A method for making a graphene nanoribbon composite structure includes providing a substrate including a plurality of protrusions spaced apart from each other. A graphene film is grown on a growth substrate, an adhesive layer is on a surface of the graphene film away from the growth substrate. After removing the growth substrate, the graphene film and the adhesive layer are cleaned with water or an organic solvent. The graphene film, the adhesive layer, and the substrate are combined and then are dried, so that a plurality of wrinkles are formed near the plurality of protrusions. The adhesive layer is removed, and after etching a surface of the graphene film away from the substrate, the graphene films except for the plurality of wrinkles are removed, to form a plurality of graphene nanoribbons.

A method for making a graphene nanoribbon composite structure includes providing a substrate including a plurality of protrusions spaced apart from each other. A graphene film is grown on a growth substrate, an adhesive layer is on a surface of the graphene film away from the growth substrate. After removing the growth substrate, the graphene film and the adhesive layer are cleaned with water or an organic solvent. The graphene film, the adhesive layer, and the substrate are combined and then are dried, so that a plurality of wrinkles are formed near the plurality of protrusions. The adhesive layer is removed, and after etching a surface of the graphene film away from the substrate, the graphene films except for the plurality of wrinkles are removed, to form a plurality of graphene nanoribbons.

A voltage tunable solar-blind UV detector using a EG/SiC heterojunction based Schottky emitter bipolar phototransistor with EG grown on p-SiC epi-layer using a chemically accelerated selective etching process of Si using TFS precursor.

The present disclosure relates to a method for preparing graphene, including: forming a dielectric material; and applying heat treatment concurrently with a gaseous carbon source on the dielectric material to grow.

The present disclosure relates to a method for preparing graphene, including: forming a dielectric material; and applying heat treatment concurrently with a gaseous carbon source on the dielectric material to grow.

A voltage tunable solar-blind UV detector using a EG/SiC heterojunction based Schottky emitter bipolar phototransistor with EG grown on p-SiC epi-layer using a chemically accelerated selective etching process of Si using TFS precursor.

The presently disclosed subject matter relates generally to GaAs.sub.1−xSb.sub.x nanowires (NW) grown on a graphitic substrate, to methods of growing such nanowires, and to use of such nanowires in applications such as flexible near infrared photodetector.

The presently disclosed subject matter relates generally to GaAs.sub.1−xSb.sub.x nanowires (NW) grown on a graphitic substrate, to methods of growing such nanowires, and to use of such nanowires in applications such as flexible near infrared photodetector.

A graphene fabrication method which can obtain graphene of high quality and good characteristics by adjusting a size and a shape of a domain of graphene is provided. The method for fabricating graphene according to the present disclosure includes: a graphene pattern forming step of forming a graphene forming pattern on a graphene growth substrate; and a graphene forming step of forming a graphene layer on the graphene growth substrate having the graphene forming pattern formed thereon.

A graphene fabrication method which can obtain graphene of high quality and good characteristics by adjusting a size and a shape of a domain of graphene is provided. The method for fabricating graphene according to the present disclosure includes: a graphene pattern forming step of forming a graphene forming pattern on a graphene growth substrate; and a graphene forming step of forming a graphene layer on the graphene growth substrate having the graphene forming pattern formed thereon.