Patent classifications
C
C01
C01B
33/00
C01B33/08
C01B33/107
C01B33/10778
C01B33/10794
C01B33/10794
Method for removing an impurity from a chlorosilane mixture
12291458
·
2025-05-06
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·
Boron, phosphorus, arsenic, antimony and other impurities are at least partially removed from a mixture containing at least one chlorosilane and/or organochlorosilane by a) contacting the liquid mixture with a carrier material functionalized with an amidoxime of the general structural formula (I), ##STR00001##
where CAR=carrier material and R.sup.1, R.sup.2 are independently of one another H, alkyl, alkenyl, aryl, alkylaryl; and b) optionally removing the functionalized carrier material.