub.y)SO.sub.2CX.sub.3), and (d) AlF.sub.3-organofluoride-hydrofluoric acid adduct; wherein, when used, the first inorganic salt bath includes aluminum halide and alkali metal halide; and wherein the anodizing current is 10-30 mA/cm.sup.2.
METHODS FOR ELECTROPOLISHING AND COATING ALUMINUM ON AIR AND/OR MOISTURE SENSITIVE SUBSTRATES
Methods for electropolishing and coating aluminum on a surface of an air and/or moisture sensitive substrate, including: in a vessel, submerging the substrate in a first molten salt bath and applying an anodizing current to the substrate at a first temperature to electropolish the surface of the substrate; wherein the first molten salt bath includes one of a first organic salt bath and first inorganic salt bath; wherein, when used, the first organic salt bath includes one of (a) aluminum halide and ionic liquid, (b) a combination of an aluminum halide and halogenatedmethylphenylsulfone (C.sub.6(H.sub.5-y,X.sub.y)SO.sub.2CX.sub.3, where y is a number from 0-5), (c) a combination of an aluminum halide, an ionic liquid, and halogenatedmethylphenylsulfone (C.sub.6(H.sub.5-y,X.sub.y)SO.sub.2CX.sub.3), and (d) AlF.sub.3-organofluoride-hydrofluoric acid adduct; wherein, when used, the first inorganic salt bath includes aluminum halide and alkali metal halide; and wherein the anodizing current is 10-30 mA/cm.sup.2.