Patent classifications
C01B32/196
Method for integrally forming graphene film (GF) of high specific surface area (SSA) by ultrafast ultraviolet (UV) laser processing
A method for integrally forming a graphene film (GF) of a high specific surface area (SSA) by ultrafast ultraviolet (UV) laser processing, includes: selecting a carbon precursor material, where the carbon precursor material is one selected from the group consisting of a biomass/hydrogel composite and a heavy hydrocarbon compound; adding an activator solution to an inside of the carbon precursor material to obtain a composite with an activator uniformly loaded, and spreading the composite on a flexible substrate to form a carbon precursor material layer; heating and drying the carbon precursor material layer; in-situ processing with an ultrafast UV laser to obtain an activated GF of a high SSA; and cleaning and drying the activated GF. With the method of the present disclosure, a microporous activated GF of a high SSA can be directly processed in-situ on a flexible substrate.
CONTINUOUS PRODUCTION OF PRISTINE GRAPHENE AND GRAPHENE OXIDE
Provided is a process for manufacturing a graphene material, the process comprising (a) injecting a rust stock into a first end of a continuous reactor having a toroidal vortex flow, wherein the first stock comprises graphite and a non-oxidizing liquid (or, alternatively, graphite, an acid, and an optional oxidizer) and the continuous flow reactor is configured to produce the toroidal vortex flow, enabling the formation of a reaction product suspension or slurry at the second end, downstream from the first end, of the continuous reactor; and (b) introducing the reaction product suspension/slurry from the second end back to enter the continuous reactor at or near the first end, allowing the reaction product suspension/slurry to form a toroidal vortex flow and move down to or near the second end to produce a graphene suspension or graphene oxide slurry. The process may further comprise repeating step (b) for at least one time.
GRAPHITE MATERIALS, AND METHODS FOR FABRICATING AND USE THEREOF
Cellulose nanofibers (CNF) act as a dispersing agent to directly exfoliate graphite in an aqueous solution using sonication. The resulting suspension has graphite flakes, each having 2-20 monolayers, a relatively large lateral dimension, and a plurality of CNF decorating its surfaces and edges. The dispersing effect of the CNF allows the graphite-CNF suspension to be stored without degradation until desired use. The graphite-CNF suspension can be used to form various composite structures, such as by spraying, coating, pouring, extruding, or printing the suspension, and then drying the suspension. The resulting composite structures have improved tensile strength and toughness due to hydrogen bond interactions between the CNF and graphite.
Graphene-based inorganic-organic hybrid materials and separation of racemic mixtures
A variety of inorganic-organic hybrid materials and various methods for preparing and using the same are described. The hybrid materials are graphene or graphitic materials populated with organic molecules and may have a variety of surface defects, pits or three-dimensional architecture, thereby increasing the surface area of the material. The hybrid materials may take the form of three dimensional graphene nanosheets (3D GNS). If the organic molecules are enantiospecific molecules, the hybrid materials can be used for chiral separation of racemic mixtures.
Graphene-based inorganic-organic hybrid materials and separation of racemic mixtures
A variety of inorganic-organic hybrid materials and various methods for preparing and using the same are described. The hybrid materials are graphene or graphitic materials populated with organic molecules and may have a variety of surface defects, pits or three-dimensional architecture, thereby increasing the surface area of the material. The hybrid materials may take the form of three dimensional graphene nanosheets (3D GNS). If the organic molecules are enantiospecific molecules, the hybrid materials can be used for chiral separation of racemic mixtures.
DEFECT-FREE GRAPHENE AND METHODS FOR PRODUCING THE SAME
A defect-free graphene and a method of making a defect-free graphene. A method for synthesizing defect-free graphene, the method including providing a graphene precursor to a flow-aided sonication apparatus, the graphene precursor comprised of particulates, wherein the flow-aided sonication apparatus comprises: a flow channel positioned along an axis, the flow channel having a first opening and a second opening, the second opening opposite of the first opening, wherein the graphene precursor enters the flow channel through the first opening; aligning edges of the particulates parallel to axis A; and imposing sonication shockwave to the edges of the aligned particulates of the graphene precursor, wherein the sonication shockwave is imposed to the graphene precursor in a propagation direction perpendicular to the edges of the particulates such that planes of the sonication shockwave are parallel to the edges of the particulates, thereby synthesizing defect-free graphene.
NANOCARBON SEPARATION DEVICE AND NANOCARBON SEPARATION METHOD
A nanocarbon separation device includes a separation tank that is configured to accommodate a dispersion liquid including nanocarbons, a first electrode provided at an upper part in the separation tank, a second electrode provided at a lower part in the separation tank, an evaluation unit that is configured to evaluate a physical state or a chemical state of the dispersion liquid, and a determination unit that is configured to determine a separation state between metallic nanocarbons and semiconducting nanocarbons included in the dispersion liquid from the physical state or the chemical state.
USING ANAB TECHNOLOGY TO REMOVE PRODUCTION PROCESSING RESIDUALS FROM GRAPHENE
A method for removing contaminants from a graphene product uses an accelerated neutral atom beam to remove product contaminants without disruption of the product's crystalline lattice and morphology to enable usage in high purity devices/systems such as exemplified in semi-conductor and like high purity needs applications.
USING ANAB TECHNOLOGY TO REMOVE PRODUCTION PROCESSING RESIDUALS FROM GRAPHENE
A method for removing contaminants from a graphene product uses an accelerated neutral atom beam to remove product contaminants without disruption of the product's crystalline lattice and morphology to enable usage in high purity devices/systems such as exemplified in semi-conductor and like high purity needs applications.
CLEANING OF NANOSTRUCTURES
The present invention relates to a method for removing a polymeric material from a surface of a nanostructure. The method includes applying, by a scanning probe microscope, an electrical field between a probe tip of the scanning probe microscope and the nanostructure, and simultaneously scanning over the surface of the nanostructure. Thereby, bonds connecting the polymeric material to the surface of the nanostructure are broken. A further step includes cleaning the surface of the nanostructure. A scanning probe microscope for performing such a method and a computer program product for controlling the scanning probe microscope are also disclosed.