Patent classifications
C30B29/20
Heat-resistant synthetic jewelry material
A heat-resistant synthetic jewelry material having a transparent, semitransparent or nontransparent composite nanocrystalline material on the basis of nanosized oxide and silicate crystalline phases. The material includes at least one of the following crystalline phases: spinel, quartz-like phases, sapphirine, enstatite, petalite-like phase, cordierite, willemite, zirconium, rutile, zirconium titanate, zirconium dioxide with a content of ions of transition elements, rare-earth elements and precious metals of from 0.001 to 4 mol %. One of the crystalline phases is additionally quartz-like solid solutions of lithium magnesium zinc aluminosilicates with a virgilite or keatite structure. The composition is selected from the following components,s SiO.sub.2, Al.sub.2O.sub.3, MgO, ZnO, Li.sub.2O, PbO, ZrO.sub.2, TiO.sub.2, NiO, CoO, CuO, Cr.sub.2O.sub.3, Bi.sub.2O.sub.3, Fe.sub.2O.sub.3, MnO.sub.2, CeO.sub.2, Nd.sub.2O.sub.3, Er.sub.2O.sub.3, Pr.sub.2O.sub.3 and Au.
Diffusion assisted crystal hydrothermal and flux growth
The purpose of diffusion assisted crystal hydrothermal growth is to facilitate a greatly increased crystal growth rate that would save time that is precious in such a material and manpower costly process. The assisted crystal growth itself requires the utilization of a piezoelectric shaker connected to the autoclave in which most industrial hydrothermal crystals are grown. The waveform can be modulated to induce transport of nutrient in a singular direction, customized to the topology of the apparatus. As it stands currently, the growth of most crystals that require autoclaves for their production can take anywhere from 3 months to up to 2 years, and accordingly carries many costs, particularly electricity and supervision of the autoclave(s), and other issues that may arise during the growth. While the product of this labor results in high-quality crystals, in reality, these are not at all what is needed outside of the laboratory environment. Using the assisted crystal hydrothermal growth process, average crystal growth can be cut in half, with the resulting crystals consequently being of a slightly lower quality, though still sufficient for most engineering purposes. Another advantage of using a piezoelectric shaker is that an additional sensor can be added to the autoclave to monitor the health of the autoclave using trending data obtained during the growth.
Diffusion assisted crystal hydrothermal and flux growth
The purpose of diffusion assisted crystal hydrothermal growth is to facilitate a greatly increased crystal growth rate that would save time that is precious in such a material and manpower costly process. The assisted crystal growth itself requires the utilization of a piezoelectric shaker connected to the autoclave in which most industrial hydrothermal crystals are grown. The waveform can be modulated to induce transport of nutrient in a singular direction, customized to the topology of the apparatus. As it stands currently, the growth of most crystals that require autoclaves for their production can take anywhere from 3 months to up to 2 years, and accordingly carries many costs, particularly electricity and supervision of the autoclave(s), and other issues that may arise during the growth. While the product of this labor results in high-quality crystals, in reality, these are not at all what is needed outside of the laboratory environment. Using the assisted crystal hydrothermal growth process, average crystal growth can be cut in half, with the resulting crystals consequently being of a slightly lower quality, though still sufficient for most engineering purposes. Another advantage of using a piezoelectric shaker is that an additional sensor can be added to the autoclave to monitor the health of the autoclave using trending data obtained during the growth.
LOW-DEFECT-DENSITY GAMMA PHASE ALUMINUM OXIDE SUBSTRATES FOR HETEROEPITAXIAL SYNTHESIS
Aluminum oxide (Al.sub.2O.sub.3) thin films having a high γ-phase purity and low defect density and methods for making the aluminum oxide thin films are provided. Also provided are epitaxial heterostructures that incorporate the aluminum oxide thin films as growth substrates and methods of forming the heterostructures. The Al.sub.2O.sub.3 films are pure, or nearly pure, γ-Al.sub.2O.sub.3. As such, the films contain no, or only a very low concentration of, other Al.sub.2O.sub.3 polymorph phases. In particular, the Al.sub.2O.sub.3 films contain no, or only a very low concentration of, the θ-Al.sub.2O.sub.3 polymorph phase.
LOW-DEFECT-DENSITY GAMMA PHASE ALUMINUM OXIDE SUBSTRATES FOR HETEROEPITAXIAL SYNTHESIS
Aluminum oxide (Al.sub.2O.sub.3) thin films having a high γ-phase purity and low defect density and methods for making the aluminum oxide thin films are provided. Also provided are epitaxial heterostructures that incorporate the aluminum oxide thin films as growth substrates and methods of forming the heterostructures. The Al.sub.2O.sub.3 films are pure, or nearly pure, γ-Al.sub.2O.sub.3. As such, the films contain no, or only a very low concentration of, other Al.sub.2O.sub.3 polymorph phases. In particular, the Al.sub.2O.sub.3 films contain no, or only a very low concentration of, the θ-Al.sub.2O.sub.3 polymorph phase.
Method and apparatus for growing sapphire single crystals
The present invention relates to a method and apparatus for growing sapphire single crystals, and more particularly to a method and apparatus for growing sapphire single crystals in which a high quality, long single crystal can be obtained within a short period of time upon the use of a long rectangular crucible and a long seed crystal extending in a c-axial direction. Use of the method and apparatus for growing sapphire single crystals according to the present invention can uniformly maintain the horizontal temperature at the inside of the crucible despite the use of a rectangular crucible, thereby obtaining a high-quality single crystal as well decreasing the possibility of a failure in the growth of the single crystal.
Method and apparatus for growing sapphire single crystals
The present invention relates to a method and apparatus for growing sapphire single crystals, and more particularly to a method and apparatus for growing sapphire single crystals in which a high quality, long single crystal can be obtained within a short period of time upon the use of a long rectangular crucible and a long seed crystal extending in a c-axial direction. Use of the method and apparatus for growing sapphire single crystals according to the present invention can uniformly maintain the horizontal temperature at the inside of the crucible despite the use of a rectangular crucible, thereby obtaining a high-quality single crystal as well decreasing the possibility of a failure in the growth of the single crystal.
Plane orientation of crystalline structures
Systems and method for creating crystalline parts having a desired primary and secondary crystallographic orientations are provided. One embodiment may take the form of a method of manufacturing a part having a crystalline structure. The method includes melting aluminum oxide and drawing the melted aluminum oxide up a slit. Additionally, the method includes orienting the seed crystal relative to a growth apparatus such that a crystalline structure grows having a desired primary plane and a desired secondary plane orientation. Moreover, the method includes pulling the crystal as it forms to create a ribbon shaped crystalline structure and cutting a part from the crystalline structure.
Plane orientation of crystalline structures
Systems and method for creating crystalline parts having a desired primary and secondary crystallographic orientations are provided. One embodiment may take the form of a method of manufacturing a part having a crystalline structure. The method includes melting aluminum oxide and drawing the melted aluminum oxide up a slit. Additionally, the method includes orienting the seed crystal relative to a growth apparatus such that a crystalline structure grows having a desired primary plane and a desired secondary plane orientation. Moreover, the method includes pulling the crystal as it forms to create a ribbon shaped crystalline structure and cutting a part from the crystalline structure.
Continuous sapphire growth
Systems and methods for continuous sapphire growth are disclosed. One embodiment may take the form of a method including feeding a base material into a crucible located within a growth chamber, heating the crucible to melt the base material and initiating crystalline growth in the melted base material to create a crystal structure. Additionally, the method includes pulling the crystal structure away from crucible and feeding the crystal structure out of the growth chamber.